HK1044071B - 一種發射器及其製造方法 - Google Patents
一種發射器及其製造方法Info
- Publication number
- HK1044071B HK1044071B HK02103984.0A HK02103984A HK1044071B HK 1044071 B HK1044071 B HK 1044071B HK 02103984 A HK02103984 A HK 02103984A HK 1044071 B HK1044071 B HK 1044071B
- Authority
- HK
- Hong Kong
- Prior art keywords
- producing
- same
- electron emitter
- emitter
- electron
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
- H01J9/025—Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/30—Cold cathodes, e.g. field-emissive cathode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/30—Cold cathodes, e.g. field-emissive cathode
- H01J1/304—Field-emissive cathodes
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Cold Cathode And The Manufacture (AREA)
- Carbon And Carbon Compounds (AREA)
- Physical Vapour Deposition (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19910156A DE19910156C2 (de) | 1999-02-26 | 1999-02-26 | Elektronenemitter und Verfahren zu dessen Herstellung |
PCT/DE2000/000570 WO2000052725A1 (de) | 1999-02-26 | 2000-02-25 | Elektronenemitter und verfahren zu dessen herstellung |
Publications (2)
Publication Number | Publication Date |
---|---|
HK1044071A1 HK1044071A1 (en) | 2002-10-04 |
HK1044071B true HK1044071B (zh) | 2005-02-04 |
Family
ID=7900127
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK02103984.0A HK1044071B (zh) | 1999-02-26 | 2002-05-28 | 一種發射器及其製造方法 |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP1157402B1 (zh) |
JP (1) | JP2002538594A (zh) |
KR (1) | KR100588738B1 (zh) |
DE (2) | DE19910156C2 (zh) |
HK (1) | HK1044071B (zh) |
WO (1) | WO2000052725A1 (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2803944B1 (fr) * | 2000-01-14 | 2002-06-14 | Thomson Tubes Electroniques | Cathode generatrice d'electrons et son procede de fabrication |
EP1256124A1 (en) | 2000-02-16 | 2002-11-13 | Fullerene International Corporation | Diamond/carbon nanotube structures for efficient electron field emission |
DE10306076B4 (de) * | 2003-02-08 | 2005-02-17 | Hahn-Meitner-Institut Berlin Gmbh | Quantenpunkt aus elektrisch leitendem Kohlenstoff, Verfahren zur Herstellung und Anwendung |
DE102004011363A1 (de) * | 2004-03-05 | 2005-09-29 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Element mit strukturierter Oberfläche sowie Verfahren zu seiner Herstellung |
JP6684488B2 (ja) * | 2016-09-30 | 2020-04-22 | 株式会社長町サイエンスラボ | 導電性dlc膜の製造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5089742A (en) * | 1990-09-28 | 1992-02-18 | The United States Of America As Represented By The Secretary Of The Navy | Electron beam source formed with biologically derived tubule materials |
US5619092A (en) * | 1993-02-01 | 1997-04-08 | Motorola | Enhanced electron emitter |
FR2705830B1 (fr) * | 1993-05-27 | 1995-06-30 | Commissariat Energie Atomique | Procédé de fabrication de dispositifs d'affichage à micropointes, utilisant la lithographie par ions lourds. |
US5462467A (en) * | 1993-09-08 | 1995-10-31 | Silicon Video Corporation | Fabrication of filamentary field-emission device, including self-aligned gate |
JP2873930B2 (ja) * | 1996-02-13 | 1999-03-24 | 工業技術院長 | カーボンナノチューブを有する炭素質固体構造体、炭素質固体構造体からなる電子線源素子用電子放出体、及び炭素質固体構造体の製造方法 |
US5857882A (en) * | 1996-02-27 | 1999-01-12 | Sandia Corporation | Processing of materials for uniform field emission |
US5726524A (en) * | 1996-05-31 | 1998-03-10 | Minnesota Mining And Manufacturing Company | Field emission device having nanostructured emitters |
EP1361592B1 (en) * | 1997-09-30 | 2006-05-24 | Noritake Co., Ltd. | Method of manufacturing an electron-emitting source |
-
1999
- 1999-02-26 DE DE19910156A patent/DE19910156C2/de not_active Expired - Fee Related
-
2000
- 2000-02-25 KR KR1020017010531A patent/KR100588738B1/ko not_active IP Right Cessation
- 2000-02-25 JP JP2000603064A patent/JP2002538594A/ja active Pending
- 2000-02-25 EP EP00912394A patent/EP1157402B1/de not_active Expired - Lifetime
- 2000-02-25 WO PCT/DE2000/000570 patent/WO2000052725A1/de active IP Right Grant
- 2000-02-25 DE DE50006333T patent/DE50006333D1/de not_active Expired - Fee Related
-
2002
- 2002-05-28 HK HK02103984.0A patent/HK1044071B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE19910156C2 (de) | 2002-07-18 |
WO2000052725A1 (de) | 2000-09-08 |
EP1157402B1 (de) | 2004-05-06 |
DE19910156A1 (de) | 2000-09-07 |
HK1044071A1 (en) | 2002-10-04 |
EP1157402A1 (de) | 2001-11-28 |
KR20010102258A (ko) | 2001-11-15 |
JP2002538594A (ja) | 2002-11-12 |
KR100588738B1 (ko) | 2006-06-12 |
DE50006333D1 (de) | 2004-06-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20080225 |