HK1142436A1 - Position measuring system and position measuring method, mobile body device, mobile body driving method, exposure device and exposure method, pattern forming device, and device manufacturing method - Google Patents
Position measuring system and position measuring method, mobile body device, mobile body driving method, exposure device and exposure method, pattern forming device, and device manufacturing methodInfo
- Publication number
- HK1142436A1 HK1142436A1 HK10108717.3A HK10108717A HK1142436A1 HK 1142436 A1 HK1142436 A1 HK 1142436A1 HK 10108717 A HK10108717 A HK 10108717A HK 1142436 A1 HK1142436 A1 HK 1142436A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- mobile body
- position measuring
- exposure
- pattern forming
- measuring system
- Prior art date
Links
- 238000000034 method Methods 0.000 title 3
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0277—Electrolithographic processes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
- G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
- G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
- G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
- G01D5/347—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells using displacement encoding scales
- G01D5/34746—Linear encoders
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
- G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
- G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
- G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
- G01D5/36—Forming the light into pulses
- G01D5/38—Forming the light into pulses by diffraction gratings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D2205/00—Indexing scheme relating to details of means for transferring or converting the output of a sensing member
- G01D2205/90—Two-dimensional encoders, i.e. having one or two codes extending in two directions
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Public Health (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Health & Medical Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008028288 | 2008-02-08 | ||
PCT/JP2009/000460 WO2009098891A1 (ja) | 2008-02-08 | 2009-02-06 | 位置計測システム及び位置計測方法、移動体装置、移動体駆動方法、露光装置及び露光方法、パターン形成装置、並びにデバイス製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1142436A1 true HK1142436A1 (en) | 2010-12-03 |
Family
ID=40951970
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK10108717.3A HK1142436A1 (en) | 2008-02-08 | 2010-09-14 | Position measuring system and position measuring method, mobile body device, mobile body driving method, exposure device and exposure method, pattern forming device, and device manufacturing method |
Country Status (7)
Country | Link |
---|---|
US (1) | US8208128B2 (zh) |
JP (1) | JP5344180B2 (zh) |
KR (1) | KR20100124245A (zh) |
CN (1) | CN101796614B (zh) |
HK (1) | HK1142436A1 (zh) |
TW (1) | TW200947140A (zh) |
WO (1) | WO2009098891A1 (zh) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5174712B2 (ja) * | 2009-02-27 | 2013-04-03 | 株式会社日立ハイテクノロジーズ | 荷電粒子ビーム装置、及び荷電粒子ビームにおける位置補正処理方法 |
US8488109B2 (en) | 2009-08-25 | 2013-07-16 | Nikon Corporation | Exposure method, exposure apparatus, and device manufacturing method |
US20120064460A1 (en) * | 2010-09-07 | 2012-03-15 | Nikon Corporation | Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method |
US8842294B2 (en) * | 2011-06-21 | 2014-09-23 | Canon Kabushiki Kaisha | Position detection apparatus, imprint apparatus, and position detection method |
NL2009197A (en) * | 2011-08-25 | 2013-02-27 | Asml Netherlands Bv | System for detection motion, lithographic apparatus and device manufacturing method. |
DE102012204572A1 (de) * | 2012-03-22 | 2013-09-26 | Dr. Johannes Heidenhain Gmbh | Positionsmesseinrichtung und Anordnung mit einer derartigen Positionsmesseinrichtung |
CN103712603B (zh) * | 2013-09-24 | 2016-03-23 | 哈尔滨工业大学 | 基于平面光栅的三维视觉位姿测量装置及其测量方法 |
TWI503619B (zh) * | 2014-03-12 | 2015-10-11 | 玉晶光電股份有限公司 | 量測設備及其量測方法 |
DE102014205523A1 (de) * | 2014-03-25 | 2015-10-01 | Etel S.A. | Positioniereinrichtung in Portalbauweise |
CN111948912A (zh) | 2015-02-23 | 2020-11-17 | 株式会社尼康 | 基板处理系统及基板处理方法、以及组件制造方法 |
WO2016136690A1 (ja) | 2015-02-23 | 2016-09-01 | 株式会社ニコン | 計測装置、リソグラフィシステム及び露光装置、並びに管理方法、重ね合わせ計測方法及びデバイス製造方法 |
KR102552792B1 (ko) * | 2015-02-23 | 2023-07-06 | 가부시키가이샤 니콘 | 계측 장치, 리소그래피 시스템 및 노광 장치, 그리고 디바이스 제조 방법 |
CN106225685B (zh) * | 2016-08-26 | 2018-11-30 | 清华大学 | 一种硅片台大行程三自由度位移测量系统 |
KR102320293B1 (ko) * | 2016-09-30 | 2021-11-01 | 가부시키가이샤 니콘 | 이동체 장치, 이동 방법, 노광 장치, 노광 방법, 플랫 패널 디스플레이의 제조 방법, 그리고 디바이스 제조 방법 |
JP2018066629A (ja) * | 2016-10-19 | 2018-04-26 | 太陽誘電株式会社 | ロードセル |
CN108508706B (zh) * | 2017-02-28 | 2020-04-10 | 上海微电子装备(集团)股份有限公司 | 一种位移测量系统以及曝光设备 |
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JPS63231217A (ja) | 1987-03-19 | 1988-09-27 | Omron Tateisi Electronics Co | 移動量測定装置 |
JP2897355B2 (ja) | 1990-07-05 | 1999-05-31 | 株式会社ニコン | アライメント方法,露光装置,並びに位置検出方法及び装置 |
US5334892A (en) * | 1992-12-22 | 1994-08-02 | Anorad Corporation | Positioning device for planar positioning |
JPH074993A (ja) | 1993-03-23 | 1995-01-10 | Ricoh Co Ltd | エンコーダ装置 |
US6005667A (en) | 1996-07-23 | 1999-12-21 | Canon Kabushiki Kaisha | Optical displacement measurement apparatus and information recording apparatus |
JPH1038517A (ja) * | 1996-07-23 | 1998-02-13 | Canon Inc | 光学式変位測定装置 |
KR20030096435A (ko) | 1996-11-28 | 2003-12-31 | 가부시키가이샤 니콘 | 노광장치 및 노광방법 |
EP0890136B9 (en) | 1996-12-24 | 2003-12-10 | ASML Netherlands B.V. | Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device |
US6654128B2 (en) | 1997-06-30 | 2003-11-25 | Canon Kabushiki Kaisha | Displacement information detecting apparatus |
JP3679604B2 (ja) * | 1997-06-30 | 2005-08-03 | キヤノン株式会社 | 変位情報検出装置 |
US6208407B1 (en) | 1997-12-22 | 2001-03-27 | Asm Lithography B.V. | Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement |
KR100819239B1 (ko) | 1998-03-11 | 2008-04-03 | 가부시키가이샤 니콘 | 자외 레이저 장치, 레이저 장치, 노광 장치와 노광 방법, 디바이스 제조 방법, 자외광 조사 장치, 물체 패턴 검출 장치, 자외광 조사 방법 및 물체 패턴 검출 방법 |
AU2747999A (en) | 1998-03-26 | 1999-10-18 | Nikon Corporation | Projection exposure method and system |
SG124257A1 (en) | 2000-02-25 | 2006-08-30 | Nikon Corp | Exposure apparatus and exposure method capable of controlling illumination distribution |
JP4396793B2 (ja) * | 2000-04-27 | 2010-01-13 | ソニー株式会社 | 基板の製造方法 |
US7289212B2 (en) | 2000-08-24 | 2007-10-30 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufacturing thereby |
WO2002069049A2 (en) | 2001-02-27 | 2002-09-06 | Asml Us, Inc. | Simultaneous imaging of two reticles |
TW529172B (en) | 2001-07-24 | 2003-04-21 | Asml Netherlands Bv | Imaging apparatus |
JP2004101362A (ja) | 2002-09-10 | 2004-04-02 | Canon Inc | ステージ位置計測および位置決め装置 |
SG135052A1 (en) | 2002-11-12 | 2007-09-28 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
EP1420298B1 (en) | 2002-11-12 | 2013-02-20 | ASML Netherlands B.V. | Lithographic apparatus |
JP4184346B2 (ja) | 2002-12-13 | 2008-11-19 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 層上のスポットを照射するための方法及び装置における液体除去 |
TWI295408B (en) * | 2003-10-22 | 2008-04-01 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method, and measurement system |
US7589822B2 (en) | 2004-02-02 | 2009-09-15 | Nikon Corporation | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
US7102729B2 (en) | 2004-02-03 | 2006-09-05 | Asml Netherlands B.V. | Lithographic apparatus, measurement system, and device manufacturing method |
US7256871B2 (en) | 2004-07-27 | 2007-08-14 | Asml Netherlands B.V. | Lithographic apparatus and method for calibrating the same |
US7362446B2 (en) | 2005-09-15 | 2008-04-22 | Asml Netherlands B.V. | Position measurement unit, measurement system and lithographic apparatus comprising such position measurement unit |
US7839485B2 (en) | 2006-01-19 | 2010-11-23 | Nikon Corporation | Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus, and device manufacturing method |
EP3293577A1 (en) | 2006-02-21 | 2018-03-14 | Nikon Corporation | Exposure apparatus, exposure method and device manufacturing method |
US7483120B2 (en) | 2006-05-09 | 2009-01-27 | Asml Netherlands B.V. | Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method |
EP2037487A4 (en) * | 2006-06-09 | 2014-07-02 | Nikon Corp | APPARATUS WITH MOBILE BODY, APPARATUS AND METHOD FOR EXPOSURE, AND METHOD FOR MANUFACTURING DEVICES |
US8334983B2 (en) * | 2009-05-22 | 2012-12-18 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
-
2009
- 2009-02-06 KR KR1020107002608A patent/KR20100124245A/ko not_active Application Discontinuation
- 2009-02-06 US US12/366,934 patent/US8208128B2/en active Active
- 2009-02-06 CN CN2009801003131A patent/CN101796614B/zh not_active Expired - Fee Related
- 2009-02-06 WO PCT/JP2009/000460 patent/WO2009098891A1/ja active Application Filing
- 2009-02-06 JP JP2009552413A patent/JP5344180B2/ja not_active Expired - Fee Related
- 2009-02-09 TW TW098103995A patent/TW200947140A/zh unknown
-
2010
- 2010-09-14 HK HK10108717.3A patent/HK1142436A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN101796614A (zh) | 2010-08-04 |
JP5344180B2 (ja) | 2013-11-20 |
KR20100124245A (ko) | 2010-11-26 |
JPWO2009098891A1 (ja) | 2011-05-26 |
US20090262321A1 (en) | 2009-10-22 |
CN101796614B (zh) | 2012-01-18 |
WO2009098891A1 (ja) | 2009-08-13 |
TW200947140A (en) | 2009-11-16 |
US8208128B2 (en) | 2012-06-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20200202 |