BR9910529A - Aprarelho e método de processamento de artigos nos quais camadas de metal têm sido aplicadas - Google Patents

Aprarelho e método de processamento de artigos nos quais camadas de metal têm sido aplicadas

Info

Publication number
BR9910529A
BR9910529A BR9910529-2A BR9910529A BR9910529A BR 9910529 A BR9910529 A BR 9910529A BR 9910529 A BR9910529 A BR 9910529A BR 9910529 A BR9910529 A BR 9910529A
Authority
BR
Brazil
Prior art keywords
metal layers
solutions
pickling
collection tank
processing articles
Prior art date
Application number
BR9910529-2A
Other languages
English (en)
Inventor
Julius James Jablonsky
Original Assignee
Phoenankh Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Phoenankh Corp filed Critical Phoenankh Corp
Publication of BR9910529A publication Critical patent/BR9910529A/pt

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D37/00—Processes of filtration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0085—Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Physical Water Treatments (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

"APARELHO E MéTODO DE PROCESSAMENTO DE ARTIGOS NOS QUAIS CAMADAS DE METAL TêM SIDO APLICADAS". Em soluções de decapagem de metal de reciclagem como soluções contendo ácido nítrico, substância química são retiradas a partir de um estágio de decapagem (100) em trilhas circulares separadas em que são bombeadas através de uma série de filtros tangenciais (60', 62', 64', 66'), e um tanque de coleta (38'). Saturado a partir dos filtros retorna ao estágio de decapagem (100) , e soluções com alta concentração de sólidos são removidas do tanque de coleta, permitindo recuperação de metais.
BR9910529-2A 1998-05-19 1999-05-18 Aprarelho e método de processamento de artigos nos quais camadas de metal têm sido aplicadas BR9910529A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/081,839 US6074561A (en) 1995-10-23 1998-05-19 Apparatus and method for recovering photoresist developers and strippers
PCT/US1999/010925 WO1999059693A1 (en) 1998-05-19 1999-05-18 Apparatus and method for recovering photoresist developers and strippers

Publications (1)

Publication Number Publication Date
BR9910529A true BR9910529A (pt) 2002-01-02

Family

ID=22166727

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9910529-2A BR9910529A (pt) 1998-05-19 1999-05-18 Aprarelho e método de processamento de artigos nos quais camadas de metal têm sido aplicadas

Country Status (8)

Country Link
US (1) US6074561A (pt)
EP (1) EP1089799A4 (pt)
JP (1) JP2002515318A (pt)
KR (1) KR20010071297A (pt)
BR (1) BR9910529A (pt)
CA (1) CA2332245A1 (pt)
IL (1) IL139723A0 (pt)
WO (1) WO1999059693A1 (pt)

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US6699400B1 (en) * 1999-06-04 2004-03-02 Arne W. Ballantine Etch process and apparatus therefor
US6861371B2 (en) * 2001-11-05 2005-03-01 Tokyo Electron Limited Substrate processing system and substrate processing method
US7404926B2 (en) * 2003-12-30 2008-07-29 Rhoades Frank G Water treatment system
JP4393910B2 (ja) * 2004-04-08 2010-01-06 東京応化工業株式会社 ホトレジスト組成物の製造方法、ろ過装置、塗布装置及びホトレジスト組成物
JP4696593B2 (ja) * 2005-02-25 2011-06-08 凸版印刷株式会社 限外濾過フィルタの使用方法、及び限外濾過フィルタ再生機構付ウェット現像装置
US20070089902A1 (en) * 2005-10-25 2007-04-26 Tourne Joseph A Circuit board having a multi-signal via
KR20070099827A (ko) * 2006-04-05 2007-10-10 삼성전자주식회사 Ｐｒ 스트리핑 장치, 이를 이용한 ｐｒ 스트리퍼 재사용방법 및 박막 트랜지스터 어레이 기판의 제조 방법
US8083947B2 (en) * 2009-02-24 2011-12-27 Eastman Kodak Company Polymer-containing solvent purifying process
CN102345138A (zh) * 2010-07-30 2012-02-08 中芯国际集成电路制造(上海)有限公司 用于显影装置的显影液喷头的清洗装置和清洗方法
TWI535494B (zh) * 2011-12-23 2016-06-01 友達光電股份有限公司 光阻剝離液的供應系統及其供應方法
JP6045283B2 (ja) * 2012-10-11 2016-12-14 日本リファイン株式会社 レジスト剥離液の再生方法および再生装置
KR101437334B1 (ko) * 2014-02-07 2014-09-04 주식회사 씨엔디플러스 포토레지스트 제거 시스템용 메탈 회수 장치
EP3133175A1 (en) * 2015-08-19 2017-02-22 Enthone, Inc. System and process for recovering catalytic precious metal from aqueous galvanic processing solution
CN107744678B (zh) * 2017-10-27 2021-04-30 武汉华星光电技术有限公司 用于线性涂布机中的清洗液过滤装置、方法及线性涂布机
CN109091924B (zh) * 2018-09-03 2020-12-04 阜阳市鑫源建材有限公司 一种稀土颗粒分离系统
CN109260810A (zh) * 2018-11-21 2019-01-25 合肥新汇成微电子有限公司 一种化学药剂残留药液回收装置
KR20200107298A (ko) * 2019-03-07 2020-09-16 캡시스템(주) 네거티브 포토레지스트용 현상액 재생 시스템
KR102234732B1 (ko) * 2019-03-07 2021-04-01 캡시스템(주) 네거티브 포토레지스트용 현상액 재생 시스템
US11189504B2 (en) * 2020-02-11 2021-11-30 Tcl China Star Optoelectronics Technology Co., Ltd. Photoresist stripping device and photoresist stripping method

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US4083758A (en) * 1976-09-27 1978-04-11 Criterion Process for regenerating and for recovering metallic copper from chloride-containing etching solutions
US4784169A (en) * 1984-01-13 1988-11-15 Chemcut Corporation Apparatus for treating articles with solution to remove solids and then filtering the solution
US4786417A (en) * 1986-07-23 1988-11-22 Sumitomo Heavy Industries Ltd. Management of photoresist materials containing waste solution
US4760014A (en) * 1986-08-01 1988-07-26 Great Lakes Chemical Corporation Method for treating mixtures containing photopolymeric resin and compositions therefor
DE3873070T2 (de) * 1988-03-17 1993-01-21 Ceramiques Tech Soc D Verfahren zur behandlung verunreinigter oel-in-wasser-emulsionen oder-mikroemulsionen.
JPH0264646A (ja) * 1988-08-31 1990-03-05 Toshiba Corp レジストパターンの現像方法及びこの方法に使用する現像装置
DE3833242A1 (de) * 1988-09-30 1990-04-05 Hoellmueller Maschbau H Verfahren zum aetzen von kupferhaltigen werkstuecken sowie aetzanlage zur durchfuehrung des verfahrens
US5112491A (en) * 1991-03-01 1992-05-12 E. I. Du Pont De Nemours And Company Management of waste solution containing photoresist materials
US5366584A (en) * 1992-02-11 1994-11-22 Rayzist Photomask, Inc. Removing uncured emulsion from stencils during photomask production
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JP3355837B2 (ja) * 1993-12-27 2002-12-09 三菱化学株式会社 感光性材料用現像液の再生方法及び感光性材料の現像装置
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WO1996020434A1 (en) * 1994-12-27 1996-07-04 Mitsubishi Chemical Corporation Method and apparatus for treating developer for pigment-containing nonsilver photosensitive material, and automatic developing machine
US5753135A (en) * 1995-10-23 1998-05-19 Jablonsky; Julius James Apparatus and method for recovering photoresist developers and strippers
DE29517588U1 (de) * 1995-11-06 1996-02-08 Cimatec GmbH Produkte für Leiterplatten, 67292 Kirchheimbolanden Maschine zur Flüssigkeitsbehandlung von Gegenständen, insbesondere Platinen in der Leiterplattenfertigung
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Also Published As

Publication number Publication date
IL139723A0 (en) 2002-02-10
JP2002515318A (ja) 2002-05-28
EP1089799A4 (en) 2002-11-13
US6074561A (en) 2000-06-13
EP1089799A1 (en) 2001-04-11
KR20010071297A (ko) 2001-07-28
WO1999059693A1 (en) 1999-11-25
CA2332245A1 (en) 1999-11-25

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Legal Events

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B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE A 6A, 7A E 8A ANUIDADES

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: REFERENTE AO DESPACHO 8.6 PUBLICADO NA RPI 1894 DE 24/04/2007.