HK1142870A1 - Method for controlling resistivity in ingots made of compensated feedstock silicon - Google Patents
Method for controlling resistivity in ingots made of compensated feedstock siliconInfo
- Publication number
- HK1142870A1 HK1142870A1 HK10109315.7A HK10109315A HK1142870A1 HK 1142870 A1 HK1142870 A1 HK 1142870A1 HK 10109315 A HK10109315 A HK 10109315A HK 1142870 A1 HK1142870 A1 HK 1142870A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- silicon
- feedstock
- gallium
- compensated
- aluminum
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/006—Controlling or regulating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Silicon Compounds (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/769,109 US7651566B2 (en) | 2007-06-27 | 2007-06-27 | Method and system for controlling resistivity in ingots made of compensated feedstock silicon |
PCT/US2008/068644 WO2009003183A1 (fr) | 2007-06-27 | 2008-06-27 | Procédé et système pour contrôler la résistivité dans des lingots faits de silicium de charge d'alimentation compensé |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1142870A1 true HK1142870A1 (en) | 2010-12-17 |
Family
ID=40186057
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK10109315.7A HK1142870A1 (en) | 2007-06-27 | 2010-09-29 | Method for controlling resistivity in ingots made of compensated feedstock silicon |
Country Status (8)
Country | Link |
---|---|
US (1) | US7651566B2 (fr) |
EP (2) | EP2418173A3 (fr) |
JP (1) | JP5559681B2 (fr) |
CN (1) | CN101918314A (fr) |
AT (1) | ATE532749T1 (fr) |
ES (1) | ES2377343T3 (fr) |
HK (1) | HK1142870A1 (fr) |
WO (1) | WO2009003183A1 (fr) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8968467B2 (en) * | 2007-06-27 | 2015-03-03 | Silicor Materials Inc. | Method and system for controlling resistivity in ingots made of compensated feedstock silicon |
US20110233478A1 (en) * | 2008-12-01 | 2011-09-29 | Sumitomo Chemical Company, Limited | Silicon for n-type solar cells and a method of producing phosphorus-doped silicon |
NO329987B1 (no) | 2009-02-26 | 2011-01-31 | Harsharn Tathgar | Halvkontinuerlig fremgangsmate for dannelse, separasjon og smelting av store, rene silisiumkrystaller |
US7858427B2 (en) * | 2009-03-03 | 2010-12-28 | Applied Materials, Inc. | Crystalline silicon solar cells on low purity substrate |
WO2010126639A1 (fr) * | 2009-04-29 | 2010-11-04 | Calisolar, Inc. | Commande d'un processus de purification d'un matériau de silicium métallurgique amélioré (si-umg) |
US8547121B2 (en) * | 2009-04-29 | 2013-10-01 | Silicor Materials Inc. | Quality control process for UMG-SI feedstock |
WO2010127184A1 (fr) * | 2009-04-29 | 2010-11-04 | Calisolar, Inc. | Procédé de contrôle de qualité pour une charge de départ de silicium de qualité métallurgique améliorée |
JP5077966B2 (ja) * | 2009-08-27 | 2012-11-21 | シャープ株式会社 | シリコンインゴットの製造方法 |
KR20120040016A (ko) * | 2010-10-18 | 2012-04-26 | 엘지전자 주식회사 | 태양 전지용 기판 및 태양 전지 |
JP5194146B2 (ja) * | 2010-12-28 | 2013-05-08 | ジルトロニック アクチエンゲゼルシャフト | シリコン単結晶の製造方法、シリコン単結晶、およびウエハ |
NO335110B1 (no) * | 2011-10-06 | 2014-09-15 | Elkem Solar As | Fremgangsmåte for fremstilling av silisiummonokrystall og multikrystalline silisiumingoter |
JP5470349B2 (ja) | 2011-10-17 | 2014-04-16 | ジルトロニック アクチエンゲゼルシャフト | p型シリコン単結晶およびその製造方法 |
CN102400219A (zh) * | 2011-11-30 | 2012-04-04 | 东海晶澳太阳能科技有限公司 | 一种硼-镓共掺准单晶硅及其制备方法 |
JP2013129564A (ja) * | 2011-12-21 | 2013-07-04 | Siltronic Ag | シリコン単結晶基板およびその製造方法 |
CN102560646B (zh) * | 2012-03-20 | 2015-05-20 | 浙江大学 | 一种掺杂电阻率均匀的n型铸造硅单晶及其制备方法 |
US10724148B2 (en) | 2014-01-21 | 2020-07-28 | Infineon Technologies Ag | Silicon ingot and method of manufacturing a silicon ingot |
DE102014107590B3 (de) * | 2014-05-28 | 2015-10-01 | Infineon Technologies Ag | Halbleitervorrichtung, Siliziumwafer und Verfahren zum Herstellen eines Siliziumwafers |
US10337117B2 (en) | 2014-11-07 | 2019-07-02 | Infineon Technologies Ag | Method of manufacturing a silicon ingot and silicon ingot |
RU2570084C1 (ru) * | 2014-12-03 | 2015-12-10 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Тверской государственный университет" | Способ получения поликристаллов кремния |
DE102015114177A1 (de) * | 2015-08-26 | 2017-03-02 | Infineon Technologies Ag | Halbleitervorrichtung, Siliziumwafer und Verfahren zum Herstellen eines Siliziumwafers |
CN105970284B (zh) * | 2016-05-30 | 2019-08-16 | 上海超硅半导体有限公司 | 一种p型单晶硅片及其制造方法 |
CN106294302B (zh) * | 2016-08-10 | 2018-10-09 | 宁夏高创特能源科技有限公司 | 一种硅靶材配料调节极性、电阻率测算方法 |
CN109576787A (zh) * | 2019-01-14 | 2019-04-05 | 浙江晶科能源有限公司 | 采用物理法提纯的硅料制备的多晶硅锭和多晶硅棒及方法 |
CN111762786B (zh) * | 2020-07-13 | 2022-08-12 | 昆明理工大学 | 一种硅熔体可控凝固去除杂质元素的方法 |
CN115341271A (zh) * | 2021-05-13 | 2022-11-15 | 内蒙古中环协鑫光伏材料有限公司 | 一种控制单晶电阻率轴向衰减速率的方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004538231A (ja) * | 2001-08-10 | 2004-12-24 | エバーグリーン ソーラー, インコーポレイテッド | 半導体をドーピングするための方法および装置 |
JP3855082B2 (ja) * | 2002-10-07 | 2006-12-06 | 国立大学法人東京農工大学 | 多結晶シリコンの作製方法、多結晶シリコン、及び太陽電池 |
JP2004140120A (ja) * | 2002-10-16 | 2004-05-13 | Canon Inc | 多結晶シリコン基板 |
NO333319B1 (no) * | 2003-12-29 | 2013-05-06 | Elkem As | Silisiummateriale for fremstilling av solceller |
NO322246B1 (no) | 2004-12-27 | 2006-09-04 | Elkem Solar As | Fremgangsmate for fremstilling av rettet storknede silisiumingots |
-
2007
- 2007-06-27 US US11/769,109 patent/US7651566B2/en not_active Expired - Fee Related
-
2008
- 2008-06-27 CN CN200880105605XA patent/CN101918314A/zh active Pending
- 2008-06-27 WO PCT/US2008/068644 patent/WO2009003183A1/fr active Application Filing
- 2008-06-27 AT AT08772195T patent/ATE532749T1/de active
- 2008-06-27 EP EP11188326A patent/EP2418173A3/fr not_active Withdrawn
- 2008-06-27 EP EP08772195A patent/EP2173660B1/fr not_active Not-in-force
- 2008-06-27 ES ES08772195T patent/ES2377343T3/es active Active
- 2008-06-27 JP JP2010515195A patent/JP5559681B2/ja not_active Expired - Fee Related
-
2010
- 2010-09-29 HK HK10109315.7A patent/HK1142870A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
WO2009003183A1 (fr) | 2008-12-31 |
ES2377343T3 (es) | 2012-03-26 |
US7651566B2 (en) | 2010-01-26 |
EP2173660B1 (fr) | 2011-11-09 |
EP2418173A2 (fr) | 2012-02-15 |
EP2173660A1 (fr) | 2010-04-14 |
JP5559681B2 (ja) | 2014-07-23 |
ATE532749T1 (de) | 2011-11-15 |
US20090026423A1 (en) | 2009-01-29 |
EP2418173A3 (fr) | 2012-09-05 |
CN101918314A (zh) | 2010-12-15 |
JP2010531805A (ja) | 2010-09-30 |
EP2173660A4 (fr) | 2010-08-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20150627 |