HK1065102A1 - Device for ellipsometric two-dimensional display of a sample, display method and ellipsometric measurement method with spatial resolution - Google Patents

Device for ellipsometric two-dimensional display of a sample, display method and ellipsometric measurement method with spatial resolution

Info

Publication number
HK1065102A1
HK1065102A1 HK04107934A HK04107934A HK1065102A1 HK 1065102 A1 HK1065102 A1 HK 1065102A1 HK 04107934 A HK04107934 A HK 04107934A HK 04107934 A HK04107934 A HK 04107934A HK 1065102 A1 HK1065102 A1 HK 1065102A1
Authority
HK
Hong Kong
Prior art keywords
ellipsometric
display
sample
spatial resolution
measurement method
Prior art date
Application number
HK04107934A
Other languages
English (en)
Inventor
Dominique Ausserre
Marie-Pierre Valignat
Original Assignee
Centre Nat Rech Scient
Univ Paris Curie
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre Nat Rech Scient, Univ Paris Curie filed Critical Centre Nat Rech Scient
Publication of HK1065102A1 publication Critical patent/HK1065102A1/xx

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21Polarisation-affecting properties
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21Polarisation-affecting properties
    • G01N21/211Ellipsometry
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y35/00Methods or apparatus for measurement or analysis of nanostructures
HK04107934A 2000-12-18 2004-10-14 Device for ellipsometric two-dimensional display of a sample, display method and ellipsometric measurement method with spatial resolution HK1065102A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0016529A FR2818376B1 (fr) 2000-12-18 2000-12-18 Dispositif de visualisation bidimensionnelle ellipsometrique d'un echantillon, procede de visualisation et procede de mesure ellipsometrique avec resolution spatiale
PCT/FR2001/004046 WO2002050513A1 (fr) 2000-12-18 2001-12-18 Dispositif de visualisation bidimensionnelle ellipsometrique d'un echantillon, procede de visualisation et procede de mesure ellipsometrique avec resolution spatiale

Publications (1)

Publication Number Publication Date
HK1065102A1 true HK1065102A1 (en) 2005-02-08

Family

ID=8857823

Family Applications (1)

Application Number Title Priority Date Filing Date
HK04107934A HK1065102A1 (en) 2000-12-18 2004-10-14 Device for ellipsometric two-dimensional display of a sample, display method and ellipsometric measurement method with spatial resolution

Country Status (12)

Country Link
US (2) US7209232B2 (xx)
EP (1) EP1346201A1 (xx)
JP (2) JP4163951B2 (xx)
KR (1) KR100923271B1 (xx)
CN (1) CN1275030C (xx)
AU (2) AU2002228108B8 (xx)
CA (1) CA2431943C (xx)
FR (1) FR2818376B1 (xx)
HK (1) HK1065102A1 (xx)
IL (2) IL156480A0 (xx)
PL (1) PL204813B1 (xx)
WO (1) WO2002050513A1 (xx)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2841339B1 (fr) * 2002-06-19 2004-09-10 Centre Nat Rech Scient Supports anti-reflechissants et supports amplificateurs de contraste pour la lumiere polarisee en reflexion
KR20040047343A (ko) * 2002-11-29 2004-06-05 학교법인 서강대학교 복소 반사 계수비의 국지적인 차이를 이용한 고체표면에서의 단백질 결합 검출방법
DE102004012125B3 (de) * 2004-03-12 2005-09-01 Nanofilm Technologie Gmbh Ellipsometrisches Messverfahren mit ROI-gestützter Bildkorrektur
EP1584914A1 (en) * 2004-04-08 2005-10-12 Sony Deutschland GmbH A method of detecting a hybrid, formed of at least two species, on a substrate using ellipsometry
FR2872910B1 (fr) * 2004-07-07 2006-10-13 Nanoraptor Sa Composant optique pour l'observation d'un echantillon nanometrique, systeme comprenant un tel composant, procede d'analyse mettant en oeuvre ce composant, et leurs applications
US7453577B2 (en) * 2004-12-14 2008-11-18 Asml Netherlands B.V. Apparatus and method for inspecting a patterned part of a sample
WO2006091913A1 (en) * 2005-02-25 2006-08-31 Nanometrics Incorporated Apparatus and method for enhanced critical dimension scatterometry
WO2009030889A1 (en) * 2007-09-04 2009-03-12 Aberystwyth University Imaging ellipsometer
WO2010021148A1 (ja) * 2008-08-20 2010-02-25 国立大学法人東北大学 形状・傾斜検知及び/又は計測光学装置及び方法並びにその関連装置
JP5895305B2 (ja) 2011-12-06 2016-03-30 シーシーエス株式会社 検査用照明装置及び検査用照明方法
WO2013101252A1 (en) * 2011-12-31 2013-07-04 J.A. Woollam Co., Inc. Terahertz ellipsometer system, and method of use
FR2993987B1 (fr) * 2012-07-26 2016-12-09 Centre Nat Rech Scient Procedes optiques pour l'observation d'echantillons et pour la detection ou le dosage d'especes chimiques ou biologiques.
GB201308434D0 (en) * 2013-05-10 2013-06-19 Innovia Films Sarl Authentication apparatus and method
US9546943B1 (en) * 2015-03-21 2017-01-17 J.A. Woollam Co., Inc System and method for investigating change in optical properties of a porous effective substrate surface as a function of a sequence of solvent partial pressures at atmospheric pressure
CN109141224B (zh) * 2018-10-08 2020-05-22 电子科技大学 一种基于结构光的干涉反射式光学薄膜显微测量方法
CN114674193B (zh) * 2022-03-04 2024-05-07 海克斯康制造智能技术(青岛)有限公司 自定心测量装置及测量机

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL96483A (en) * 1990-11-27 1995-07-31 Orbotech Ltd Optical inspection method and apparatus
JP2787678B2 (ja) * 1992-04-24 1998-08-20 聡 河田 偏光顕微鏡
IL104708A (en) * 1993-02-12 1995-12-31 Orbotech Ltd Device and method for optical inspection of items
DE4311726C2 (de) * 1993-04-08 1996-02-08 Fraunhofer Ges Forschung Verfahren und Vorrichtun zur Erweiterung des Meßbereichs bei Nomarski-Mikroskopen
JP3106790B2 (ja) * 1993-09-01 2000-11-06 株式会社日立製作所 薄膜特性値測定方法及び装置
JP3394811B2 (ja) * 1994-03-22 2003-04-07 浜松ホトニクス株式会社 偏光顕微鏡システム
GB9610471D0 (en) * 1996-05-18 1996-07-24 Univ Nottingham Optical measurement
DE19708036C2 (de) * 1997-02-27 2000-06-29 Gunther Elender Ellipsometrisches Mikroskop
JP4231902B2 (ja) * 1997-07-11 2009-03-04 ケイエルエイ−テンコー コーポレーション 半導体上の多層薄膜積層を解析する装置
FR2779825B1 (fr) * 1998-06-16 2000-09-01 Centre Nat Rech Scient Procede et dispositif de commande de la fabrication d'un composant en couche mince a partir d'une dissociation de gaz

Also Published As

Publication number Publication date
EP1346201A1 (fr) 2003-09-24
JP2004516469A (ja) 2004-06-03
US20040085537A1 (en) 2004-05-06
AU2002228108B2 (en) 2005-12-01
PL204813B1 (pl) 2010-02-26
FR2818376B1 (fr) 2003-03-28
WO2002050513A1 (fr) 2002-06-27
CN1275030C (zh) 2006-09-13
US7307726B2 (en) 2007-12-11
KR100923271B1 (ko) 2009-10-23
CN1489688A (zh) 2004-04-14
IL193361A0 (en) 2011-08-01
PL363425A1 (en) 2004-11-15
US20070188755A1 (en) 2007-08-16
AU2810802A (en) 2002-07-01
KR20030061006A (ko) 2003-07-16
AU2002228108B8 (en) 2006-02-16
FR2818376A1 (fr) 2002-06-21
CA2431943C (fr) 2010-05-04
US7209232B2 (en) 2007-04-24
CA2431943A1 (fr) 2002-06-27
JP4163951B2 (ja) 2008-10-08
IL156480A0 (en) 2004-01-04
JP2008122394A (ja) 2008-05-29
JP4863979B2 (ja) 2012-01-25

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20191218