IL106790A - A capacitive pressure sensation consisting of the bracket and the process of creating it - Google Patents
A capacitive pressure sensation consisting of the bracket and the process of creating itInfo
- Publication number
- IL106790A IL106790A IL10679093A IL10679093A IL106790A IL 106790 A IL106790 A IL 106790A IL 10679093 A IL10679093 A IL 10679093A IL 10679093 A IL10679093 A IL 10679093A IL 106790 A IL106790 A IL 106790A
- Authority
- IL
- Israel
- Prior art keywords
- pressure
- diaphragm
- layer
- glass tube
- fitting
- Prior art date
Links
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 title claims description 52
- 238000000034 method Methods 0.000 title description 15
- 230000008569 process Effects 0.000 title description 9
- 238000004519 manufacturing process Methods 0.000 title description 3
- 239000011521 glass Substances 0.000 claims description 73
- 229910052751 metal Inorganic materials 0.000 claims description 61
- 239000002184 metal Substances 0.000 claims description 61
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 32
- 229910052710 silicon Inorganic materials 0.000 claims description 30
- 239000010703 silicon Substances 0.000 claims description 30
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 29
- 239000000463 material Substances 0.000 claims description 28
- 229910052759 nickel Inorganic materials 0.000 claims description 16
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 14
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 12
- 239000012530 fluid Substances 0.000 claims description 11
- 229910052726 zirconium Inorganic materials 0.000 claims description 11
- 229910052737 gold Inorganic materials 0.000 claims description 10
- 239000010931 gold Substances 0.000 claims description 10
- 238000001465 metallisation Methods 0.000 claims description 10
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 9
- 239000010936 titanium Substances 0.000 claims description 9
- 229910052719 titanium Inorganic materials 0.000 claims description 9
- 238000002955 isolation Methods 0.000 claims description 7
- 239000004065 semiconductor Substances 0.000 claims description 7
- 239000010935 stainless steel Substances 0.000 claims description 7
- 229910001220 stainless steel Inorganic materials 0.000 claims description 7
- 239000005388 borosilicate glass Substances 0.000 claims description 5
- 239000010409 thin film Substances 0.000 claims description 4
- 230000001133 acceleration Effects 0.000 claims description 3
- 238000005476 soldering Methods 0.000 claims description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 239000011651 chromium Substances 0.000 claims description 2
- 229910052735 hafnium Inorganic materials 0.000 claims description 2
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 239000011733 molybdenum Substances 0.000 claims description 2
- 229910052758 niobium Inorganic materials 0.000 claims description 2
- 239000010955 niobium Substances 0.000 claims description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 2
- 238000007254 oxidation reaction Methods 0.000 claims description 2
- 230000000284 resting effect Effects 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 2
- 230000002093 peripheral effect Effects 0.000 claims 9
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 claims 3
- 230000003647 oxidation Effects 0.000 claims 1
- 239000005297 pyrex Substances 0.000 description 45
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 44
- 235000012431 wafers Nutrition 0.000 description 17
- 239000002585 base Substances 0.000 description 12
- 230000035882 stress Effects 0.000 description 11
- 230000003068 static effect Effects 0.000 description 10
- 229910052581 Si3N4 Inorganic materials 0.000 description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 7
- POIUWJQBRNEFGX-XAMSXPGMSA-N cathelicidin Chemical compound C([C@@H](C(=O)N[C@@H](CCCNC(N)=N)C(=O)N[C@@H](CCCCN)C(=O)N[C@@H](CO)C(=O)N[C@@H](CCCCN)C(=O)N[C@@H](CCC(O)=O)C(=O)N[C@@H](CCCCN)C(=O)N[C@@H]([C@@H](C)CC)C(=O)NCC(=O)N[C@@H](CCCCN)C(=O)N[C@@H](CCC(O)=O)C(=O)N[C@@H](CC=1C=CC=CC=1)C(=O)N[C@@H](CCCCN)C(=O)N[C@@H](CCCNC(N)=N)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](C(C)C)C(=O)N[C@@H](CCC(N)=O)C(=O)N[C@@H](CCCNC(N)=N)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CCCCN)C(=O)N[C@@H](CC(O)=O)C(=O)N[C@@H](CC=1C=CC=CC=1)C(=O)N[C@@H](CC(C)C)C(=O)N[C@@H](CCCNC(N)=N)C(=O)N[C@@H](CC(N)=O)C(=O)N[C@@H](CC(C)C)C(=O)N[C@@H](C(C)C)C(=O)N1[C@@H](CCC1)C(=O)N[C@@H](CCCNC(N)=N)C(=O)N[C@@H]([C@@H](C)O)C(=O)N[C@@H](CCC(O)=O)C(=O)N[C@@H](CO)C(O)=O)NC(=O)[C@H](CC=1C=CC=CC=1)NC(=O)[C@H](CC(O)=O)NC(=O)CNC(=O)[C@H](CC(C)C)NC(=O)[C@@H](N)CC(C)C)C1=CC=CC=C1 POIUWJQBRNEFGX-XAMSXPGMSA-N 0.000 description 6
- 229910000833 kovar Inorganic materials 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 230000004927 fusion Effects 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 4
- 230000007774 longterm Effects 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 229910018487 Ni—Cr Inorganic materials 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 238000005219 brazing Methods 0.000 description 2
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000008646 thermal stress Effects 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 230000004323 axial length Effects 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000007767 bonding agent Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000013467 fragmentation Methods 0.000 description 1
- 238000006062 fragmentation reaction Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- UGKDIUIOSMUOAW-UHFFFAOYSA-N iron nickel Chemical compound [Fe].[Ni] UGKDIUIOSMUOAW-UHFFFAOYSA-N 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- ZSJFLDUTBDIFLJ-UHFFFAOYSA-N nickel zirconium Chemical compound [Ni].[Zr] ZSJFLDUTBDIFLJ-UHFFFAOYSA-N 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000003362 replicative effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- SBEQWOXEGHQIMW-UHFFFAOYSA-N silicon Chemical compound [Si].[Si] SBEQWOXEGHQIMW-UHFFFAOYSA-N 0.000 description 1
- 230000002277 temperature effect Effects 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0072—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance
- G01L9/0073—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance using a semiconductive diaphragm
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0042—Constructional details associated with semiconductive diaphragm sensors, e.g. etching, or constructional details of non-semiconductive diaphragms
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Measuring Fluid Pressure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US93886992A | 1992-09-01 | 1992-09-01 |
Publications (2)
Publication Number | Publication Date |
---|---|
IL106790A0 IL106790A0 (en) | 1994-08-26 |
IL106790A true IL106790A (en) | 1996-08-04 |
Family
ID=25472103
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL10679093A IL106790A (en) | 1992-09-01 | 1993-08-24 | A capacitive pressure sensation consisting of the bracket and the process of creating it |
Country Status (8)
Country | Link |
---|---|
US (2) | US5515732A (ja) |
EP (1) | EP0672239B1 (ja) |
JP (1) | JP3410095B2 (ja) |
CA (1) | CA2141689C (ja) |
DE (1) | DE69325664T2 (ja) |
IL (1) | IL106790A (ja) |
RU (1) | RU2120117C1 (ja) |
WO (1) | WO1994005988A1 (ja) |
Families Citing this family (71)
Publication number | Priority date | Publication date | Assignee | Title |
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FI102783B1 (fi) * | 1994-12-22 | 1999-02-15 | Vaisala Oyj | Menetelmä virtausnopeusanturin linearisoimiseksi sekä linearisoitu virtauksen nopeuden mittauslaitteisto |
US5637802A (en) * | 1995-02-28 | 1997-06-10 | Rosemount Inc. | Capacitive pressure sensor for a pressure transmitted where electric field emanates substantially from back sides of plates |
US5757608A (en) * | 1996-01-25 | 1998-05-26 | Alliedsignal Inc. | Compensated pressure transducer |
JP3107516B2 (ja) * | 1996-05-01 | 2000-11-13 | 株式会社日立製作所 | 複合センサ |
WO1998015807A1 (en) * | 1996-10-07 | 1998-04-16 | Lucas Novasensor | Silicon at least 5 micron high acute cavity with channel by oxidizing fusion bonding and stop etching |
US5792958A (en) * | 1997-01-21 | 1998-08-11 | Honeywell Inc. | Pressure sensor with a compressible insert to prevent damage from freezing |
JPH1130559A (ja) | 1997-07-10 | 1999-02-02 | Fuji Koki Corp | 圧力センサ |
DE19735760A1 (de) * | 1997-08-18 | 1999-02-25 | Zeiss Carl Fa | Lötverfahren für optische Materialien an Metallfassungen und gefaßte Baugruppen |
US5945605A (en) * | 1997-11-19 | 1999-08-31 | Sensym, Inc. | Sensor assembly with sensor boss mounted on substrate |
KR100279053B1 (ko) * | 1998-01-09 | 2001-02-01 | 박호군 | 실리콘 박막을 이용한 유리 기판쌍의 정전 열접합 방법 |
JPH11230845A (ja) * | 1998-02-17 | 1999-08-27 | Mitsubishi Electric Corp | 半導体圧力検出装置 |
US20020003274A1 (en) * | 1998-08-27 | 2002-01-10 | Janusz Bryzek | Piezoresistive sensor with epi-pocket isolation |
US6006607A (en) * | 1998-08-31 | 1999-12-28 | Maxim Integrated Products, Inc. | Piezoresistive pressure sensor with sculpted diaphragm |
JP2000121469A (ja) * | 1998-10-16 | 2000-04-28 | Mitsubishi Electric Corp | 圧力センサ |
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FR2871904B1 (fr) | 2004-06-22 | 2006-09-22 | Airbus Groupement D Interet Ec | Dispostif de commande de fermeture d'un coffre a bagages |
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RU2511282C1 (ru) * | 2012-10-31 | 2014-04-10 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Московский государственный технический университет имени Н.Э. Баумана (МГТУ им. Н.Э. Баумана) | Способ изготовления микроэлектромеханических структур и устройство для его осуществления |
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KR102427710B1 (ko) * | 2014-06-23 | 2022-07-29 | 마이크로소프트 테크놀로지 라이센싱, 엘엘씨 | 용량 기반 디지타이저 센서 |
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US11417611B2 (en) | 2020-02-25 | 2022-08-16 | Analog Devices International Unlimited Company | Devices and methods for reducing stress on circuit components |
US11573145B2 (en) | 2020-03-31 | 2023-02-07 | Rosemount Aerospace Inc. | Capacitive MEMS pressure sensor and method of manufacture |
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US11656138B2 (en) | 2020-06-19 | 2023-05-23 | Rosemount Inc. | Pressure sensor assembly |
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US4753856A (en) * | 1987-01-02 | 1988-06-28 | Dow Corning Corporation | Multilayer ceramic coatings from silicate esters and metal oxides |
US4918992A (en) * | 1987-11-05 | 1990-04-24 | Honeywell Inc. | High performance glass to metal solder joint |
US5049421A (en) * | 1989-01-30 | 1991-09-17 | Dresser Industries, Inc. | Transducer glass bonding technique |
US4970898A (en) * | 1989-09-20 | 1990-11-20 | Rosemount Inc. | Pressure transmitter with flame isolating plug |
US4930929A (en) * | 1989-09-26 | 1990-06-05 | Honeywell Inc. | Glass tube/stainless steel header interface for pressure sensor |
US5186055A (en) * | 1991-06-03 | 1993-02-16 | Eaton Corporation | Hermetic mounting system for a pressure transducer |
US5446616A (en) * | 1994-03-28 | 1995-08-29 | Litton Systems, Inc. | Electrode structure and method for anodically-bonded capacitive sensors |
-
1993
- 1993-08-24 IL IL10679093A patent/IL106790A/en not_active IP Right Cessation
- 1993-08-27 CA CA002141689A patent/CA2141689C/en not_active Expired - Lifetime
- 1993-08-27 EP EP93921227A patent/EP0672239B1/en not_active Expired - Lifetime
- 1993-08-27 DE DE69325664T patent/DE69325664T2/de not_active Expired - Lifetime
- 1993-08-27 RU RU95106596A patent/RU2120117C1/ru active
- 1993-08-27 WO PCT/US1993/008097 patent/WO1994005988A1/en active IP Right Grant
- 1993-08-27 JP JP50733694A patent/JP3410095B2/ja not_active Expired - Fee Related
-
1995
- 1995-06-06 US US08/471,608 patent/US5515732A/en not_active Expired - Lifetime
- 1995-06-07 US US08/486,309 patent/US5695590A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CA2141689C (en) | 2005-03-01 |
DE69325664T2 (de) | 1999-12-09 |
IL106790A0 (en) | 1994-08-26 |
RU2120117C1 (ru) | 1998-10-10 |
US5515732A (en) | 1996-05-14 |
JP3410095B2 (ja) | 2003-05-26 |
EP0672239B1 (en) | 1999-07-14 |
CA2141689A1 (en) | 1994-03-17 |
RU95106596A (ru) | 1996-11-20 |
DE69325664D1 (de) | 1999-08-19 |
EP0672239A4 (en) | 1996-09-04 |
WO1994005988A1 (en) | 1994-03-17 |
US5695590A (en) | 1997-12-09 |
EP0672239A1 (en) | 1995-09-20 |
JPH08500902A (ja) | 1996-01-30 |
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