HK1069797A1 - Scribing device and method for fragile material substrate and scribing method for fragile material substrate - Google Patents
Scribing device and method for fragile material substrate and scribing method for fragile material substrateInfo
- Publication number
- HK1069797A1 HK1069797A1 HK05102267A HK05102267A HK1069797A1 HK 1069797 A1 HK1069797 A1 HK 1069797A1 HK 05102267 A HK05102267 A HK 05102267A HK 05102267 A HK05102267 A HK 05102267A HK 1069797 A1 HK1069797 A1 HK 1069797A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- material substrate
- fragile material
- scribing
- scribing device
- fragile
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
- B23K26/0608—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams in the same heat affected zone [HAZ]
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/09—Severing cooled glass by thermal shock
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/067—Dividing the beam into multiple beams, e.g. multifocusing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/073—Shaping the laser spot
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
- B28D5/0011—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing with preliminary treatment, e.g. weakening by scoring
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/09—Severing cooled glass by thermal shock
- C03B33/091—Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/09—Severing cooled glass by thermal shock
- C03B33/091—Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam
- C03B33/093—Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam using two or more focussed radiation beams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001215055 | 2001-07-16 | ||
PCT/JP2002/007233 WO2003008168A1 (en) | 2001-07-16 | 2002-07-16 | Scribing device for fragile material substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1069797A1 true HK1069797A1 (en) | 2005-06-03 |
Family
ID=19049763
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK05102267A HK1069797A1 (en) | 2001-07-16 | 2005-03-15 | Scribing device and method for fragile material substrate and scribing method for fragile material substrate |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPWO2003008168A1 (en) |
KR (1) | KR100583889B1 (en) |
CN (2) | CN100411825C (en) |
HK (1) | HK1069797A1 (en) |
TW (1) | TW542763B (en) |
WO (1) | WO2003008168A1 (en) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20070005604A (en) * | 2004-04-27 | 2007-01-10 | 미쓰보시 다이야몬도 고교 가부시키가이샤 | Method for forming vertical crack on brittle board and vertical crack forming apparatus |
JP4856931B2 (en) * | 2004-11-19 | 2012-01-18 | キヤノン株式会社 | Laser cleaving method and laser cleaving apparatus |
US8093530B2 (en) | 2004-11-19 | 2012-01-10 | Canon Kabushiki Kaisha | Laser cutting apparatus and laser cutting method |
CN101296787B (en) * | 2005-10-28 | 2012-02-15 | 三星钻石工业股份有限公司 | Method of forming scribe line on substrate of brittle material and scribe line forming apparatus |
WO2008104560A1 (en) * | 2007-02-28 | 2008-09-04 | Ceramtec Ag | Method for producing a component using asymmetrical energy input along the parting or predetermined breaking line |
JP2008229716A (en) * | 2007-03-23 | 2008-10-02 | Toray Eng Co Ltd | Method and device for laser scribing, and cleaved substrate cleaved using the same method or the same device |
JP2008264805A (en) * | 2007-04-17 | 2008-11-06 | Disco Abrasive Syst Ltd | Laser beam machining apparatus and laser beam machining method for adhesive film mounted on reverse side of wafer |
JP5060880B2 (en) * | 2007-09-11 | 2012-10-31 | 三星ダイヤモンド工業株式会社 | Fragment material substrate cutting apparatus and method |
CN102239034A (en) * | 2008-12-16 | 2011-11-09 | 镭美科技股份有限公司 | Splitting apparatus and cleavage method for brittle material |
DE112010003736T5 (en) * | 2009-08-06 | 2013-02-28 | Applied Materials, Inc. | Scratches of transverse ISO lines, linking, and simplified laser and scanner controls |
CN102282485B (en) * | 2009-08-06 | 2012-08-29 | 住友化学株式会社 | Method for manufacturing polarizing plate |
CN102012552B (en) * | 2010-09-27 | 2012-08-15 | 江苏大学 | Light path automatic adjusting system for multi-window multi-wavelength laser |
TW201301557A (en) * | 2011-06-17 | 2013-01-01 | Univ Nat Cheng Kung | Light-emitting device structure and method for manufacturing the same |
CN102248308A (en) * | 2011-06-24 | 2011-11-23 | 广东工业大学 | Method for performing microprocessing by utilizing laser cavitation micro jet flow |
JP6721439B2 (en) * | 2016-07-11 | 2020-07-15 | 株式会社ディスコ | Laser processing equipment |
CN113618251A (en) * | 2021-08-04 | 2021-11-09 | 昆山燎原自动化设备有限责任公司 | Laser processing equipment for substrate scribing |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01306088A (en) * | 1988-06-01 | 1989-12-11 | Nippei Toyama Corp | Variable beam laser processing device |
JPH0639572A (en) * | 1991-01-11 | 1994-02-15 | Souei Tsusho Kk | Wafer cutting device |
JPH06234092A (en) * | 1993-02-12 | 1994-08-23 | Nikon Corp | Laser beam working machine |
JPH0929472A (en) * | 1995-07-14 | 1997-02-04 | Hitachi Ltd | Method and device for splitting and chip material |
JP3164508B2 (en) * | 1996-05-22 | 2001-05-08 | 株式会社システクアカザワ | Scoring device |
JPH1034364A (en) * | 1996-07-25 | 1998-02-10 | Souei Tsusho Kk | Brittle material splitting method by plural point heat sources |
JPH10128567A (en) * | 1996-10-30 | 1998-05-19 | Nec Kansai Ltd | Laser beam splitting method |
JP3526175B2 (en) * | 1997-06-11 | 2004-05-10 | 三菱電機株式会社 | Laser processing equipment |
JP2000058489A (en) * | 1998-08-07 | 2000-02-25 | Disco Abrasive Syst Ltd | Work dividing method and device |
US6211488B1 (en) * | 1998-12-01 | 2001-04-03 | Accudyne Display And Semiconductor Systems, Inc. | Method and apparatus for separating non-metallic substrates utilizing a laser initiated scribe |
US6259058B1 (en) * | 1998-12-01 | 2001-07-10 | Accudyne Display And Semiconductor Systems, Inc. | Apparatus for separating non-metallic substrates |
CN1413136A (en) * | 1999-11-24 | 2003-04-23 | 应用光子学公司 | Method and apparatus for separating non-metallic materials |
JP4390937B2 (en) * | 1999-11-25 | 2009-12-24 | 三星ダイヤモンド工業株式会社 | Glass plate dividing method and apparatus |
-
2002
- 2002-07-16 TW TW091115803A patent/TW542763B/en not_active IP Right Cessation
- 2002-07-16 JP JP2003513754A patent/JPWO2003008168A1/en active Pending
- 2002-07-16 CN CNB2006100598631A patent/CN100411825C/en not_active Expired - Fee Related
- 2002-07-16 WO PCT/JP2002/007233 patent/WO2003008168A1/en active Application Filing
- 2002-07-16 KR KR1020037017063A patent/KR100583889B1/en not_active IP Right Cessation
- 2002-07-16 CN CNB028141822A patent/CN1255858C/en not_active Expired - Fee Related
-
2005
- 2005-03-15 HK HK05102267A patent/HK1069797A1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR100583889B1 (en) | 2006-05-26 |
CN1827311A (en) | 2006-09-06 |
CN1529648A (en) | 2004-09-15 |
KR20040017248A (en) | 2004-02-26 |
CN1255858C (en) | 2006-05-10 |
TW542763B (en) | 2003-07-21 |
WO2003008168A1 (en) | 2003-01-30 |
JPWO2003008168A1 (en) | 2004-11-04 |
CN100411825C (en) | 2008-08-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20100716 |