HK1085544A1 - Device for transferring a pattern to an object - Google Patents

Device for transferring a pattern to an object

Info

Publication number
HK1085544A1
HK1085544A1 HK06104052.1A HK06104052A HK1085544A1 HK 1085544 A1 HK1085544 A1 HK 1085544A1 HK 06104052 A HK06104052 A HK 06104052A HK 1085544 A1 HK1085544 A1 HK 1085544A1
Authority
HK
Hong Kong
Prior art keywords
transferring
pattern
Prior art date
Application number
HK06104052.1A
Other languages
English (en)
Inventor
Lennart Olsson
Peter Andersson
Original Assignee
Obducat Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from SE0202550A external-priority patent/SE0202550D0/xx
Application filed by Obducat Ab filed Critical Obducat Ab
Publication of HK1085544A1 publication Critical patent/HK1085544A1/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003Alignment type or strategy, e.g. leveling, global alignment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7042Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049Technique, e.g. interferometric
    • G03F9/7053Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/855Coating only part of a support with a magnetic layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B29C2059/023Microembossing

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
HK06104052.1A 2002-08-27 2006-04-03 Device for transferring a pattern to an object HK1085544A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US40605202P 2002-08-27 2002-08-27
SE0202550A SE0202550D0 (sv) 2002-08-27 2002-08-27 Device for transferring a pattern to an object
PCT/SE2003/001245 WO2004021083A1 (en) 2002-08-27 2003-07-31 Device for transferring a pattern to an object

Publications (1)

Publication Number Publication Date
HK1085544A1 true HK1085544A1 (en) 2006-08-25

Family

ID=31980720

Family Applications (1)

Application Number Title Priority Date Filing Date
HK06104052.1A HK1085544A1 (en) 2002-08-27 2006-04-03 Device for transferring a pattern to an object

Country Status (7)

Country Link
US (1) US7754131B2 (zh)
EP (1) EP1546804A1 (zh)
JP (1) JP2005537656A (zh)
CN (1) CN100454141C (zh)
AU (1) AU2003251262A1 (zh)
HK (1) HK1085544A1 (zh)
WO (1) WO2004021083A1 (zh)

Families Citing this family (60)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1443344A1 (en) * 2003-01-29 2004-08-04 Heptagon Oy Manufacturing micro-structured elements
JP2005101201A (ja) * 2003-09-24 2005-04-14 Canon Inc ナノインプリント装置
JP4458958B2 (ja) * 2004-07-01 2010-04-28 独立行政法人理化学研究所 微細パターン形成方法および微細パターン形成装置
US20060027036A1 (en) * 2004-08-05 2006-02-09 Biggs Todd L Methods and apparatuses for imprinting substrates
US7162810B2 (en) * 2004-08-11 2007-01-16 Intel Corporation Micro tool alignment apparatus and method
US7608446B2 (en) 2004-09-30 2009-10-27 Alcatel-Lucent Usa Inc. Nanostructured surface for microparticle analysis and manipulation
US7399422B2 (en) 2005-11-29 2008-07-15 Asml Holding N.V. System and method for forming nanodisks used in imprint lithography and nanodisk and memory disk formed thereby
US7409759B2 (en) 2004-12-16 2008-08-12 Asml Holding N.V. Method for making a computer hard drive platen using a nano-plate
US7363854B2 (en) 2004-12-16 2008-04-29 Asml Holding N.V. System and method for patterning both sides of a substrate utilizing imprint lithography
US7331283B2 (en) 2004-12-16 2008-02-19 Asml Holding N.V. Method and apparatus for imprint pattern replication
US7410591B2 (en) 2004-12-16 2008-08-12 Asml Holding N.V. Method and system for making a nano-plate for imprint lithography
US7281920B2 (en) * 2005-03-28 2007-10-16 Komag, Inc. Die set utilizing compliant gasket
JP2006310678A (ja) * 2005-05-02 2006-11-09 Ricoh Opt Ind Co Ltd 微細表面構造形成用基板、微細表面構造物品の製造方法及びその製造方法で製造された微細表面構造物品
US7854873B2 (en) 2005-06-10 2010-12-21 Obducat Ab Imprint stamp comprising cyclic olefin copolymer
ES2317159T3 (es) * 2005-06-10 2009-04-16 Obducat Ab Replicacion de modelo con sello intermedio.
US8808808B2 (en) * 2005-07-22 2014-08-19 Molecular Imprints, Inc. Method for imprint lithography utilizing an adhesion primer layer
US8557351B2 (en) 2005-07-22 2013-10-15 Molecular Imprints, Inc. Method for adhering materials together
US8846195B2 (en) 2005-07-22 2014-09-30 Canon Nanotechnologies, Inc. Ultra-thin polymeric adhesion layer
WO2007067488A2 (en) * 2005-12-08 2007-06-14 Molecular Imprints, Inc. Method and system for double-sided patterning of substrates
US7670530B2 (en) * 2006-01-20 2010-03-02 Molecular Imprints, Inc. Patterning substrates employing multiple chucks
CN100382980C (zh) * 2005-12-31 2008-04-23 北京大学 生物模板纳米压印方法
US7690910B2 (en) * 2006-02-01 2010-04-06 Canon Kabushiki Kaisha Mold for imprint, process for producing minute structure using the mold, and process for producing the mold
JP4872373B2 (ja) * 2006-02-15 2012-02-08 株式会社日立製作所 部位選択的に修飾された微細構造体およびその製造方法
FR2899336B1 (fr) 2006-03-29 2008-07-04 Super Sonic Imagine Procede et dispositif pour l'imagerie d'un milieu viscoelastique
KR101261606B1 (ko) 2006-05-09 2013-05-09 삼성디스플레이 주식회사 표시판의 제조 장치 및 제조 방법
US8025829B2 (en) * 2006-11-28 2011-09-27 Nanonex Corporation Die imprint by double side force-balanced press for step-and-repeat imprint lithography
EP2584408B1 (en) 2007-02-06 2020-10-07 Canon Kabushiki Kaisha Imprint method and imprint apparatus
DE502007005337D1 (de) * 2007-03-21 2010-11-25 Thallner Erich Verfahren und Vorrichtung zur Erzeugung einer nanostrukturierten Scheibe
US20080309900A1 (en) * 2007-06-12 2008-12-18 Micron Technology, Inc. Method of making patterning device, patterning device for making patterned structure, and method of making patterned structure
KR101289337B1 (ko) * 2007-08-29 2013-07-29 시게이트 테크놀로지 엘엘씨 양면 임프린트 리소그래피 장치
WO2009041816A2 (en) * 2007-09-25 2009-04-02 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappeliijk Onderzoek Tno A method of patterning a hard disk medium
US20090100677A1 (en) * 2007-10-23 2009-04-23 Tdk Corporation Imprinting method, information recording medium manufacturing method, and imprinting system
JP4578517B2 (ja) * 2007-12-26 2010-11-10 Scivax株式会社 インプリント装置およびインプリント方法
JP2009154407A (ja) 2007-12-27 2009-07-16 Tdk Corp 剥離装置、剥離方法および情報記録媒体製造方法
KR100961913B1 (ko) 2008-08-08 2010-06-10 에이피시스템 주식회사 기판의 앞면과 뒷면을 동시에 임프린팅 할 수 있는 기판 임프린팅 장치
DK2329319T3 (da) 2008-08-27 2013-10-21 Amo Gmbh Forbedret nanoimprint fremgangsmåde
US8361546B2 (en) 2008-10-30 2013-01-29 Molecular Imprints, Inc. Facilitating adhesion between substrate and patterned layer
WO2010065071A2 (en) 2008-11-25 2010-06-10 Regents Of The University Of Minnesota Replication of patterned thin-film structures for use in plasmonics and metamaterials
EP2199854B1 (en) 2008-12-19 2015-12-16 Obducat AB Hybrid polymer mold for nano-imprinting and method for making the same
EP2199855B1 (en) 2008-12-19 2016-07-20 Obducat Methods and processes for modifying polymer material surface interactions
KR100957622B1 (ko) * 2009-09-07 2010-05-13 한국기계연구원 열형 롤 임프린팅과 패턴된 제판을 이용하는 인쇄장치, 이를 이용한 마이크로 마이크로 유체소자 및 센서용 필름 라미네이팅 장치 및 인쇄 방법
US8747092B2 (en) 2010-01-22 2014-06-10 Nanonex Corporation Fast nanoimprinting apparatus using deformale mold
JP5469041B2 (ja) * 2010-03-08 2014-04-09 株式会社日立ハイテクノロジーズ 微細構造転写方法およびその装置
WO2011135532A2 (en) 2010-04-28 2011-11-03 Kimberly-Clark Worldwide, Inc. Composite microneedle array including nanostructures thereon
CN101866958A (zh) * 2010-05-14 2010-10-20 河海大学常州校区 太阳能电池仿生抗反射膜及其制备方法
JPWO2011155582A1 (ja) * 2010-06-11 2013-08-15 株式会社日立ハイテクノロジーズ 微細構造転写用スタンパ及び微細構造転写装置
KR101304149B1 (ko) * 2010-09-27 2013-09-05 (주)엘지하우시스 3차원 패턴 형성용 성형 몰드 및 이를 이용한 가전제품 외장재 제조 방법
JP2012109487A (ja) * 2010-11-19 2012-06-07 Hitachi High-Technologies Corp 両面インプリント装置
CN102886997A (zh) * 2011-07-21 2013-01-23 苏州工业园区拓朴环保净化有限公司 智能型滤芯自动刻印机
KR20140079429A (ko) 2011-10-27 2014-06-26 킴벌리-클라크 월드와이드, 인크. 생체활성 제제를 전달하기 위한 이식형 기구
JP5970646B2 (ja) * 2011-11-25 2016-08-17 Scivax株式会社 インプリント装置およびインプリント方法
JP6180131B2 (ja) * 2012-03-19 2017-08-16 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
JP6223415B2 (ja) * 2012-03-19 2017-11-01 エーファウ・グループ・エー・タルナー・ゲーエムベーハー ボンディング圧を圧力伝達する圧力伝達プレート
EP2889895B1 (en) * 2012-08-27 2017-11-15 Scivax Corporation Imprint device and imprint method
JP6252098B2 (ja) * 2012-11-01 2017-12-27 信越化学工業株式会社 角形金型用基板
US10105883B2 (en) 2013-03-15 2018-10-23 Nanonex Corporation Imprint lithography system and method for manufacturing
US10108086B2 (en) 2013-03-15 2018-10-23 Nanonex Corporation System and methods of mold/substrate separation for imprint lithography
CN103246161B (zh) * 2013-05-10 2015-09-02 青岛博纳光电装备有限公司 一种用于大面积纳米压印的自适应压印头
US11567417B2 (en) 2021-01-20 2023-01-31 Applied Materials, Inc. Anti-slippery stamp landing ring
US20230131528A1 (en) * 2021-10-27 2023-04-27 Footprint International Llc Marking systems and methods for fiber-based products

Family Cites Families (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3502761A (en) * 1967-09-25 1970-03-24 Panayotis C Dimitracopoulos Method of forming magnetic record discs
US3704974A (en) * 1970-04-20 1972-12-05 Comet Ind Molding machine
US4079232A (en) * 1975-09-24 1978-03-14 Koehring Company Contact heater mechanisms for thermoforming machines
NL7803069A (nl) * 1978-03-22 1979-09-25 Philips Nv Meerlaags informatieschijf.
US4377377A (en) * 1978-05-10 1983-03-22 Leesona Corporation Differential pressure forming machine with variable mold closed cycle
DE3039821A1 (de) * 1980-10-22 1982-06-03 Robert Bosch Gmbh, 7000 Stuttgart Mehrschichtsystem fuer waermeschutzanwendung
JPS58131732A (ja) * 1982-01-29 1983-08-05 Fujitsu Ltd マスクアライメント装置
DE3322131A1 (de) * 1983-06-20 1984-12-20 Polygram Gmbh, 2000 Hamburg Plattenfoermiger, optisch auslesbarer informationstraeger mit schutzrand
JPS62196826A (ja) 1986-02-24 1987-08-31 Fuji Merutetsuku Kk 露光装置
JPS62211657A (ja) * 1986-03-13 1987-09-17 Oak Seisakusho:Kk プリント基板の焼付け方法
JPH01307758A (ja) * 1988-06-07 1989-12-12 Toshiba Corp 露光装置
JP2787581B2 (ja) * 1988-10-31 1998-08-20 株式会社小松製作所 プラスチック圧縮成形機の温度調節装置
JP3087305B2 (ja) * 1990-03-05 2000-09-11 株式会社ニコン ステージ装置
US5061164A (en) * 1991-04-01 1991-10-29 Micron Technology, Inc. Dowel-less mold chase for use in transfer molding
JP3321225B2 (ja) * 1992-12-11 2002-09-03 セイコープレシジョン株式会社 露光装置
US5512131A (en) * 1993-10-04 1996-04-30 President And Fellows Of Harvard College Formation of microstamped patterns on surfaces and derivative articles
JP3372258B2 (ja) * 1995-08-04 2003-01-27 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン リソグラフィ・プロセス用のスタンプ
US5772905A (en) 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
US5617785A (en) * 1995-12-06 1997-04-08 Lo; Wen C. Embossing machine
JPH09244265A (ja) * 1996-03-11 1997-09-19 Toshiba Corp 露光装置
US6060121A (en) * 1996-03-15 2000-05-09 President And Fellows Of Harvard College Microcontact printing of catalytic colloids
JPH10106049A (ja) * 1996-09-27 1998-04-24 Sony Corp 光学記録媒体の製造方法
DE19648844C1 (de) * 1996-11-26 1997-09-18 Jenoptik Jena Gmbh Einrichtung und Verfahren zur Abformung mikrosystemtechnischer Strukturen
US6007889A (en) * 1998-06-22 1999-12-28 Target Technology, Llc Metal alloys for the reflective or the semi-reflective layer of an optical storage medium
JP2975346B1 (ja) * 1998-07-29 1999-11-10 株式会社菊水製作所 粉末圧縮成形機
JP2000155430A (ja) * 1998-11-24 2000-06-06 Nsk Ltd 両面露光装置における自動アライメント方法
US6142763A (en) * 1998-12-30 2000-11-07 International Thermoforming Systems, Inc. Thermal presses for forming articles from a web of thermoplastic material
JP4100799B2 (ja) 1999-01-25 2008-06-11 キヤノン株式会社 マスクパターン転写方法、マスクパターン転写装置、デバイス製造方法及び転写マスク
SE515607C2 (sv) 1999-12-10 2001-09-10 Obducat Ab Anordning och metod vid tillverkning av strukturer
US20010050449A1 (en) * 2000-01-12 2001-12-13 Baxter Keith M. Solar powered crayon recycling toy
SE515962C2 (sv) * 2000-03-15 2001-11-05 Obducat Ab Anordning för överföring av mönster till objekt
NZ522018A (en) * 2000-04-20 2003-09-26 Masonite Corp Reverse molded fibreboard panel
CN100504598C (zh) * 2000-07-16 2009-06-24 得克萨斯州大学系统董事会 用于平版印刷工艺中的高分辨率重叠对齐方法和系统
US6799963B1 (en) * 2000-10-31 2004-10-05 Eastman Kodak Company Microlens array mold
US6514123B1 (en) * 2000-11-21 2003-02-04 Agere Systems Inc. Semiconductor polishing pad alignment device for a polishing apparatus and method of use
US6758664B1 (en) * 2001-01-12 2004-07-06 Seagate Technology Llc Self-leveling stamper module
JP4203709B2 (ja) * 2001-02-28 2009-01-07 コニカミノルタホールディングス株式会社 光学素子成形金型
JP4797258B2 (ja) * 2001-03-06 2011-10-19 トヨタ紡織株式会社 ボード成形品の成形方法及びそれに用いる成形装置
US6849558B2 (en) * 2002-05-22 2005-02-01 The Board Of Trustees Of The Leland Stanford Junior University Replication and transfer of microstructures and nanostructures

Also Published As

Publication number Publication date
JP2005537656A (ja) 2005-12-08
EP1546804A1 (en) 2005-06-29
WO2004021083A1 (en) 2004-03-11
CN1678956A (zh) 2005-10-05
CN100454141C (zh) 2009-01-21
US7754131B2 (en) 2010-07-13
US20060006580A1 (en) 2006-01-12
AU2003251262A1 (en) 2004-03-19

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Effective date: 20180731