TWI606305B - 液浸構件、曝光裝置、曝光方法、元件製造方法、程式、及記錄媒體 - Google Patents

液浸構件、曝光裝置、曝光方法、元件製造方法、程式、及記錄媒體 Download PDF

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Publication number
TWI606305B
TWI606305B TW102109844A TW102109844A TWI606305B TW I606305 B TWI606305 B TW I606305B TW 102109844 A TW102109844 A TW 102109844A TW 102109844 A TW102109844 A TW 102109844A TW I606305 B TWI606305 B TW I606305B
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TW
Taiwan
Prior art keywords
substrate
liquid
liquid immersion
path
space
Prior art date
Application number
TW102109844A
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English (en)
Chinese (zh)
Other versions
TW201348890A (zh
Inventor
佐藤真路
Original Assignee
尼康股份有限公司
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Publication date
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Publication of TW201348890A publication Critical patent/TW201348890A/zh
Application granted granted Critical
Publication of TWI606305B publication Critical patent/TWI606305B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW102109844A 2012-04-10 2013-03-20 液浸構件、曝光裝置、曝光方法、元件製造方法、程式、及記錄媒體 TWI606305B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261622182P 2012-04-10 2012-04-10
US13/800,448 US9268231B2 (en) 2012-04-10 2013-03-13 Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium

Publications (2)

Publication Number Publication Date
TW201348890A TW201348890A (zh) 2013-12-01
TWI606305B true TWI606305B (zh) 2017-11-21

Family

ID=49292051

Family Applications (3)

Application Number Title Priority Date Filing Date
TW102109844A TWI606305B (zh) 2012-04-10 2013-03-20 液浸構件、曝光裝置、曝光方法、元件製造方法、程式、及記錄媒體
TW106123571A TWI668520B (zh) 2012-04-10 2013-03-20 液浸曝光裝置、曝光方法及元件製造方法
TW108118244A TW201935146A (zh) 2012-04-10 2013-03-20 液浸構件、曝光裝置、曝光方法、元件製造方法、程式、及記錄媒體

Family Applications After (2)

Application Number Title Priority Date Filing Date
TW106123571A TWI668520B (zh) 2012-04-10 2013-03-20 液浸曝光裝置、曝光方法及元件製造方法
TW108118244A TW201935146A (zh) 2012-04-10 2013-03-20 液浸構件、曝光裝置、曝光方法、元件製造方法、程式、及記錄媒體

Country Status (8)

Country Link
US (5) US9268231B2 (https=)
EP (1) EP2836876B1 (https=)
JP (3) JP6447131B2 (https=)
KR (1) KR102147071B1 (https=)
CN (2) CN108614393A (https=)
HK (2) HK1205279A1 (https=)
TW (3) TWI606305B (https=)
WO (1) WO2013153965A1 (https=)

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Also Published As

Publication number Publication date
JP2018136581A (ja) 2018-08-30
US9268231B2 (en) 2016-02-23
US10409177B2 (en) 2019-09-10
US20160161860A1 (en) 2016-06-09
JP6593493B2 (ja) 2019-10-23
US20180217511A1 (en) 2018-08-02
TW201935146A (zh) 2019-09-01
TW201348890A (zh) 2013-12-01
US20170108786A1 (en) 2017-04-20
WO2013153965A1 (en) 2013-10-17
JP6447131B2 (ja) 2019-01-09
CN108614393A (zh) 2018-10-02
HK1205279A1 (zh) 2015-12-11
EP2836876B1 (en) 2020-08-05
US10768537B2 (en) 2020-09-08
EP2836876A1 (en) 2015-02-18
KR20150003276A (ko) 2015-01-08
US20130265556A1 (en) 2013-10-10
CN104508560B (zh) 2018-05-22
US9927724B2 (en) 2018-03-27
KR102147071B1 (ko) 2020-08-24
TW201740219A (zh) 2017-11-16
HK1257550A1 (zh) 2019-10-25
HK1207908A1 (en) 2016-02-12
JP2015514304A (ja) 2015-05-18
US9557654B2 (en) 2017-01-31
US20190391503A1 (en) 2019-12-26
JP2019215586A (ja) 2019-12-19
CN104508560A (zh) 2015-04-08
TWI668520B (zh) 2019-08-11

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