HUT77897A - Eljárás és berendezés szerves savat tartalmazó oldat ártalmatlanítására - Google Patents

Eljárás és berendezés szerves savat tartalmazó oldat ártalmatlanítására

Info

Publication number
HUT77897A
HUT77897A HU9602666A HU9602666A HUT77897A HU T77897 A HUT77897 A HU T77897A HU 9602666 A HU9602666 A HU 9602666A HU 9602666 A HU9602666 A HU 9602666A HU T77897 A HUT77897 A HU T77897A
Authority
HU
Hungary
Prior art keywords
disposing
solution containing
organic acid
organic
acid
Prior art date
Application number
HU9602666A
Other languages
English (en)
Other versions
HU9602666D0 (en
HU220399B (hu
Inventor
Dietmar Bege
Horst-Otto Bertholdt
Original Assignee
Siemens Ag.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=6514070&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=HUT77897(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Siemens Ag. filed Critical Siemens Ag.
Publication of HU9602666D0 publication Critical patent/HU9602666D0/hu
Publication of HUT77897A publication Critical patent/HUT77897A/hu
Publication of HU220399B publication Critical patent/HU220399B/hu

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
    • G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
    • G21F9/04—Treating liquids
    • G21F9/06—Processing
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
    • C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F9/00—Multistage treatment of water, waste water or sewage
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/722—Oxidation by peroxides
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/78—Treatment of water, waste water, or sewage by oxidation with ozone
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00—Nature of the contaminant
    • C02F2101/006—Radioactive compounds

Landscapes

  • Engineering & Computer Science (AREA)
  • Hydrology & Water Resources (AREA)
  • Organic Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Water Supply & Treatment (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Physical Water Treatments (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Treatment Of Water By Ion Exchange (AREA)
  • Removal Of Specific Substances (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Apparatus For Disinfection Or Sterilisation (AREA)
HU9602666A 1994-03-28 1995-03-28 Eljárás és berendezés szerves savat tartalmazó oldat ártalmatlanítására HU220399B (hu)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4410747A DE4410747A1 (de) 1994-03-28 1994-03-28 Verfahren und Einrichtung zum Entsorgen einer Lösung, die eine organische Säure enthält
PCT/DE1995/000417 WO1995026555A1 (de) 1994-03-28 1995-03-28 Verfahren und einrichtung zum entsorgen einer lösung, die eine organische säure enthält

Publications (3)

Publication Number Publication Date
HU9602666D0 HU9602666D0 (en) 1996-11-28
HUT77897A true HUT77897A (hu) 1998-09-28
HU220399B HU220399B (hu) 2002-01-28

Family

ID=6514070

Family Applications (1)

Application Number Title Priority Date Filing Date
HU9602666A HU220399B (hu) 1994-03-28 1995-03-28 Eljárás és berendezés szerves savat tartalmazó oldat ártalmatlanítására

Country Status (9)

Country Link
EP (1) EP0753196B1 (hu)
JP (1) JP2941429B2 (hu)
CA (1) CA2186617C (hu)
DE (2) DE4410747A1 (hu)
ES (1) ES2123970T3 (hu)
FI (1) FI113716B (hu)
HU (1) HU220399B (hu)
SK (1) SK282036B6 (hu)
WO (1) WO1995026555A1 (hu)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4020512B2 (ja) 1998-09-29 2007-12-12 株式会社日立製作所 化学除染方法及びその装置
US6973154B2 (en) 1998-09-29 2005-12-06 Hitachi, Ltd. Method of chemical decontamination and system therefor
DE19851852A1 (de) * 1998-11-10 2000-05-11 Siemens Ag Verfahren zur Dekontamination einer Oberfläche eines Bauteiles
KR20010080404A (ko) * 1998-11-10 2001-08-22 칼 하인쯔 호르닝어 금속 양이온을 처리하기 위한 방법
TW529041B (en) 2000-12-21 2003-04-21 Toshiba Corp Chemical decontamination method and treatment method and apparatus of chemical decontamination solution
JP3809577B2 (ja) 2001-04-03 2006-08-16 株式会社日立製作所 放射性物質除染方法及び放射性物質除染装置
KR100724710B1 (ko) 2002-11-21 2007-06-04 가부시끼가이샤 도시바 방사화 부품의 화학적 오염제거 시스템 및 방법
JP4131814B2 (ja) * 2002-11-21 2008-08-13 株式会社東芝 放射化部品の化学除染方法および装置
JP4309324B2 (ja) * 2004-09-30 2009-08-05 株式会社東芝 化学除染方法および化学除染装置
CA2633626C (en) 2005-11-29 2010-05-04 Areva Np Gmbh Method for the decontamination of an oxide layer-containing surface of a component or a system of a nuclear facility
DE102007038947A1 (de) 2007-08-17 2009-02-26 Areva Np Gmbh Verfahren zur Dekontamination von mit Alphastrahlern kontaminierten Oberflächen von Nuklearanlagen
WO2013041595A1 (de) 2011-09-20 2013-03-28 Nis Ingenieurgesellschaft Mbh Verfahren zum abbau einer oxidschicht
DE102013102331B3 (de) 2013-03-08 2014-07-03 Horst-Otto Bertholdt Verfahren zum Abbau einer Oxidschicht
JP6591225B2 (ja) * 2015-08-03 2019-10-16 株式会社東芝 除染方法
WO2018149862A1 (de) 2017-02-14 2018-08-23 Siempelkamp NIS Ingenieurgesellschaft mbH Verfahren zum abbau einer radionuklidhaltigen oxidschicht

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5775429A (en) * 1980-10-28 1982-05-12 Toshiba Corp Manufacture of semiconductor device
DE3501528A1 (de) * 1985-01-18 1986-07-24 Forschungsinstitut für Edelmetalle und Metallchemie, 7070 Schwäbisch Gmünd Verfahren zur oxidation schwer abbaubarer organischer verbindungen, wie komplexbildner und schwermetallkomplexe, in abwaessern
DE3644080A1 (de) * 1986-12-23 1988-07-07 Siemens Ag Verwendung eines oxidationsmittels zum entgiften von industriellen abwaessern
US4943357A (en) * 1988-06-27 1990-07-24 Photo Redux Corp. Photodegradation of metal chelate complexes
DE3907670A1 (de) * 1989-03-09 1990-09-13 Hartmut Dr Hoffmann Vorrichtung und verfahren zur bestrahlung von chemischen substanzen und verbindungen
US5043080A (en) * 1990-02-26 1991-08-27 Solarchem Enterprises Inc. Treating contaminated effluents and groundwaters
DE4006234A1 (de) * 1990-02-28 1991-08-29 Goema Dr Goetzelmann Physikali Verfahren zum abbau von in einer fluessigkeit enthaltenen schadstoffen
NL9001721A (nl) * 1990-07-30 1991-01-02 Eco Purification Syst Werkwijze voor de zuivering van verontreinigd water.
DE4026831A1 (de) * 1990-08-24 1992-02-27 Inventa Ag Katalytische oxidation von abwasser
WO1992003829A1 (en) * 1990-08-28 1992-03-05 Electric Power Research Institute Organic material oxidation process utilizing no added catalyst
US5126111A (en) * 1990-12-05 1992-06-30 Nutech Energy Systems Inc. Fluid purification
DE4111663A1 (de) * 1991-04-10 1992-10-15 Diehl Umwelttechnik Gmbh Verfahren und vorrichtung zur photolyse von organischen schadstoffen in wasser
DE4126971A1 (de) * 1991-08-14 1993-02-18 Siemens Ag Verfahren und einrichtung zur entsorgung einer organischen substanz
US5205999A (en) * 1991-09-18 1993-04-27 British Nuclear Fuels Plc Actinide dissolution
DE4136949A1 (de) * 1991-11-11 1993-05-13 Roswitha Niedermeier Verfahren und vorrichtung zur photooxidativen reinigung von organisch belastetem wasser
DE4137864C2 (de) * 1991-11-14 1994-07-28 Lothar Dr Ebner Verfahren zur katalytischen Oxidationsbehandlung von Abwasser
DE4138421C2 (de) * 1991-11-22 1993-12-02 Degussa Verfahren zum Abbau von Schadstoffen in Wasser mittels Wasserstoffperoxid unter UV-Bestrahlung

Also Published As

Publication number Publication date
EP0753196B1 (de) 1998-09-30
DE59503784D1 (de) 1998-11-05
EP0753196A1 (de) 1997-01-15
HU9602666D0 (en) 1996-11-28
SK123796A3 (en) 1997-07-09
ES2123970T3 (es) 1999-01-16
SK282036B6 (sk) 2001-10-08
CA2186617C (en) 2001-10-30
JPH09510784A (ja) 1997-10-28
WO1995026555A1 (de) 1995-10-05
HU220399B (hu) 2002-01-28
DE4410747A1 (de) 1995-10-05
FI963899A (fi) 1996-09-27
FI963899A0 (fi) 1996-09-27
FI113716B (fi) 2004-05-31
CA2186617A1 (en) 1995-10-05
JP2941429B2 (ja) 1999-08-25

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Legal Events

Date Code Title Description
HPC4 Succession in title of patentee

Owner name: FRAMATOME ANP GMBH, DE

HC9A Change of name, address

Owner name: AREVA NP GMBH, DE

Free format text: FORMER OWNER(S): SIEMENS AKTIENGESELLSCHAFT, DE; FRAMATOME ANP GMBH, DE

HC9A Change of name, address

Owner name: AREVA NP GMBH, DE

Free format text: FORMER OWNER(S): SIEMENS AKTIENGESELLSCHAFT, DE; AREVA NP GMBH, DE; FRAMATOME ANP GMBH, DE