HK1194150A1 - 曝光裝置、液體保持方法、及元件製造方法 - Google Patents

曝光裝置、液體保持方法、及元件製造方法

Info

Publication number
HK1194150A1
HK1194150A1 HK14107312.0A HK14107312A HK1194150A1 HK 1194150 A1 HK1194150 A1 HK 1194150A1 HK 14107312 A HK14107312 A HK 14107312A HK 1194150 A1 HK1194150 A1 HK 1194150A1
Authority
HK
Hong Kong
Prior art keywords
exposure apparatus
device manufacturing
liquid holding
holding method
liquid
Prior art date
Application number
HK14107312.0A
Other languages
English (en)
Inventor
長坂博之
Original Assignee
株式會社尼康
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式會社尼康 filed Critical 株式會社尼康
Publication of HK1194150A1 publication Critical patent/HK1194150A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
HK14107312.0A 2011-08-25 2014-07-17 曝光裝置、液體保持方法、及元件製造方法 HK1194150A1 (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201161527333P 2011-08-25 2011-08-25
JP2012153959 2012-07-09
US13/593,079 US9256137B2 (en) 2011-08-25 2012-08-23 Exposure apparatus, liquid holding method, and device manufacturing method
PCT/JP2012/072086 WO2013027866A1 (en) 2011-08-25 2012-08-24 Exposure apparatus and method of confining a liquid

Publications (1)

Publication Number Publication Date
HK1194150A1 true HK1194150A1 (zh) 2014-10-10

Family

ID=47746594

Family Applications (2)

Application Number Title Priority Date Filing Date
HK14107312.0A HK1194150A1 (zh) 2011-08-25 2014-07-17 曝光裝置、液體保持方法、及元件製造方法
HK14111693.1A HK1198212A1 (zh) 2011-08-25 2014-11-19 曝光裝置和限制液體的方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
HK14111693.1A HK1198212A1 (zh) 2011-08-25 2014-11-19 曝光裝置和限制液體的方法

Country Status (8)

Country Link
US (2) US9256137B2 (zh)
EP (1) EP2748679A1 (zh)
JP (2) JP5949923B2 (zh)
KR (1) KR20140056284A (zh)
CN (1) CN103748519B (zh)
HK (2) HK1194150A1 (zh)
TW (1) TW201312293A (zh)
WO (1) WO2013027866A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2005655A (en) 2009-12-09 2011-06-14 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
JP6212884B2 (ja) * 2013-03-15 2017-10-18 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
CN110088686B (zh) * 2016-12-14 2021-11-16 Asml荷兰有限公司 光刻设备及器件制造方法

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US8004651B2 (en) * 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
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US7924404B2 (en) 2007-08-16 2011-04-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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US9823580B2 (en) * 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
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Also Published As

Publication number Publication date
JP5949923B2 (ja) 2016-07-13
CN103748519B (zh) 2016-04-20
JP2016157148A (ja) 2016-09-01
US20130059253A1 (en) 2013-03-07
WO2013027866A1 (en) 2013-02-28
KR20140056284A (ko) 2014-05-09
TW201312293A (zh) 2013-03-16
US9256137B2 (en) 2016-02-09
US20160124320A1 (en) 2016-05-05
HK1198212A1 (zh) 2015-03-13
JP2014524668A (ja) 2014-09-22
EP2748679A1 (en) 2014-07-02
CN103748519A (zh) 2014-04-23

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20230826