HK74389A - Bath for the galvanic deposition of gold alloys - Google Patents
Bath for the galvanic deposition of gold alloysInfo
- Publication number
- HK74389A HK74389A HK743/89A HK74389A HK74389A HK 74389 A HK74389 A HK 74389A HK 743/89 A HK743/89 A HK 743/89A HK 74389 A HK74389 A HK 74389A HK 74389 A HK74389 A HK 74389A
- Authority
- HK
- Hong Kong
- Prior art keywords
- bath
- galvanic deposition
- gold alloys
- alloys
- gold
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/62—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of gold
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Cosmetics (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19833319772 DE3319772A1 (de) | 1983-05-27 | 1983-05-27 | Bad fuer die galvanische abscheidung von goldlegierungen |
Publications (1)
Publication Number | Publication Date |
---|---|
HK74389A true HK74389A (en) | 1989-09-22 |
Family
ID=6200354
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK743/89A HK74389A (en) | 1983-05-27 | 1989-09-14 | Bath for the galvanic deposition of gold alloys |
Country Status (8)
Country | Link |
---|---|
US (1) | US4517060A (fr) |
EP (1) | EP0126921B1 (fr) |
JP (1) | JPS59232289A (fr) |
AT (1) | AT383148B (fr) |
DE (2) | DE3319772A1 (fr) |
ES (1) | ES532837A0 (fr) |
HK (1) | HK74389A (fr) |
IE (1) | IE56353B1 (fr) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB8903818D0 (en) * | 1989-02-20 | 1989-04-05 | Engelhard Corp | Electrolytic deposition of gold-containing alloys |
DE3905705A1 (de) * | 1989-02-24 | 1990-08-30 | Degussa | Bad zur galvanischen abscheidung von feingoldueberzuegen |
GB2309032A (en) * | 1996-01-11 | 1997-07-16 | Procter & Gamble | Bismuth salts and complexes with nitrogen-free organic diphosphonic acids |
DE10110743A1 (de) * | 2001-02-28 | 2002-09-05 | Wieland Dental & Technik Gmbh | Bad zur galvanischen Abscheidung von Gold und Goldlegierungen sowie dessen Verwendung |
SG127854A1 (en) | 2005-06-02 | 2006-12-29 | Rohm & Haas Elect Mat | Improved gold electrolytes |
US20090104463A1 (en) | 2006-06-02 | 2009-04-23 | Rohm And Haas Electronic Materials Llc | Gold alloy electrolytes |
DE112021008234T5 (de) | 2021-09-16 | 2024-07-11 | P & S, Galvasols | Hochgeschwindigkeits-elektroformungs- /elektroplattierungsbad für reines gold |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH494284A (fr) * | 1968-11-28 | 1970-07-31 | Sel Rex Corp | Procédé pour le dépôt électrolytique d'un alliage d'or avec au moins un autre métal commun et bain aqueux de placage pour la mise en oeuvre de ce procédé |
FR2053770A5 (en) * | 1969-07-17 | 1971-04-16 | Radiotechnique Compelec | Electrolytic deposition of gold-bismuth - alloys |
CH615464A5 (en) * | 1976-06-01 | 1980-01-31 | Systemes Traitements Surfaces | Special compositions and particular additives for gold electrolysis baths and their use |
US4199416A (en) * | 1977-05-03 | 1980-04-22 | Johnson, Matthey & Co., Limited | Composition for the electroplating of gold |
JPS5951058B2 (ja) * | 1977-07-20 | 1984-12-12 | 松下電器産業株式会社 | 磁気記録再生装置 |
FR2405312A1 (fr) * | 1977-10-10 | 1979-05-04 | Oxy Metal Industries Corp | Bains electrolytiques pour le depot d'alliages d'or |
JPS609117B2 (ja) * | 1980-06-19 | 1985-03-07 | セイコーエプソン株式会社 | 金合金メッキ浴 |
-
1983
- 1983-05-27 DE DE19833319772 patent/DE3319772A1/de active Granted
-
1984
- 1984-04-10 EP EP84103995A patent/EP0126921B1/fr not_active Expired
- 1984-04-10 DE DE8484103995T patent/DE3476225D1/de not_active Expired
- 1984-05-22 IE IE1268/84A patent/IE56353B1/en not_active IP Right Cessation
- 1984-05-22 AT AT0168784A patent/AT383148B/de not_active IP Right Cessation
- 1984-05-25 JP JP59104892A patent/JPS59232289A/ja active Granted
- 1984-05-25 ES ES532837A patent/ES532837A0/es active Granted
- 1984-05-29 US US06/615,471 patent/US4517060A/en not_active Expired - Lifetime
-
1989
- 1989-09-14 HK HK743/89A patent/HK74389A/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US4517060A (en) | 1985-05-14 |
IE56353B1 (en) | 1991-07-03 |
AT383148B (de) | 1987-05-25 |
EP0126921B1 (fr) | 1989-01-18 |
ES8502741A1 (es) | 1985-02-01 |
ATA168784A (de) | 1986-10-15 |
DE3476225D1 (en) | 1989-02-23 |
DE3319772C2 (fr) | 1991-05-16 |
ES532837A0 (es) | 1985-02-01 |
JPH0565598B2 (fr) | 1993-09-20 |
DE3319772A1 (de) | 1984-11-29 |
IE841268L (en) | 1984-11-27 |
EP0126921A2 (fr) | 1984-12-05 |
JPS59232289A (ja) | 1984-12-27 |
EP0126921A3 (en) | 1985-01-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |