HK1099605A1 - Method and device for thermally treating substrates - Google Patents

Method and device for thermally treating substrates

Info

Publication number
HK1099605A1
HK1099605A1 HK07106695.8A HK07106695A HK1099605A1 HK 1099605 A1 HK1099605 A1 HK 1099605A1 HK 07106695 A HK07106695 A HK 07106695A HK 1099605 A1 HK1099605 A1 HK 1099605A1
Authority
HK
Hong Kong
Prior art keywords
heating plate
substrates
thermally treating
treating substrates
frame
Prior art date
Application number
HK07106695.8A
Other languages
English (en)
Inventor
Werner Saule
Lothar Berger
Christian Krauss
Robert Weihing
Original Assignee
Steag Hamatech Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Steag Hamatech Ag filed Critical Steag Hamatech Ag
Publication of HK1099605A1 publication Critical patent/HK1099605A1/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67248—Temperature monitoring
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67103—Apparatus for thermal treatment mainly by conduction

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Furnace Details (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Light Receiving Elements (AREA)
  • Liquid Crystal (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Resistance Heating (AREA)
  • Control Of Resistance Heating (AREA)
HK07106695.8A 2004-11-17 2007-06-22 Method and device for thermally treating substrates HK1099605A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102004055449A DE102004055449B4 (de) 2004-11-17 2004-11-17 Verfahren und Vorrichtung zum thermischen Behandeln von Substraten
PCT/EP2005/012143 WO2006053690A1 (fr) 2004-11-17 2005-11-12 Procede et dispositif de traitement thermique de substrats

Publications (1)

Publication Number Publication Date
HK1099605A1 true HK1099605A1 (en) 2007-08-17

Family

ID=35520114

Family Applications (1)

Application Number Title Priority Date Filing Date
HK07106695.8A HK1099605A1 (en) 2004-11-17 2007-06-22 Method and device for thermally treating substrates

Country Status (11)

Country Link
US (1) US7842905B2 (fr)
EP (1) EP1812957B1 (fr)
JP (1) JP4922180B2 (fr)
KR (1) KR101106887B1 (fr)
CN (1) CN100555562C (fr)
AT (1) ATE500607T1 (fr)
CA (1) CA2554645C (fr)
DE (2) DE102004055449B4 (fr)
HK (1) HK1099605A1 (fr)
TW (1) TWI376723B (fr)
WO (1) WO2006053690A1 (fr)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101365405B1 (ko) * 2007-10-12 2014-02-19 도쿄엘렉트론가부시키가이샤 열처리장치, 열처리방법 및 기억매체
US8052419B1 (en) * 2007-11-08 2011-11-08 Novellus Systems, Inc. Closed loop temperature heat up and control utilizing wafer-to-heater pedestal gap modulation
TWI472882B (zh) * 2008-05-06 2015-02-11 Novellus Systems Inc 光阻剝離方法及設備
JP5416570B2 (ja) * 2009-12-15 2014-02-12 住友電気工業株式会社 加熱冷却デバイスおよびそれを搭載した装置
JP2012084805A (ja) * 2010-10-14 2012-04-26 Koyo Thermo System Kk 熱処理装置
FR2971337B1 (fr) 2011-02-04 2013-03-01 Horiba Abx Sas Dispositif et procede de mesures multiparametriques de microparticules dans un fluide
US8371567B2 (en) 2011-04-13 2013-02-12 Novellus Systems, Inc. Pedestal covers
KR20190132561A (ko) 2012-01-06 2019-11-27 노벨러스 시스템즈, 인코포레이티드 적응형 열 교환 방법 및 균일한 열 교환을 위한 시스템
EP3514700A1 (fr) * 2013-02-20 2019-07-24 Hartford Steam Boiler Inspection and Insurance Company Système et procédé de réduction de polarisation aberrante dynamique
CN104503513A (zh) * 2014-12-11 2015-04-08 无锡市锡容电力电器有限公司 一种加热板智能控温加热系统
US10347547B2 (en) 2016-08-09 2019-07-09 Lam Research Corporation Suppressing interfacial reactions by varying the wafer temperature throughout deposition
CN106125520B (zh) * 2016-08-12 2020-04-28 京东方科技集团股份有限公司 应用光刻胶前烘装置进行光刻胶前烘的方法
JP6789096B2 (ja) * 2016-12-22 2020-11-25 東京エレクトロン株式会社 熱処理装置、熱処理方法及びコンピュータ記憶媒体
EP3609686A4 (fr) * 2017-04-12 2020-09-09 The Government of the United States of America, as represented by the Secretary of the Navy Substrat d'électrofilage à température régulée
JP7441724B2 (ja) * 2020-05-26 2024-03-01 株式会社Ｓｃｒｅｅｎホールディングス 熱処理装置および熱処理方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5059770A (en) 1989-09-19 1991-10-22 Watkins-Johnson Company Multi-zone planar heater assembly and method of operation
JPH0637006A (ja) * 1992-07-15 1994-02-10 Fujitsu Ltd 半導体処理装置
US6084215A (en) * 1997-11-05 2000-07-04 Tokyo Electron Limited Semiconductor wafer holder with spring-mounted temperature measurement apparatus disposed therein
US5996353A (en) * 1998-05-21 1999-12-07 Applied Materials, Inc. Semiconductor processing system with a thermoelectric cooling/heating device
DE19907497C2 (de) 1999-02-22 2003-05-28 Steag Hamatech Ag Vorrichtung und Verfahren zur Wärmebehandlung von Substraten
US6469283B1 (en) * 1999-03-04 2002-10-22 Applied Materials, Inc. Method and apparatus for reducing thermal gradients within a substrate support
US6235439B1 (en) * 1999-05-19 2001-05-22 International Business Machines Corporation Method for controlling image size of integrated circuits on wafers supported on hot plates during post exposure baking of the wafers
JP4209057B2 (ja) * 1999-12-01 2009-01-14 東京エレクトロン株式会社 セラミックスヒーターならびにそれを用いた基板処理装置および基板処理方法
JP4430769B2 (ja) * 1999-12-09 2010-03-10 信越化学工業株式会社 セラミックス加熱治具
US6689519B2 (en) * 2000-05-04 2004-02-10 Kla-Tencor Technologies Corp. Methods and systems for lithography process control
DE10059665C1 (de) 2000-12-01 2002-07-11 Steag Hamatech Ag Verfahren zum thermischen Behandeln von Substraten
JP3702175B2 (ja) * 2000-12-19 2005-10-05 東京エレクトロン株式会社 熱処理装置及びその方法、並びにパターン形成方法
US6529686B2 (en) * 2001-06-06 2003-03-04 Fsi International, Inc. Heating member for combination heating and chilling apparatus, and methods
US6841342B2 (en) * 2001-08-08 2005-01-11 Tokyo Electron Limited Substrate processing apparatus and substrate processing method
JP3547724B2 (ja) * 2001-09-25 2004-07-28 沖電気工業株式会社 レジストパターンのベーク装置及びレジストパターンの形成方法
JP3982672B2 (ja) * 2001-10-19 2007-09-26 東京エレクトロン株式会社 加熱処理装置及び加熱処理方法
JP4043831B2 (ja) * 2002-04-24 2008-02-06 東京エレクトロン株式会社 熱処理装置
JP4121122B2 (ja) * 2003-04-01 2008-07-23 東京エレクトロン株式会社 熱処理装置および熱処理装置内温度制御方法

Also Published As

Publication number Publication date
EP1812957A1 (fr) 2007-08-01
JP2008521223A (ja) 2008-06-19
TW200629353A (en) 2006-08-16
US20080217319A1 (en) 2008-09-11
CA2554645A1 (fr) 2006-05-26
CA2554645C (fr) 2014-04-01
WO2006053690A1 (fr) 2006-05-26
DE502005011052D1 (de) 2011-04-14
DE102004055449A1 (de) 2006-06-01
KR101106887B1 (ko) 2012-01-25
DE102004055449B4 (de) 2008-10-23
TWI376723B (en) 2012-11-11
CN100555562C (zh) 2009-10-28
KR20070085074A (ko) 2007-08-27
US7842905B2 (en) 2010-11-30
EP1812957B1 (fr) 2011-03-02
JP4922180B2 (ja) 2012-04-25
ATE500607T1 (de) 2011-03-15
CN1918693A (zh) 2007-02-21

Similar Documents

Publication Publication Date Title
HK1099605A1 (en) Method and device for thermally treating substrates
TW200707680A (en) Heating and cooling of substrate support
WO2006017596A3 (fr) Caisson a gaz chauffe pour applications de depot chimique en phase vapeur active par plasma
WO2007130909A3 (fr) Traitement thermique assisté par ultraviolet
TW200717660A (en) Heating device and coating and developing apparatus
WO2010008211A3 (fr) Dispositif de traitement thermique multi-étage et dispositif de chauffage utilisé dans un tel dispositif de traitement
TW200616515A (en) Method and system for substrate temperature porfile control
WO2004082821A3 (fr) Systeme et procede de traitement thermique d'un substrat
TW200612512A (en) Substrate heating sapparatus
TW200741159A (en) Heat processing apparatus and heat processing method
TW200735219A (en) Substrate heat treatment apparatus
TW200802680A (en) Substrate support structure, heat treatment apparatus using same, first sheet-like object for use in the substrate support structure, method of manufacturing the substrate support structure, heat treatment apparatus, and substrate sucking method
TW200709256A (en) Active cooling substrate support
TW200636819A (en) Heat processing, coating-developing processing apparatus and heat processing method
WO2012125469A3 (fr) Chauffage incliné du côté inférieur d'un substrat à l'aide d'un ensemble lampe
TW200520100A (en) Selective heating using flash anneal
TW200509291A (en) MEMS based multi-polar electrostatic chuck
ATE512714T1 (de) Mikroelektronische vorrichtung mit heizanordnung
BR0314851A (pt) Sistema e método para simultaneamente aquecer e resfriar vidro a produção de vidro temperado
PL1979495T3 (pl) Proces obróbki cieplnej taśm stalowych
WO2011035041A3 (fr) Mécanisme de transfert de substrat avec éléments de préchauffage
MY159092A (en) Unit and process for treating the surface af flat glass with thermal conditioning of the glass.
TW200713541A (en) Bake unit, method for cooling heating plate used in the bake unit, apparatus and method for treating substrates with the bake unit
WO2008008585A3 (fr) Chauffage multizone pour four
SE0502913L (sv) Förfarande för att justera hårdheten hos en skivliknande metallprodukt

Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20151112