IE52096B1 - An electron beam exposure method - Google Patents

An electron beam exposure method

Info

Publication number
IE52096B1
IE52096B1 IE1949/81A IE194981A IE52096B1 IE 52096 B1 IE52096 B1 IE 52096B1 IE 1949/81 A IE1949/81 A IE 1949/81A IE 194981 A IE194981 A IE 194981A IE 52096 B1 IE52096 B1 IE 52096B1
Authority
IE
Ireland
Prior art keywords
electron beam
aperture
diaphragm
image
electron
Prior art date
Application number
IE1949/81A
Other languages
English (en)
Other versions
IE811949L (en
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Publication of IE811949L publication Critical patent/IE811949L/xx
Publication of IE52096B1 publication Critical patent/IE52096B1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H10P95/00—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
IE1949/81A 1980-08-26 1981-08-25 An electron beam exposure method IE52096B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55117412A JPS5740927A (en) 1980-08-26 1980-08-26 Exposing method of electron beam

Publications (2)

Publication Number Publication Date
IE811949L IE811949L (en) 1982-02-26
IE52096B1 true IE52096B1 (en) 1987-06-10

Family

ID=14711002

Family Applications (1)

Application Number Title Priority Date Filing Date
IE1949/81A IE52096B1 (en) 1980-08-26 1981-08-25 An electron beam exposure method

Country Status (5)

Country Link
US (1) US4413187A (OSRAM)
EP (1) EP0047104B1 (OSRAM)
JP (1) JPS5740927A (OSRAM)
DE (1) DE3170405D1 (OSRAM)
IE (1) IE52096B1 (OSRAM)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59124719A (ja) * 1982-12-29 1984-07-18 Fujitsu Ltd 電子ビ−ム露光装置
JPS60201626A (ja) * 1984-03-27 1985-10-12 Canon Inc 位置合わせ装置
JPS6182428A (ja) * 1984-09-29 1986-04-26 Toshiba Corp 電荷ビ−ム光学鏡筒のレンズ調整方法
GB2197751A (en) * 1986-11-24 1988-05-25 Philips Electronic Associated Variable shaped spot electron beam pattern generator
JP3094927B2 (ja) * 1996-11-19 2000-10-03 日本電気株式会社 電子線露光装置及びその露光方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1439900A1 (de) * 1964-12-07 1968-12-19 Elektromat Werk Fuer Automatis Verfahren und Einrichtung zum Zentrieren des Elektronenstrahles bei Elektronenstrahl-Bearbeitungsgeraeten
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
US3894271A (en) * 1973-08-31 1975-07-08 Ibm Method and apparatus for aligning electron beams
US3900736A (en) * 1974-01-28 1975-08-19 Ibm Method and apparatus for positioning a beam of charged particles
GB1605087A (en) * 1977-05-31 1981-12-16 Rikagaku Kenkyusho Method for shaping a beam of electrically charged particles
US4243866A (en) * 1979-01-11 1981-01-06 International Business Machines Corporation Method and apparatus for forming a variable size electron beam

Also Published As

Publication number Publication date
EP0047104A1 (en) 1982-03-10
EP0047104B1 (en) 1985-05-08
JPH0135494B2 (OSRAM) 1989-07-25
IE811949L (en) 1982-02-26
US4413187A (en) 1983-11-01
JPS5740927A (en) 1982-03-06
DE3170405D1 (en) 1985-06-13

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