HK1205279A1 - 液浸构件及曝光装置 - Google Patents

液浸构件及曝光装置 Download PDF

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Publication number
HK1205279A1
HK1205279A1 HK15105595.1A HK15105595A HK1205279A1 HK 1205279 A1 HK1205279 A1 HK 1205279A1 HK 15105595 A HK15105595 A HK 15105595A HK 1205279 A1 HK1205279 A1 HK 1205279A1
Authority
HK
Hong Kong
Prior art keywords
liquid immersion
substrate
exposure apparatus
liquid
shot region
Prior art date
Application number
HK15105595.1A
Other languages
English (en)
Chinese (zh)
Inventor
Shinji Sato
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Publication of HK1205279A1 publication Critical patent/HK1205279A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
HK15105595.1A 2012-04-10 2013-03-22 液浸构件及曝光装置 HK1205279A1 (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261622182P 2012-04-10 2012-04-10
US61/622,182 2012-04-10
US13/800,448 2013-03-13
US13/800,448 US9268231B2 (en) 2012-04-10 2013-03-13 Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
PCT/JP2013/059432 WO2013153965A1 (en) 2012-04-10 2013-03-22 Liquid immersion member and exposure apparatus

Publications (1)

Publication Number Publication Date
HK1205279A1 true HK1205279A1 (zh) 2015-12-11

Family

ID=49292051

Family Applications (2)

Application Number Title Priority Date Filing Date
HK15105595.1A HK1205279A1 (zh) 2012-04-10 2013-03-22 液浸构件及曝光装置
HK18116511.6A HK1257550A1 (zh) 2012-04-10 2018-12-24 液浸构件及曝光装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
HK18116511.6A HK1257550A1 (zh) 2012-04-10 2018-12-24 液浸构件及曝光装置

Country Status (8)

Country Link
US (5) US9268231B2 (https=)
EP (1) EP2836876B1 (https=)
JP (3) JP6447131B2 (https=)
KR (1) KR102147071B1 (https=)
CN (2) CN108614393A (https=)
HK (2) HK1205279A1 (https=)
TW (3) TWI606305B (https=)
WO (1) WO2013153965A1 (https=)

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US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
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CN108139683B (zh) * 2015-09-30 2021-11-05 株式会社尼康 曝光装置及曝光方法、以及平面显示器制造方法
CN118584764A (zh) 2017-12-15 2024-09-03 Asml荷兰有限公司 流体处置结构、光刻设备、以及使用流体处置结构的方法
JP6610726B2 (ja) * 2018-07-11 2019-11-27 株式会社ニコン 液浸部材、露光装置及び露光方法、並びにデバイス製造方法

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KR20120113238A (ko) * 2010-01-08 2012-10-12 가부시키가이샤 니콘 액침 부재, 노광 장치, 노광 방법, 및 디바이스 제조 방법
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US9323160B2 (en) 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium

Also Published As

Publication number Publication date
JP2018136581A (ja) 2018-08-30
US9268231B2 (en) 2016-02-23
US10409177B2 (en) 2019-09-10
US20160161860A1 (en) 2016-06-09
JP6593493B2 (ja) 2019-10-23
TWI606305B (zh) 2017-11-21
US20180217511A1 (en) 2018-08-02
TW201935146A (zh) 2019-09-01
TW201348890A (zh) 2013-12-01
US20170108786A1 (en) 2017-04-20
WO2013153965A1 (en) 2013-10-17
JP6447131B2 (ja) 2019-01-09
CN108614393A (zh) 2018-10-02
EP2836876B1 (en) 2020-08-05
US10768537B2 (en) 2020-09-08
EP2836876A1 (en) 2015-02-18
KR20150003276A (ko) 2015-01-08
US20130265556A1 (en) 2013-10-10
CN104508560B (zh) 2018-05-22
US9927724B2 (en) 2018-03-27
KR102147071B1 (ko) 2020-08-24
TW201740219A (zh) 2017-11-16
HK1257550A1 (zh) 2019-10-25
HK1207908A1 (en) 2016-02-12
JP2015514304A (ja) 2015-05-18
US9557654B2 (en) 2017-01-31
US20190391503A1 (en) 2019-12-26
JP2019215586A (ja) 2019-12-19
CN104508560A (zh) 2015-04-08
TWI668520B (zh) 2019-08-11

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