HK1046660B - 半導體晶片載架的清洗裝置和方法 - Google Patents

半導體晶片載架的清洗裝置和方法

Info

Publication number
HK1046660B
HK1046660B HK02108130.2A HK02108130A HK1046660B HK 1046660 B HK1046660 B HK 1046660B HK 02108130 A HK02108130 A HK 02108130A HK 1046660 B HK1046660 B HK 1046660B
Authority
HK
Hong Kong
Prior art keywords
cleaning
wafer carrier
wafer
carrier
Prior art date
Application number
HK02108130.2A
Other languages
English (en)
Other versions
HK1046660A1 (en
Inventor
L Halbmaier David
Original Assignee
弗薩姆材料美國有限責任公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 弗薩姆材料美國有限責任公司 filed Critical 弗薩姆材料美國有限責任公司
Publication of HK1046660A1 publication Critical patent/HK1046660A1/xx
Publication of HK1046660B publication Critical patent/HK1046660B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/08—Cleaning containers, e.g. tanks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/08—Cleaning containers, e.g. tanks
    • B08B9/093—Cleaning containers, e.g. tanks by the force of jets or sprays
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning In General (AREA)
HK02108130.2A 1998-01-09 2002-11-08 半導體晶片載架的清洗裝置和方法 HK1046660B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US7245898P 1998-01-09 1998-01-09
PCT/US1999/000446 WO1999034939A1 (en) 1998-01-09 1999-01-08 Wafer container washing apparatus

Publications (2)

Publication Number Publication Date
HK1046660A1 HK1046660A1 (en) 2003-01-24
HK1046660B true HK1046660B (zh) 2005-07-08

Family

ID=22107714

Family Applications (1)

Application Number Title Priority Date Filing Date
HK02108130.2A HK1046660B (zh) 1998-01-09 2002-11-08 半導體晶片載架的清洗裝置和方法

Country Status (7)

Country Link
US (1) US6248177B1 (zh)
EP (1) EP1075337B1 (zh)
JP (1) JP4447165B2 (zh)
KR (1) KR100560077B1 (zh)
CN (1) CN1165385C (zh)
HK (1) HK1046660B (zh)
WO (1) WO1999034939A1 (zh)

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Publication number Priority date Publication date Assignee Title
JP3563789B2 (ja) * 1993-12-22 2004-09-08 キヤノン株式会社 電子写真感光体の製造方法及び該製造方法に用いられる治具
US6904920B2 (en) * 1998-07-10 2005-06-14 Semitool, Inc. Method and apparatus for cleaning containers
US6432214B2 (en) 1998-07-10 2002-08-13 Semitool, Inc. Cleaning apparatus
US6412502B1 (en) * 1999-07-28 2002-07-02 Semitool, Inc. Wafer container cleaning system
TW495863B (en) * 2000-08-11 2002-07-21 Chem Trace Inc System and method for cleaning semiconductor fabrication equipment
US6635409B1 (en) 2001-07-12 2003-10-21 Advanced Micro Devices, Inc. Method of strengthening photoresist to prevent pattern collapse
WO2003006183A2 (en) * 2001-07-12 2003-01-23 Semitool, Inc. Method and apparatus for cleaning semiconductor wafers and other flat media
US20040000327A1 (en) * 2002-06-26 2004-01-01 Fabio Somboli Apparatus and method for washing quartz parts, particularly for process equipment used in semiconductor industries
TW200408693A (en) * 2002-09-03 2004-06-01 Entegris Inc High temperature, high strength, colorable materials for use with electronics processing applications
US20070026171A1 (en) * 2002-09-03 2007-02-01 Extrand Charles W High temperature, high strength, colorable materials for use with electronics processing applications
JP2006507994A (ja) * 2002-10-09 2006-03-09 エンテグリス・インコーポレーテッド デバイス処理システム用の高温高強度の着色可能な材料
US6830057B2 (en) * 2002-11-01 2004-12-14 Semitool, Inc. Wafer container cleaning system
CN1324647C (zh) * 2003-04-29 2007-07-04 力晶半导体股份有限公司 一种半导体晶片载具内部的污染采样方法
US6923188B2 (en) * 2003-04-29 2005-08-02 Powerchip Semiconductor Corp. Method of sampling contaminants of semiconductor wafer carrier
US7344030B2 (en) * 2003-11-07 2008-03-18 Entegris, Inc. Wafer carrier with apertured door for cleaning
US7073522B2 (en) * 2004-04-05 2006-07-11 Quantum Global Technologies, Llc Apparatus for applying disparate etching solutions to interior and exterior surfaces
KR100615603B1 (ko) * 2004-10-18 2006-08-25 삼성전자주식회사 반도체 제조용 확산 설비의 확산로 세정 방법 및 세정용보조구
DE102005030275A1 (de) * 2005-06-21 2006-12-28 Dynamic Microsystems Semiconductor Equipment Gmbh Verfahren und Vorrichtung zum Reinigen oder Trocknen von topfartigen Hohlkörpern, insbesondere von Transportbehältern für Halbleiterwafer
US8225804B2 (en) * 2007-03-02 2012-07-24 Safety-Kleen Systems, Inc. Multipurpose aqueous parts washer
US9514972B2 (en) * 2008-05-28 2016-12-06 Air Products And Chemicals, Inc. Fixture drying apparatus and method
US9263303B2 (en) * 2010-06-11 2016-02-16 Tel Fsi, Inc. Methodologies for rinsing tool surfaces in tools used to process microelectronic workpieces
CN103170469B (zh) * 2011-12-22 2016-02-03 中芯国际集成电路制造(上海)有限公司 用于清洗和干燥晶圆盒的装置及方法
US20160303622A1 (en) * 2013-10-23 2016-10-20 Brooks Ccs Gmbh Cleaning Systems and Methods for Semiconductor Substrate Storage Articles
CN107433274A (zh) * 2016-05-25 2017-12-05 上海新昇半导体科技有限公司 石英腔体的清洗方法
FR3054474B1 (fr) * 2017-02-16 2018-08-17 Sidel Participations Dispositif et procede de depoussierage de l'interieur d'au moins une preforme
US11699609B2 (en) * 2018-09-28 2023-07-11 Taiwan Semiconductor Manufacturing Company, Ltd. Automated nozzle cleaning system
HRP20230674T1 (hr) * 2019-12-16 2023-09-29 LVP Engineering & Constructions BVBA Uređaj i postupak za čišćenje kontejnera
WO2021207311A1 (en) * 2020-04-08 2021-10-14 Pintek Solutions Corporation Sample carrier cleaner

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1661602A (en) 1926-03-05 1928-03-06 Dary Samuel Milk-can-washing machine
US3092120A (en) * 1960-04-01 1963-06-04 Harry B Hilger Washer for cups and the like
GB1498795A (en) 1974-03-21 1978-01-25 Jackson J Method and apparatus for cleaning containers
US4133340A (en) 1977-04-18 1979-01-09 Ballard Thomas B Cleaning machine for simultaneously cleaning the interior and exterior of hollow articles
US4381016A (en) 1981-07-07 1983-04-26 Douglas Robin S Cleaning fluid distribution head
US4785836A (en) 1987-07-17 1988-11-22 Soichiro Yamamoto Spray washer
US5137043A (en) 1991-05-02 1992-08-11 Wickham Iii Ward E Vehicle for cleaning intermediate bulk containers
US5363867A (en) 1992-01-21 1994-11-15 Shinko Electric Co., Ltd. Article storage house in a clean room
US5224503A (en) * 1992-06-15 1993-07-06 Semitool, Inc. Centrifugal wafer carrier cleaning apparatus
US5409545A (en) 1993-03-04 1995-04-25 Environmental Sampling Supply, Inc. Apparatus and method for cleaning containers
US5616208A (en) 1993-09-17 1997-04-01 Tokyo Electron Limited Vacuum processing apparatus, vacuum processing method, and method for cleaning the vacuum processing apparatus
US5522410A (en) 1994-12-22 1996-06-04 Meilleur; Michel Portable single-cup washer
SE509676C2 (sv) * 1995-05-26 1999-02-22 Bengt Arne Ohlson Tvättanordning för in- och utvändig tvättning av sprundförsedda fat
US5603342A (en) 1995-06-29 1997-02-18 Coulter Corporation Apparatus for cleaning a fluid sample probe

Also Published As

Publication number Publication date
EP1075337B1 (en) 2015-11-18
WO1999034939A8 (en) 2001-05-31
WO1999034939A1 (en) 1999-07-15
JP4447165B2 (ja) 2010-04-07
JP2002500101A (ja) 2002-01-08
KR100560077B1 (ko) 2006-03-13
EP1075337A4 (en) 2004-05-19
HK1046660A1 (en) 2003-01-24
CN1165385C (zh) 2004-09-08
CN1356930A (zh) 2002-07-03
US6248177B1 (en) 2001-06-19
KR20010040331A (ko) 2001-05-15
WO1999034939A9 (en) 1999-09-30
EP1075337A1 (en) 2001-02-14

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Legal Events

Date Code Title Description
PE Patent expired

Effective date: 20190107