HK48090A - Semiconductor device and method of fabrication thereof - Google Patents
Semiconductor device and method of fabrication thereofInfo
- Publication number
- HK48090A HK48090A HK480/90A HK48090A HK48090A HK 48090 A HK48090 A HK 48090A HK 480/90 A HK480/90 A HK 480/90A HK 48090 A HK48090 A HK 48090A HK 48090 A HK48090 A HK 48090A
- Authority
- HK
- Hong Kong
- Prior art keywords
- fabrication
- semiconductor device
- semiconductor
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000005389 semiconductor device fabrication Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7833—Field effect transistors with field effect produced by an insulated gate with lightly doped drain or source extension, e.g. LDD MOSFET's; DDD MOSFET's
- H01L29/7836—Field effect transistors with field effect produced by an insulated gate with lightly doped drain or source extension, e.g. LDD MOSFET's; DDD MOSFET's with a significant overlap between the lightly doped extension and the gate electrode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/8238—Complementary field-effect transistors, e.g. CMOS
- H01L21/823892—Complementary field-effect transistors, e.g. CMOS with a particular manufacturing method of the wells or tubs, e.g. twin tubs, high energy well implants, buried implanted layers for lateral isolation [BILLI]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7831—Field effect transistors with field effect produced by an insulated gate with multiple gate structure
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
- H10B12/39—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells the capacitor and the transistor being in a same trench
- H10B12/395—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells the capacitor and the transistor being in a same trench the transistor being vertical
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58243801A JPH0646662B2 (en) | 1983-12-26 | 1983-12-26 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
HK48090A true HK48090A (en) | 1990-06-29 |
Family
ID=17109142
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK417/90A HK41790A (en) | 1983-12-26 | 1990-05-31 | Semiconductor device and method of fabrication thereof |
HK480/90A HK48090A (en) | 1983-12-26 | 1990-06-21 | Semiconductor device and method of fabrication thereof |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK417/90A HK41790A (en) | 1983-12-26 | 1990-05-31 | Semiconductor device and method of fabrication thereof |
Country Status (7)
Country | Link |
---|---|
JP (1) | JPH0646662B2 (en) |
KR (1) | KR930001564B1 (en) |
DE (1) | DE3446928A1 (en) |
FR (1) | FR2561042B1 (en) |
GB (2) | GB2152284B (en) |
HK (2) | HK41790A (en) |
IT (1) | IT1179545B (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62169468A (en) * | 1986-01-22 | 1987-07-25 | Nec Corp | Semiconductor integrated circuit device |
JPS63119574A (en) * | 1986-11-07 | 1988-05-24 | Toshiba Corp | Manufacture of semiconductor device |
US5183773A (en) * | 1989-04-13 | 1993-02-02 | Mitsubishi Denki Kabushiki Kaisha | Method of manufacturing semiconductor device including such input protection transistor |
US5142345A (en) * | 1989-04-13 | 1992-08-25 | Mitsubishi Denki Kabushiki Kaisha | Structure of input protection transistor in semiconductor device including memory transistor having double-layered gate and method of manufacturing semiconductor device including such input protection transistor |
JP2953192B2 (en) * | 1991-05-29 | 1999-09-27 | 日本電気株式会社 | Semiconductor integrated circuit |
JP3456242B2 (en) * | 1993-01-07 | 2003-10-14 | セイコーエプソン株式会社 | Semiconductor device and manufacturing method thereof |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US373249A (en) * | 1887-11-15 | Clock | ||
GB1170705A (en) * | 1967-02-27 | 1969-11-12 | Hitachi Ltd | An Insulated Gate Type Field Effect Semiconductor Device having a Breakdown Preventing Circuit Device and a method of manufacturing the same |
US3999212A (en) * | 1967-03-03 | 1976-12-21 | Hitachi, Ltd. | Field effect semiconductor device having a protective diode |
DE2545871B2 (en) * | 1974-12-06 | 1980-06-19 | International Business Machines Corp., Armonk, N.Y. (V.St.A.) | Field effect transistor with improved stability of the threshold voltage |
NL176322C (en) * | 1976-02-24 | 1985-03-18 | Philips Nv | SEMICONDUCTOR DEVICE WITH SAFETY CIRCUIT. |
DE2940954A1 (en) * | 1979-10-09 | 1981-04-23 | Nixdorf Computer Ag, 4790 Paderborn | METHOD FOR THE PRODUCTION OF HIGH-VOLTAGE MOS TRANSISTORS CONTAINING MOS-INTEGRATED CIRCUITS AND CIRCUIT ARRANGEMENT FOR SWITCHING POWER CIRCUITS USING SUCH HIGH-VOLTAGE MOS TRANSISTORS |
US4342045A (en) * | 1980-04-28 | 1982-07-27 | Advanced Micro Devices, Inc. | Input protection device for integrated circuits |
JPS5715459A (en) * | 1980-07-01 | 1982-01-26 | Fujitsu Ltd | Semiconductor integrated circuit |
US4366613A (en) * | 1980-12-17 | 1983-01-04 | Ibm Corporation | Method of fabricating an MOS dynamic RAM with lightly doped drain |
JPS57188364U (en) * | 1981-05-25 | 1982-11-30 | ||
JPS57211272A (en) * | 1981-06-23 | 1982-12-25 | Toshiba Corp | Semiconductor device |
-
1983
- 1983-12-26 JP JP58243801A patent/JPH0646662B2/en not_active Expired - Lifetime
-
1984
- 1984-12-19 FR FR8419428A patent/FR2561042B1/en not_active Expired
- 1984-12-20 KR KR1019840008171A patent/KR930001564B1/en not_active IP Right Cessation
- 1984-12-21 DE DE3446928A patent/DE3446928A1/en not_active Ceased
- 1984-12-21 GB GB08432417A patent/GB2152284B/en not_active Expired
- 1984-12-24 IT IT24246/84A patent/IT1179545B/en active
-
1987
- 1987-02-09 GB GB08702881A patent/GB2186426B/en not_active Expired
-
1990
- 1990-05-31 HK HK417/90A patent/HK41790A/en not_active IP Right Cessation
- 1990-06-21 HK HK480/90A patent/HK48090A/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
GB2152284A (en) | 1985-07-31 |
IT1179545B (en) | 1987-09-16 |
FR2561042B1 (en) | 1988-11-10 |
IT8424246A0 (en) | 1984-12-24 |
GB8702881D0 (en) | 1987-03-18 |
GB2186426A (en) | 1987-08-12 |
FR2561042A1 (en) | 1985-09-13 |
KR850005166A (en) | 1985-08-21 |
DE3446928A1 (en) | 1985-07-04 |
HK41790A (en) | 1990-06-08 |
GB8432417D0 (en) | 1985-02-06 |
JPH0646662B2 (en) | 1994-06-15 |
GB2152284B (en) | 1988-01-06 |
GB2186426B (en) | 1988-01-06 |
KR930001564B1 (en) | 1993-03-04 |
JPS60136374A (en) | 1985-07-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |