HK1048190A1 - 光盤以及用於製造其母盤的設備 - Google Patents
光盤以及用於製造其母盤的設備Info
- Publication number
- HK1048190A1 HK1048190A1 HK03100328.0A HK03100328A HK1048190A1 HK 1048190 A1 HK1048190 A1 HK 1048190A1 HK 03100328 A HK03100328 A HK 03100328A HK 1048190 A1 HK1048190 A1 HK 1048190A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- disc
- manufacturing
- therefor
- master
- optical disc
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/007—Arrangement of the information on the record carrier, e.g. form of tracks, actual track shape, e.g. wobbled, or cross-section, e.g. v-shaped; Sequential information structures, e.g. sectoring or header formats within a track
- G11B7/00736—Auxiliary data, e.g. lead-in, lead-out, Power Calibration Area [PCA], Burst Cutting Area [BCA], control information
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
- G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
- H01J2237/31776—Shaped beam
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Manufacturing & Machinery (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000334119A JP2002140840A (ja) | 2000-11-01 | 2000-11-01 | 光ディスク及びその原盤製造装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1048190A1 true HK1048190A1 (zh) | 2003-03-21 |
Family
ID=18810096
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK03100328.0A HK1048190A1 (zh) | 2000-11-01 | 2003-01-14 | 光盤以及用於製造其母盤的設備 |
Country Status (7)
Country | Link |
---|---|
US (2) | US6882615B2 (zh) |
EP (1) | EP1204110A3 (zh) |
JP (1) | JP2002140840A (zh) |
KR (1) | KR100449993B1 (zh) |
CN (1) | CN1360305A (zh) |
HK (1) | HK1048190A1 (zh) |
TW (1) | TW556174B (zh) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003249188A (ja) * | 2002-02-26 | 2003-09-05 | Jeol Ltd | 電子ビーム照射装置及び電子ビーム照射方法 |
EP2315205B1 (en) * | 2002-10-10 | 2014-01-15 | Sony Corporation | Apparatus for producing optical disk-use original and for producing optical disk |
WO2004044909A1 (en) * | 2002-11-14 | 2004-05-27 | Koninklijke Philips Electronics N.V. | Domain expansion rom media with adapted domain shape for improved readout |
JP4058367B2 (ja) * | 2003-03-24 | 2008-03-05 | Tdk株式会社 | エネルギー線照射装置 |
US20060018238A1 (en) * | 2004-07-21 | 2006-01-26 | Trepl John A Ii | Fabrication of digital media using electron beam technology |
US20060018240A1 (en) * | 2004-07-21 | 2006-01-26 | Charles Marshall | Digital media created using electron beam technology |
US20060072428A1 (en) * | 2004-09-03 | 2006-04-06 | Charles Marshall | Fabrication of digital media using ion beam technology |
KR100971461B1 (ko) * | 2008-04-11 | 2010-07-22 | 충주대학교 산학협력단 | 2차전지를 이용한 모바일 디지털 오디오 시스템 |
US8018820B2 (en) * | 2008-08-15 | 2011-09-13 | Seagate Technology, Llc | Magnetic recording system using e-beam deflection |
JP2013131261A (ja) * | 2011-12-20 | 2013-07-04 | Sony Corp | 露光装置、記録媒体、記録装置、再生装置 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4074313A (en) * | 1976-06-14 | 1978-02-14 | Rca Corporation | Electron beam disc recorder |
JPH04137520A (ja) * | 1990-09-28 | 1992-05-12 | Hitachi Ltd | 電子線描画装置および描画方法 |
JP2868682B2 (ja) * | 1992-05-15 | 1999-03-10 | シャープ株式会社 | 光ディスク |
US5602825A (en) * | 1994-01-19 | 1997-02-11 | Kabushiki Kaisha Toshiba | Optical disk and optical disk apparatus |
JP2746098B2 (ja) * | 1994-01-19 | 1998-04-28 | 日本電気株式会社 | 電子ビーム描画用アパーチャおよび電子ビーム描画方法 |
JP2792453B2 (ja) * | 1995-01-13 | 1998-09-03 | 日本電気株式会社 | アパーチャ及びその製造方法 |
US5764619A (en) * | 1995-04-07 | 1998-06-09 | Matsushita Electric Industrial Co., Ltd. | Optical recording medium having two separate recording layers |
JPH09274722A (ja) * | 1996-04-04 | 1997-10-21 | Pioneer Electron Corp | 光ディスクの情報記録装置及び情報記録方法 |
KR19980064133A (ko) * | 1996-12-16 | 1998-10-07 | 히라이가즈히꼬 | 광 기록 매체 |
US5742065A (en) * | 1997-01-22 | 1998-04-21 | International Business Machines Corporation | Heater for membrane mask in an electron-beam lithography system |
JPH10275365A (ja) * | 1997-03-28 | 1998-10-13 | Toshiba Corp | 情報記憶媒体および情報再生装置 |
US6343062B1 (en) * | 1997-09-26 | 2002-01-29 | Matsushita Electric Industrial Co., Ltd | Optical disk device and optical disk for recording and reproducing high-density signals |
JP4026219B2 (ja) * | 1998-03-31 | 2007-12-26 | ソニー株式会社 | ディスク原盤作成装置 |
JPH11288527A (ja) * | 1998-03-31 | 1999-10-19 | Sony Corp | 記録媒体製造用原盤の製造装置及び製造方法 |
JPH10326453A (ja) * | 1998-04-21 | 1998-12-08 | Pioneer Electron Corp | 回転駆動機構 |
JP3730782B2 (ja) * | 1998-06-29 | 2006-01-05 | パイオニア株式会社 | 光ディスク原盤記録装置 |
JP4372867B2 (ja) * | 1998-10-23 | 2009-11-25 | パイオニア株式会社 | 光ディスク及び記録再生装置 |
-
2000
- 2000-11-01 JP JP2000334119A patent/JP2002140840A/ja active Pending
-
2001
- 2001-10-29 US US09/984,251 patent/US6882615B2/en not_active Expired - Fee Related
- 2001-10-31 EP EP01126035A patent/EP1204110A3/en not_active Withdrawn
- 2001-10-31 TW TW090127043A patent/TW556174B/zh not_active IP Right Cessation
- 2001-11-01 KR KR10-2001-0067810A patent/KR100449993B1/ko not_active IP Right Cessation
- 2001-11-01 CN CN01134388A patent/CN1360305A/zh active Pending
-
2003
- 2003-01-14 HK HK03100328.0A patent/HK1048190A1/zh unknown
-
2005
- 2005-02-15 US US11/057,597 patent/US7065034B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR100449993B1 (ko) | 2004-09-30 |
EP1204110A3 (en) | 2007-03-07 |
US7065034B2 (en) | 2006-06-20 |
KR20020034954A (ko) | 2002-05-09 |
JP2002140840A (ja) | 2002-05-17 |
US6882615B2 (en) | 2005-04-19 |
TW556174B (en) | 2003-10-01 |
CN1360305A (zh) | 2002-07-24 |
US20050201261A1 (en) | 2005-09-15 |
US20020057641A1 (en) | 2002-05-16 |
EP1204110A2 (en) | 2002-05-08 |
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