HK1188486A1 - Framework of dust-prevention film component - Google Patents

Framework of dust-prevention film component

Info

Publication number
HK1188486A1
HK1188486A1 HK14101538.1A HK14101538A HK1188486A1 HK 1188486 A1 HK1188486 A1 HK 1188486A1 HK 14101538 A HK14101538 A HK 14101538A HK 1188486 A1 HK1188486 A1 HK 1188486A1
Authority
HK
Hong Kong
Prior art keywords
framework
dust
prevention film
film component
component
Prior art date
Application number
HK14101538.1A
Other languages
Chinese (zh)
Inventor
关原敏
Original Assignee
信越化學工業株式會社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 信越化學工業株式會社 filed Critical 信越化學工業株式會社
Publication of HK1188486A1 publication Critical patent/HK1188486A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
HK14101538.1A 2012-05-11 2014-02-18 Framework of dust-prevention film component HK1188486A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012109518A JP5746662B2 (en) 2012-05-11 2012-05-11 Pellicle frame

Publications (1)

Publication Number Publication Date
HK1188486A1 true HK1188486A1 (en) 2014-05-02

Family

ID=49533925

Family Applications (1)

Application Number Title Priority Date Filing Date
HK14101538.1A HK1188486A1 (en) 2012-05-11 2014-02-18 Framework of dust-prevention film component

Country Status (5)

Country Link
JP (1) JP5746662B2 (en)
KR (1) KR102070074B1 (en)
CN (1) CN103389618B (en)
HK (1) HK1188486A1 (en)
TW (1) TWI457699B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6293041B2 (en) * 2014-12-01 2018-03-14 信越化学工業株式会社 Pellicle frame and pellicle using the same
JP6347741B2 (en) 2014-12-25 2018-06-27 信越化学工業株式会社 Pellicle
JP6632057B2 (en) * 2016-01-07 2020-01-15 信越化学工業株式会社 Pellicle
KR102002689B1 (en) * 2017-09-08 2019-07-23 주식회사 에프에스티 Pellicle frame
TWI670562B (en) * 2018-06-21 2019-09-01 美商微相科技股份有限公司 Photomask protection component structure

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3642145B2 (en) 1997-02-21 2005-04-27 信越化学工業株式会社 Method for producing pellicle and liner for attaching pellicle to adhesive layer for attaching reticle to reticle
JP3330898B2 (en) * 1999-04-26 2002-09-30 沖電気工業株式会社 Pellicle
JP4007752B2 (en) * 1999-07-30 2007-11-14 旭化成エレクトロニクス株式会社 Large pellicle frame and large pellicle
JP2005091983A (en) * 2003-09-19 2005-04-07 Toppan Printing Co Ltd Photomask discriminated with rf tag, pellicle, photomask with pellicle, and storage case
JP2005308901A (en) * 2004-04-19 2005-11-04 Shin Etsu Chem Co Ltd Pellicle frame and pellicle for photo lithography using it
JP4637053B2 (en) * 2006-05-15 2011-02-23 信越化学工業株式会社 Pellicle and pellicle peeling device
JP4921184B2 (en) * 2007-01-19 2012-04-25 信越化学工業株式会社 Method of applying film adhesive to pellicle frame
CN102132210B (en) * 2008-09-12 2013-01-23 旭化成电子材料株式会社 Pellicle frame, pellicle and method for using pellicle frame
JP5481106B2 (en) * 2009-06-24 2014-04-23 信越化学工業株式会社 Pellicle frame and lithography pellicle
JP5199217B2 (en) * 2009-11-02 2013-05-15 信越化学工業株式会社 Pellicle
JP2011164402A (en) 2010-02-10 2011-08-25 Shin-Etsu Chemical Co Ltd Method for manufacturing pellicle
JP5940283B2 (en) * 2011-11-04 2016-06-29 信越化学工業株式会社 Pellicle

Also Published As

Publication number Publication date
JP2013238637A (en) 2013-11-28
TWI457699B (en) 2014-10-21
TW201400978A (en) 2014-01-01
KR102070074B1 (en) 2020-01-28
CN103389618A (en) 2013-11-13
CN103389618B (en) 2015-12-23
JP5746662B2 (en) 2015-07-08
KR20130126465A (en) 2013-11-20

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20210508