IL106016A - Device and method for performing metrology with a thin layered layer thickness on a thin layer of membrane with local deformation and slope change - Google Patents

Device and method for performing metrology with a thin layered layer thickness on a thin layer of membrane with local deformation and slope change

Info

Publication number
IL106016A
IL106016A IL10601693A IL10601693A IL106016A IL 106016 A IL106016 A IL 106016A IL 10601693 A IL10601693 A IL 10601693A IL 10601693 A IL10601693 A IL 10601693A IL 106016 A IL106016 A IL 106016A
Authority
IL
Israel
Prior art keywords
layer
radiation
thickness
visible
polychromatic
Prior art date
Application number
IL10601693A
Other languages
English (en)
Hebrew (he)
Other versions
IL106016A0 (en
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of IL106016A0 publication Critical patent/IL106016A0/xx
Publication of IL106016A publication Critical patent/IL106016A/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
IL10601693A 1992-06-29 1993-06-14 Device and method for performing metrology with a thin layered layer thickness on a thin layer of membrane with local deformation and slope change IL106016A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/906,079 US5291269A (en) 1991-12-06 1992-06-29 Apparatus and method for performing thin film layer thickness metrology on a thin film layer having shape deformations and local slope variations

Publications (2)

Publication Number Publication Date
IL106016A0 IL106016A0 (en) 1993-10-20
IL106016A true IL106016A (en) 1996-12-05

Family

ID=25421897

Family Applications (1)

Application Number Title Priority Date Filing Date
IL10601693A IL106016A (en) 1992-06-29 1993-06-14 Device and method for performing metrology with a thin layered layer thickness on a thin layer of membrane with local deformation and slope change

Country Status (6)

Country Link
US (1) US5291269A (de)
EP (1) EP0577399B1 (de)
JP (1) JP2648440B2 (de)
DE (1) DE69316275T2 (de)
IL (1) IL106016A (de)
NO (1) NO932358L (de)

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IL109589A0 (en) * 1993-05-14 1994-08-26 Hughes Aircraft Co Apparatus and method for performing high spatial resolution thin film layer thickness metrology
US5412473A (en) * 1993-07-16 1995-05-02 Therma-Wave, Inc. Multiple angle spectroscopic analyzer utilizing interferometric and ellipsometric devices
US5436725A (en) * 1993-10-12 1995-07-25 Hughes Aircraft Company Cofocal optical system for thickness measurements of patterned wafers
US5555472A (en) * 1993-12-22 1996-09-10 Integrated Process Equipment Corp. Method and apparatus for measuring film thickness in multilayer thin film stack by comparison to a reference library of theoretical signatures
US5515167A (en) 1994-09-13 1996-05-07 Hughes Aircraft Company Transparent optical chuck incorporating optical monitoring
US5502564A (en) 1994-09-13 1996-03-26 Hughes Aircraft Company Substrate thickness measurement using oblique incidence multispectral interferometry
US5555474A (en) * 1994-12-21 1996-09-10 Integrated Process Equipment Corp. Automatic rejection of diffraction effects in thin film metrology
US5619371A (en) * 1995-03-02 1997-04-08 Southern Research Institute Confocal optical microscopy system for multi-layer data storage and retrieval
FR2737560B1 (fr) * 1995-08-02 1997-09-19 Sofie Instr Procede et dispositif pour quantifier in situ, par reflectometrie, la morphologie d'une zone localisee lors de la gravure de la couche superficielle d'une structure a couches minces
US5619548A (en) * 1995-08-11 1997-04-08 Oryx Instruments And Materials Corp. X-ray thickness gauge
US5739906A (en) * 1996-06-07 1998-04-14 The United States Of America As Represented By The Secretary Of Commerce Interferometric thickness variation test method for windows and silicon wafers using a diverging wavefront
US6078392A (en) * 1997-06-11 2000-06-20 Lockheed Martin Energy Research Corp. Direct-to-digital holography and holovision
US7042580B1 (en) * 1999-02-01 2006-05-09 Tokyo Electron Limited Apparatus for imaging metrology
US7177019B2 (en) * 1999-02-01 2007-02-13 Tokyo Electron Limited Apparatus for imaging metrology
US7095511B2 (en) * 2000-07-06 2006-08-22 Filmetrics, Inc. Method and apparatus for high-speed thickness mapping of patterned thin films
US6900900B2 (en) * 2000-11-16 2005-05-31 Process Diagnostics, Inc. Apparatus and method for enabling high resolution film thickness and thickness-uniformity measurements
US6674533B2 (en) * 2000-12-21 2004-01-06 Joseph K. Price Anodizing system with a coating thickness monitor and an anodized product
US7274463B2 (en) * 2003-12-30 2007-09-25 Sensory Analytics Anodizing system with a coating thickness monitor and an anodized product
US7365860B2 (en) * 2000-12-21 2008-04-29 Sensory Analytics System capable of determining applied and anodized coating thickness of a coated-anodized product
CN1808056B (zh) * 2001-09-21 2011-09-14 Kmac株式会社 利用二维检测器测量薄膜特性的装置及测量方法
US7286242B2 (en) * 2001-09-21 2007-10-23 Kmac Apparatus for measuring characteristics of thin film by means of two-dimensional detector and method of measuring the same
US7095496B2 (en) * 2001-12-12 2006-08-22 Tokyo Electron Limited Method and apparatus for position-dependent optical metrology calibration
US20080137098A1 (en) * 2002-01-25 2008-06-12 Mater Michael J Method of multiple wavelength interferometry
KR100947228B1 (ko) * 2003-06-20 2010-03-11 엘지전자 주식회사 광디스크의 두께 측정 방법
US7223503B2 (en) * 2003-12-30 2007-05-29 Taiwan Semiconductor Manufacturing Company Method for repairing opaque defects on semiconductor mask reticles
JP2006015271A (ja) 2004-07-02 2006-01-19 Seiko Epson Corp 薄膜形成方法
WO2006014263A2 (en) * 2004-07-02 2006-02-09 Filmetrics, Inc. Method and apparatus for high-speed thickness mapping of patterned thin films
KR100586911B1 (ko) * 2004-07-13 2006-06-08 박영태 카트리지 프리즘을 갖는 오토 콜리메이터 장치
EP1907791A4 (de) * 2005-07-27 2009-12-23 Corning Inc Vorrichtung und verfahren zur messung einer glasscheibe
DE102005038034B3 (de) 2005-08-09 2007-05-10 Leica Microsystems Semiconductor Gmbh Vorrichtung und Verfahren zur Inspektion der Oberfläche eines Wafers
US7440114B2 (en) * 2005-12-12 2008-10-21 Coherix, Inc. Off-axis paraboloid interferometric mirror with off focus illumination
US20070133008A1 (en) * 2005-12-12 2007-06-14 Coherix, Inc. Optical fiber delivered reference beam for interferometric imaging
US20070222460A1 (en) * 2006-03-07 2007-09-27 Price Joseph K Mobile apparatus capable of surface measurements
US7388675B2 (en) * 2006-04-03 2008-06-17 Valley Design Corporation Interferometers for the measurement of large diameter thin wafers
KR100916618B1 (ko) * 2007-06-19 2009-09-14 한국과학기술원 반사광측정법에 근거한 분산 백색광 간섭법을 이용한박막두께 및 형상측정방법
GB0822953D0 (en) 2008-12-16 2009-01-21 Stafforshire University Image processing
US8526008B2 (en) * 2010-12-17 2013-09-03 Corning Incorporated Interferometer with paraboloidal illumination and imaging optic and tilted imaging plane
CN106876238B (zh) * 2015-12-10 2021-01-19 中微半导体设备(上海)股份有限公司 监测等离子体工艺制程的装置和方法
KR20190106405A (ko) 2018-03-09 2019-09-18 연용현 대면적 평행광 발생 장치
JP7481090B2 (ja) 2019-01-09 2024-05-10 株式会社ディスコ 厚み計測装置、及び厚み計測装置を備えた加工装置
CN113624461B (zh) * 2021-08-19 2024-04-30 中国科学院合肥物质科学研究院 基于线结构光的薄膜均匀性检测系统

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JPH0731049B2 (ja) * 1986-07-25 1995-04-10 オリンパス光学工業株式会社 光学式膜厚測定装置
JPH0617774B2 (ja) * 1987-06-22 1994-03-09 大日本スクリ−ン製造株式会社 微小高低差測定装置
JPH01143904A (ja) * 1987-11-30 1989-06-06 Toshiba Corp 薄膜検査装置
US4909631A (en) * 1987-12-18 1990-03-20 Tan Raul Y Method for film thickness and refractive index determination
JPH01206203A (ja) * 1988-02-12 1989-08-18 Toshiba Corp 膜厚不良検査方法
US5042949A (en) * 1989-03-17 1991-08-27 Greenberg Jeffrey S Optical profiler for films and substrates
US5101111A (en) * 1989-07-13 1992-03-31 Dainippon Screen Mfg. Co., Ltd. Method of measuring thickness of film with a reference sample having a known reflectance
JPH0351707A (ja) * 1989-07-19 1991-03-06 Toyota Motor Corp 曲面液晶セル用ガラス基板の品質判定方法
IT1241133B (it) * 1990-04-20 1993-12-29 Electronic Systems Spa Apparecchiatura e metodo di scansione per la misura con lettori laser dello spessore di rivestimenti opachi o trasparenti applicati a superfici di qualsiasi genere
US5293214A (en) * 1991-12-06 1994-03-08 Hughes Aircraft Company Apparatus and method for performing thin film layer thickness metrology by deforming a thin film layer into a reflective condenser

Also Published As

Publication number Publication date
US5291269A (en) 1994-03-01
NO932358D0 (no) 1993-06-28
NO932358L (no) 1993-12-30
JPH0666524A (ja) 1994-03-08
JP2648440B2 (ja) 1997-08-27
DE69316275T2 (de) 1998-04-23
EP0577399B1 (de) 1998-01-14
DE69316275D1 (de) 1998-02-19
EP0577399A2 (de) 1994-01-05
IL106016A0 (en) 1993-10-20
EP0577399A3 (de) 1995-05-10

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Legal Events

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