HK1205279A1 - 液浸构件及曝光装置 - Google Patents

液浸构件及曝光装置 Download PDF

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Publication number
HK1205279A1
HK1205279A1 HK15105595.1A HK15105595A HK1205279A1 HK 1205279 A1 HK1205279 A1 HK 1205279A1 HK 15105595 A HK15105595 A HK 15105595A HK 1205279 A1 HK1205279 A1 HK 1205279A1
Authority
HK
Hong Kong
Prior art keywords
liquid immersion
substrate
exposure apparatus
liquid
shot region
Prior art date
Application number
HK15105595.1A
Other languages
English (en)
Chinese (zh)
Inventor
Shinji Sato
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Publication of HK1205279A1 publication Critical patent/HK1205279A1/xx

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
HK15105595.1A 2012-04-10 2013-03-22 液浸构件及曝光装置 HK1205279A1 (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261622182P 2012-04-10 2012-04-10
US61/622,182 2012-04-10
US13/800,448 2013-03-13
US13/800,448 US9268231B2 (en) 2012-04-10 2013-03-13 Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
PCT/JP2013/059432 WO2013153965A1 (en) 2012-04-10 2013-03-22 Liquid immersion member and exposure apparatus

Publications (1)

Publication Number Publication Date
HK1205279A1 true HK1205279A1 (zh) 2015-12-11

Family

ID=49292051

Family Applications (2)

Application Number Title Priority Date Filing Date
HK15105595.1A HK1205279A1 (zh) 2012-04-10 2013-03-22 液浸构件及曝光装置
HK18116511.6A HK1257550A1 (zh) 2012-04-10 2018-12-24 液浸构件及曝光装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
HK18116511.6A HK1257550A1 (zh) 2012-04-10 2018-12-24 液浸构件及曝光装置

Country Status (8)

Country Link
US (5) US9268231B2 (https=)
EP (1) EP2836876B1 (https=)
JP (3) JP6447131B2 (https=)
KR (1) KR102147071B1 (https=)
CN (2) CN108614393A (https=)
HK (2) HK1205279A1 (https=)
TW (3) TWI606305B (https=)
WO (1) WO2013153965A1 (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2009692A (en) 2011-12-07 2013-06-10 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
US9323160B2 (en) 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
WO2015052781A1 (ja) 2013-10-08 2015-04-16 株式会社ニコン 液浸部材、露光装置及び露光方法、並びにデバイス製造方法
US10268121B2 (en) * 2015-09-30 2019-04-23 Nikon Corporation Exposure apparatus and exposure method, and flat panel display manufacturing method
KR102649164B1 (ko) 2017-12-15 2024-03-20 에이에스엠엘 네델란즈 비.브이. 유체 핸들링 구조체, 리소그래피 장치, 유체 핸들링 구조체를 사용하는 방법 및 리소그래피 장치를 사용하는 방법
JP6610726B2 (ja) * 2018-07-11 2019-11-27 株式会社ニコン 液浸部材、露光装置及び露光方法、並びにデバイス製造方法

Family Cites Families (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1944654A3 (en) 1996-11-28 2010-06-02 Nikon Corporation An exposure apparatus and an exposure method
DE69829614T2 (de) 1997-03-10 2006-03-09 Asml Netherlands B.V. Lithographiegerät mit einer positioniervorrichtung mit zwei objekthaltern
US6897963B1 (en) 1997-12-18 2005-05-24 Nikon Corporation Stage device and exposure apparatus
US6208407B1 (en) 1997-12-22 2001-03-27 Asm Lithography B.V. Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
WO1999049504A1 (fr) * 1998-03-26 1999-09-30 Nikon Corporation Procede et systeme d'exposition par projection
WO2001035168A1 (en) 1999-11-10 2001-05-17 Massachusetts Institute Of Technology Interference lithography utilizing phase-locked scanning beams
US6452292B1 (en) 2000-06-26 2002-09-17 Nikon Corporation Planar motor with linear coil arrays
KR100815222B1 (ko) 2001-02-27 2008-03-19 에이에스엠엘 유에스, 인크. 리소그래피 장치 및 적어도 하나의 레티클 상에 형성된 적어도 두 개의 패턴으로부터의 이미지로 기판 스테이지 상의 필드를 노출시키는 방법
TW529172B (en) 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
KR20050035890A (ko) 2002-08-23 2005-04-19 가부시키가이샤 니콘 투영 광학계, 포토리소그래피 방법, 노광 장치 및 그 이용방법
SG141426A1 (en) * 2003-04-10 2008-04-28 Nikon Corp Environmental system including vacuum scavange for an immersion lithography apparatus
KR101431938B1 (ko) * 2003-04-10 2014-08-19 가부시키가이샤 니콘 액침 리소그래피 장치용 운반 영역을 포함하는 환경 시스템
TWI295414B (en) * 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1503244A1 (en) * 2003-07-28 2005-02-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
EP1519230A1 (en) * 2003-09-29 2005-03-30 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
JP4797984B2 (ja) * 2004-02-19 2011-10-19 株式会社ニコン 露光装置及びデバイス製造方法
CN103558737A (zh) 2004-06-09 2014-02-05 尼康股份有限公司 基板保持装置、具备其之曝光装置、方法
KR20180125636A (ko) * 2005-01-31 2018-11-23 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
JP2011258999A (ja) * 2005-01-31 2011-12-22 Nikon Corp 露光装置及びデバイス製造方法
TWI424260B (zh) 2005-03-18 2014-01-21 尼康股份有限公司 A board member, a substrate holding device, an exposure apparatus and an exposure method, and a device manufacturing method
EP1879219A4 (en) * 2005-04-27 2012-08-08 Nikon Corp EXPOSURE METHOD, EXPOSURE DEVICE, METHOD FOR MANUFACTURING COMPONENTS AND FILM EVALUATION METHOD
JP4984747B2 (ja) * 2005-08-31 2012-07-25 株式会社ニコン 光学素子、それを用いた露光装置及びマイクロデバイスの製造方法
KR100651579B1 (ko) * 2005-11-15 2006-11-29 매그나칩 반도체 유한회사 이에스디 보호회로
US7804577B2 (en) * 2005-11-16 2010-09-28 Asml Netherlands B.V. Lithographic apparatus
US7656501B2 (en) * 2005-11-16 2010-02-02 Asml Netherlands B.V. Lithographic apparatus
US7864292B2 (en) * 2005-11-16 2011-01-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI605491B (zh) 2006-01-19 2017-11-11 尼康股份有限公司 曝光裝置及曝光方法、以及元件製造方法
TWI439813B (zh) * 2006-05-10 2014-06-01 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
US8004651B2 (en) 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8237911B2 (en) 2007-03-15 2012-08-07 Nikon Corporation Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8068209B2 (en) 2007-03-23 2011-11-29 Nikon Corporation Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool
JP2009088037A (ja) * 2007-09-28 2009-04-23 Nikon Corp 露光方法及びデバイス製造方法、並びに露光装置
JP5084432B2 (ja) * 2007-10-05 2012-11-28 キヤノン株式会社 露光方法、露光装置およびデバイス製造方法
US8610873B2 (en) 2008-03-17 2013-12-17 Nikon Corporation Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate
US8289497B2 (en) 2008-03-18 2012-10-16 Nikon Corporation Apparatus and methods for recovering fluid in immersion lithography
KR20090124179A (ko) * 2008-05-29 2009-12-03 삼성전자주식회사 노광 장치의 빔위치 오차 측정 방법 및 이를 이용한 노광장치
JP2010016166A (ja) * 2008-07-03 2010-01-21 Canon Inc 走査型露光装置および露光方法、ならびにデバイス製造方法
NL2003835A (en) * 2008-12-22 2010-06-23 Asml Netherlands Bv Lithographic apparatus and control method.
US8896806B2 (en) * 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP2010157726A (ja) * 2008-12-29 2010-07-15 Nikon Corp 露光装置、露光方法、及びデバイス製造方法
US9223225B2 (en) * 2010-01-08 2015-12-29 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, and device manufacturing method
JP5495948B2 (ja) * 2010-05-27 2014-05-21 キヤノン株式会社 ステージ装置、露光装置及びデバイスの製造方法
US9323160B2 (en) 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium

Also Published As

Publication number Publication date
TWI668520B (zh) 2019-08-11
US10768537B2 (en) 2020-09-08
TW201740219A (zh) 2017-11-16
JP2015514304A (ja) 2015-05-18
US9927724B2 (en) 2018-03-27
TWI606305B (zh) 2017-11-21
WO2013153965A1 (en) 2013-10-17
HK1257550A1 (zh) 2019-10-25
US20190391503A1 (en) 2019-12-26
CN104508560A (zh) 2015-04-08
US9557654B2 (en) 2017-01-31
CN104508560B (zh) 2018-05-22
JP2018136581A (ja) 2018-08-30
US20160161860A1 (en) 2016-06-09
KR102147071B1 (ko) 2020-08-24
HK1207908A1 (en) 2016-02-12
US9268231B2 (en) 2016-02-23
US20170108786A1 (en) 2017-04-20
EP2836876A1 (en) 2015-02-18
US10409177B2 (en) 2019-09-10
KR20150003276A (ko) 2015-01-08
US20130265556A1 (en) 2013-10-10
JP6447131B2 (ja) 2019-01-09
JP6593493B2 (ja) 2019-10-23
CN108614393A (zh) 2018-10-02
TW201348890A (zh) 2013-12-01
US20180217511A1 (en) 2018-08-02
TW201935146A (zh) 2019-09-01
JP2019215586A (ja) 2019-12-19
EP2836876B1 (en) 2020-08-05

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