HK1249191A1 - 移動體裝置、曝光裝置、平面顯示器的製造方法、組件製造方法、及測量方法 - Google Patents

移動體裝置、曝光裝置、平面顯示器的製造方法、組件製造方法、及測量方法

Info

Publication number
HK1249191A1
HK1249191A1 HK18108658.6A HK18108658A HK1249191A1 HK 1249191 A1 HK1249191 A1 HK 1249191A1 HK 18108658 A HK18108658 A HK 18108658A HK 1249191 A1 HK1249191 A1 HK 1249191A1
Authority
HK
Hong Kong
Prior art keywords
manufacturing
flat panel
panel display
mobile device
exposure
Prior art date
Application number
HK18108658.6A
Other languages
English (en)
Inventor
青木保夫
Original Assignee
株式會社尼康
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式會社尼康 filed Critical 株式會社尼康
Publication of HK1249191A1 publication Critical patent/HK1249191A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
HK18108658.6A 2015-09-30 2018-07-04 移動體裝置、曝光裝置、平面顯示器的製造方法、組件製造方法、及測量方法 HK1249191A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015192793 2015-09-30
PCT/JP2016/078636 WO2017057465A1 (ja) 2015-09-30 2016-09-28 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法、並びに計測方法

Publications (1)

Publication Number Publication Date
HK1249191A1 true HK1249191A1 (zh) 2018-10-26

Family

ID=58427727

Family Applications (1)

Application Number Title Priority Date Filing Date
HK18108658.6A HK1249191A1 (zh) 2015-09-30 2018-07-04 移動體裝置、曝光裝置、平面顯示器的製造方法、組件製造方法、及測量方法

Country Status (6)

Country Link
JP (1) JP6958354B2 (zh)
KR (1) KR20180059864A (zh)
CN (1) CN108139676B (zh)
HK (1) HK1249191A1 (zh)
TW (1) TW201729321A (zh)
WO (1) WO2017057465A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180059810A (ko) * 2015-09-30 2018-06-05 가부시키가이샤 니콘 노광 장치 및 노광 방법, 그리고 플랫 패널 디스플레이 제조 방법
WO2017057465A1 (ja) * 2015-09-30 2017-04-06 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法、並びに計測方法
CN108139683B (zh) * 2015-09-30 2021-11-05 株式会社尼康 曝光装置及曝光方法、以及平面显示器制造方法

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JP2001004357A (ja) * 1999-06-22 2001-01-12 Yaskawa Electric Corp 移動体の寄り付き位置検出方法
JP3428639B2 (ja) * 2002-08-28 2003-07-22 株式会社ニコン 走査型露光装置及びデバイス製造方法
JP2006156508A (ja) * 2004-11-26 2006-06-15 Nikon Corp 目標値決定方法、移動方法及び露光方法、露光装置及びリソグラフィシステム
TWI653511B (zh) * 2006-08-31 2019-03-11 日商尼康股份有限公司 Exposure apparatus, exposure method, and component manufacturing method
KR20100057758A (ko) * 2007-08-24 2010-06-01 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 그리고 패턴 형성 방법 및 패턴 형성 장치
US8422015B2 (en) * 2007-11-09 2013-04-16 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
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TW201100975A (en) 2009-04-21 2011-01-01 Nikon Corp Moving-object apparatus, exposure apparatus, exposure method, and device manufacturing method
JP5578485B2 (ja) * 2009-10-14 2014-08-27 株式会社ニコン 移動体装置、露光装置、及びデバイス製造方法
US20110141448A1 (en) * 2009-11-27 2011-06-16 Nikon Corporation Substrate carrier device, substrate carrying method, substrate supporting member, substrate holding device, exposure apparatus, exposure method and device manufacturing method
TWI777060B (zh) * 2010-02-17 2022-09-11 日商尼康股份有限公司 搬送裝置、曝光裝置以及元件製造方法
CN102566287B (zh) * 2010-12-16 2014-02-19 上海微电子装备有限公司 光刻机的垂向控制装置及方法
JP5910992B2 (ja) * 2012-04-04 2016-04-27 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
JP6132079B2 (ja) * 2012-04-04 2017-05-24 株式会社ニコン 露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
JP5494755B2 (ja) * 2012-08-03 2014-05-21 株式会社ニコン マーク検出方法及び装置、位置制御方法及び装置、露光方法及び装置、並びにデバイス製造方法
EP3723111B1 (en) * 2012-10-02 2021-09-08 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
JP2014098731A (ja) * 2012-11-13 2014-05-29 Nikon Corp 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
KR101448509B1 (ko) * 2013-12-04 2014-10-13 순환엔지니어링 주식회사 직선 운동 평면 구동형 겐트리 스테이지의 동적 및 열변형 에러 실시간 보상 시스템, 스테이지 장치 및 제조, 계측 및 검사 장비
CN106415397B (zh) * 2014-03-28 2018-09-21 株式会社尼康 移动体装置、曝光装置、平板显示器的制造方法、组件制造方法及移动体驱动方法
WO2017057465A1 (ja) * 2015-09-30 2017-04-06 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法、並びに計測方法
CN111650818B (zh) * 2015-09-30 2024-03-15 株式会社尼康 曝光装置、平面显示器的制造方法、及组件制造方法
CN108139685B (zh) * 2015-09-30 2020-12-04 株式会社尼康 曝光装置、平面显示器的制造方法、组件制造方法、及曝光方法

Also Published As

Publication number Publication date
CN108139676B (zh) 2022-03-18
JP6958354B2 (ja) 2021-11-02
KR20180059864A (ko) 2018-06-05
WO2017057465A1 (ja) 2017-04-06
JPWO2017057465A1 (ja) 2018-07-19
TW202044465A (zh) 2020-12-01
CN108139676A (zh) 2018-06-08
TW201729321A (zh) 2017-08-16

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