HK1174103A1 - Surface position detection apparatus, exposure apparatus and exposure method - Google Patents

Surface position detection apparatus, exposure apparatus and exposure method

Info

Publication number
HK1174103A1
HK1174103A1 HK13101034.1A HK13101034A HK1174103A1 HK 1174103 A1 HK1174103 A1 HK 1174103A1 HK 13101034 A HK13101034 A HK 13101034A HK 1174103 A1 HK1174103 A1 HK 1174103A1
Authority
HK
Hong Kong
Prior art keywords
exposure
position detection
surface position
detection apparatus
exposure method
Prior art date
Application number
HK13101034.1A
Other languages
English (en)
Chinese (zh)
Inventor
Yasuhiro Hidaka
Tadashi Nagayama
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1174103A1 publication Critical patent/HK1174103A1/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7034—Leveling
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Automatic Focus Adjustment (AREA)
  • Optical Elements Other Than Lenses (AREA)
HK13101034.1A 2005-07-08 2008-09-26 Surface position detection apparatus, exposure apparatus and exposure method HK1174103A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005200178 2005-07-08

Publications (1)

Publication Number Publication Date
HK1174103A1 true HK1174103A1 (en) 2013-05-31

Family

ID=37636945

Family Applications (7)

Application Number Title Priority Date Filing Date
HK08108984.3A HK1121229A1 (zh) 2005-07-08 2008-08-13 面位置檢測裝置、曝光裝置及曝光方法
HK08110767.2A HK1118895A1 (en) 2005-07-08 2008-09-26 Surface position detection apparatus, exposure apparatus, and exposure method
HK13101034.1A HK1174103A1 (en) 2005-07-08 2008-09-26 Surface position detection apparatus, exposure apparatus and exposure method
HK16103184.2A HK1215306A1 (zh) 2005-07-08 2016-03-18 面位置檢測裝置、曝光裝置及曝光方法
HK16103183.3A HK1215305A1 (zh) 2005-07-08 2016-03-18 面位置檢測裝置、曝光裝置及曝光方法
HK16108559.8A HK1220516A1 (zh) 2005-07-08 2016-07-19 曝光裝置與曝光方法
HK18111918.6A HK1252618A1 (zh) 2005-07-08 2018-09-17 表面位置檢測裝置、曝光裝置和曝光方法

Family Applications Before (2)

Application Number Title Priority Date Filing Date
HK08108984.3A HK1121229A1 (zh) 2005-07-08 2008-08-13 面位置檢測裝置、曝光裝置及曝光方法
HK08110767.2A HK1118895A1 (en) 2005-07-08 2008-09-26 Surface position detection apparatus, exposure apparatus, and exposure method

Family Applications After (4)

Application Number Title Priority Date Filing Date
HK16103184.2A HK1215306A1 (zh) 2005-07-08 2016-03-18 面位置檢測裝置、曝光裝置及曝光方法
HK16103183.3A HK1215305A1 (zh) 2005-07-08 2016-03-18 面位置檢測裝置、曝光裝置及曝光方法
HK16108559.8A HK1220516A1 (zh) 2005-07-08 2016-07-19 曝光裝置與曝光方法
HK18111918.6A HK1252618A1 (zh) 2005-07-08 2018-09-17 表面位置檢測裝置、曝光裝置和曝光方法

Country Status (7)

Country Link
US (5) US8149382B2 (xx)
EP (7) EP2520978B1 (xx)
JP (10) JP4883006B2 (xx)
KR (7) KR101447407B1 (xx)
CN (5) CN103728849B (xx)
HK (7) HK1121229A1 (xx)
WO (1) WO2007007549A1 (xx)

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JP5622068B2 (ja) 2005-11-15 2014-11-12 株式会社ニコン 面位置検出装置、露光装置、およびデバイスの製造方法
US7916269B2 (en) 2007-07-24 2011-03-29 Asml Netherlands B.V. Lithographic apparatus and contamination removal or prevention method
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JP2009054730A (ja) * 2007-08-24 2009-03-12 Nikon Corp 移動体駆動方法及び移動体駆動システム、パターン形成方法及び装置、露光及び装置、並びにデバイス製造方法
US8111406B2 (en) 2007-11-14 2012-02-07 Nikon Corporation Surface position detecting apparatus, surface position detecting method, exposure apparatus, and device manufacturing method
DE102010013386A1 (de) * 2010-03-30 2011-10-06 Emz-Hanauer Gmbh & Co. Kgaa Vorrichtung zum Erfassen der Relativposition eines lageveränderlichen Bauteils relativ zu einem Referenzbauteil eines Wäschebehandlungsgeräts sowie entsprechendes Wäschebehandlungsgerät
CN103365103B (zh) * 2012-04-10 2015-09-30 上海微电子装备有限公司 一种调焦调平装置及调焦调平方法
US8993974B2 (en) 2012-06-12 2015-03-31 Nikon Corporation Color time domain integration camera having a single charge coupled device and fringe projection auto-focus system
JP6066627B2 (ja) 2012-08-23 2017-01-25 キヤノン株式会社 位置検出装置、およびそれを用いたリソグラフィー装置並びにデバイスの製造方法
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CN104166315B (zh) * 2014-08-14 2017-05-17 深圳市华星光电技术有限公司 曝光方法及曝光机
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JP6682263B2 (ja) * 2015-12-25 2020-04-15 キヤノン株式会社 検出装置、露光装置および物品の製造方法
KR102522899B1 (ko) * 2016-02-05 2023-04-19 (주)테크윙 전자부품 적재상태 점검장치
JP6774714B2 (ja) * 2016-07-25 2020-10-28 株式会社アドテックエンジニアリング ワークステージ及び露光装置
CN108121179A (zh) * 2016-11-30 2018-06-05 上海微电子装备（集团）股份有限公司 一种调焦调平装置
CN110249594B (zh) 2017-02-08 2022-12-06 日本电信电话株式会社 通信装置和通信方法
JP6969164B2 (ja) * 2017-05-31 2021-11-24 株式会社リコー 評価装置、評価プログラム及び評価方法
CN108008541B (zh) * 2017-10-25 2020-07-10 中国航空工业集团公司洛阳电光设备研究所 一种装调双光楔的方法
CN116727865A (zh) * 2017-10-25 2023-09-12 株式会社尼康 加工装置及移动体的制造方法
CN112005169B (zh) * 2018-04-06 2023-03-28 Asml荷兰有限公司 具有非线性光学器件的检查设备
JP7180745B2 (ja) * 2019-02-21 2022-11-30 株式会社ニコン 面位置検出装置、露光装置、基板処理システム、およびデバイス製造方法
JP2020148463A (ja) * 2019-03-11 2020-09-17 株式会社日立ハイテク 高さ測定装置及びビーム照射装置
JP7496367B2 (ja) * 2019-03-13 2024-06-06 エーエスエムエル ホールディング エヌ．ブイ． リソグラフィ装置、計測装置、光学システムおよび方法
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Also Published As

Publication number Publication date
JP2014057078A (ja) 2014-03-27
EP2520978A3 (en) 2013-09-25
KR20140018336A (ko) 2014-02-12
EP2520978B1 (en) 2015-04-29
EP3321741A3 (en) 2018-08-01
US8149382B2 (en) 2012-04-03
EP2733535B1 (en) 2015-08-05
CN105204303B (zh) 2018-03-20
JP4883055B2 (ja) 2012-02-22
US20150248064A1 (en) 2015-09-03
JP2015057837A (ja) 2015-03-26
KR20150142063A (ko) 2015-12-21
JP2012053048A (ja) 2012-03-15
US9519223B2 (en) 2016-12-13
JPWO2007007549A1 (ja) 2009-01-29
EP2463715B1 (en) 2015-06-10
US20120162623A1 (en) 2012-06-28
CN105204303A (zh) 2015-12-30
HK1121229A1 (zh) 2009-04-17
EP1909062A1 (en) 2008-04-09
EP2520978A2 (en) 2012-11-07
EP3321741A2 (en) 2018-05-16
JP2016029483A (ja) 2016-03-03
JP2013070075A (ja) 2013-04-18
CN103728849A (zh) 2014-04-16
JP5673772B2 (ja) 2015-02-18
EP2993525B1 (en) 2017-10-04
KR20080026121A (ko) 2008-03-24
EP2463715A3 (en) 2012-09-05
KR101447391B1 (ko) 2014-10-06
EP2463716B1 (en) 2015-03-18
JP5854106B2 (ja) 2016-02-09
US20170075227A1 (en) 2017-03-16
CN105204302A (zh) 2015-12-30
KR20180067714A (ko) 2018-06-20
HK1252618A1 (zh) 2019-05-31
JP4883006B2 (ja) 2012-02-22
US20100129739A1 (en) 2010-05-27
EP2993525A1 (en) 2016-03-09
JP2018081314A (ja) 2018-05-24
EP2463716B8 (en) 2015-05-20
KR20130130094A (ko) 2013-11-29
US9069261B2 (en) 2015-06-30
HK1215306A1 (zh) 2016-08-19
JP2017021382A (ja) 2017-01-26
KR101868218B1 (ko) 2018-06-15
EP2733535A3 (en) 2014-08-13
EP2733535A2 (en) 2014-05-21
US9927713B2 (en) 2018-03-27
CN103728848A (zh) 2014-04-16
KR101269298B1 (ko) 2013-05-29
JP5565449B2 (ja) 2014-08-06
HK1215305A1 (zh) 2016-08-19
EP2463715A2 (en) 2012-06-13
JP6555222B2 (ja) 2019-08-07
KR101447407B1 (ko) 2014-10-06
KR101484436B1 (ko) 2015-01-19
CN103728848B (zh) 2017-06-30
HK1220516A1 (zh) 2017-05-05
HK1118895A1 (en) 2009-02-20
EP2463716A3 (en) 2012-09-05
EP1909062B1 (en) 2014-03-05
CN101218482A (zh) 2008-07-09
EP2463716A2 (en) 2012-06-13
JP2008258655A (ja) 2008-10-23
JP6128178B2 (ja) 2017-05-17
US20180188657A1 (en) 2018-07-05
EP1909062A4 (en) 2009-10-21
JP2008258654A (ja) 2008-10-23
WO2007007549A1 (ja) 2007-01-18
CN103728849B (zh) 2017-08-01
JP5464191B2 (ja) 2014-04-09
KR101574918B1 (ko) 2015-12-04
CN101218482B (zh) 2015-10-21
KR20130019028A (ko) 2013-02-25
JP4883056B2 (ja) 2012-02-22
KR20140084306A (ko) 2014-07-04

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