HK1028750A1 - Electrolytic in-process dressing apparatus - Google Patents
Electrolytic in-process dressing apparatusInfo
- Publication number
- HK1028750A1 HK1028750A1 HK00108189A HK00108189A HK1028750A1 HK 1028750 A1 HK1028750 A1 HK 1028750A1 HK 00108189 A HK00108189 A HK 00108189A HK 00108189 A HK00108189 A HK 00108189A HK 1028750 A1 HK1028750 A1 HK 1028750A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- electrolytic
- dressing apparatus
- process dressing
- dressing
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/02—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor involving a reciprocatingly-moved work-table
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
- B23H3/00—Electrochemical machining, i.e. removing metal by passing current between an electrode and a workpiece in the presence of an electrolyte
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/001—Devices or means for dressing or conditioning abrasive surfaces involving the use of electric current
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11106920A JP2000296413A (ja) | 1999-04-14 | 1999-04-14 | 卓上elid加工装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1028750A1 true HK1028750A1 (en) | 2001-03-02 |
Family
ID=14445869
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK00108189A HK1028750A1 (en) | 1999-04-14 | 2000-12-19 | Electrolytic in-process dressing apparatus |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP1044767B1 (xx) |
JP (1) | JP2000296413A (xx) |
KR (1) | KR100561291B1 (xx) |
CA (1) | CA2305832A1 (xx) |
DE (1) | DE60036506T2 (xx) |
HK (1) | HK1028750A1 (xx) |
SG (1) | SG109419A1 (xx) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112894585A (zh) * | 2021-01-31 | 2021-06-04 | 重庆电子工程职业学院 | 一种集成电路板用覆铜板氧化膜处理装置 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4215228B2 (ja) * | 1999-10-26 | 2009-01-28 | 独立行政法人理化学研究所 | 卓上4軸鏡面加工装置 |
JP2004322234A (ja) * | 2003-04-22 | 2004-11-18 | Fukuoka Prefecture | 導電性砥石の加工装置及び加工方法 |
KR100574083B1 (ko) * | 2004-05-31 | 2006-04-27 | 주식회사 대산정밀 | 3차원 마이크로 방전 가공 장치 |
US8162825B2 (en) | 2005-02-15 | 2012-04-24 | Olympus Corporation | Endoscope |
KR100972158B1 (ko) * | 2008-05-13 | 2010-07-26 | 삼성중공업 주식회사 | 와이어 컨트롤을 이용한 자율이동장치의 와이어 고정장치 |
CN102229075B (zh) * | 2011-05-16 | 2013-01-09 | 湘潭三峰数控机床有限公司 | 多拖板对称式数控坐标磨床 |
CN108436205B (zh) * | 2018-03-07 | 2019-09-17 | 大连海事大学 | 一种电解加工气缸套表面微织构的装置及方法 |
CN112008167B (zh) * | 2019-05-31 | 2022-03-15 | 中国石油大学(华东) | 一种新型电弧增材与气中电火花电弧铣削减材复合制造装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5236784A (en) * | 1987-02-09 | 1993-08-17 | Kabushiki Kaisha Sankyo Seiki Seisakusho | Bearing material and plastic bearing |
JPH01115534A (ja) * | 1987-10-28 | 1989-05-08 | Nissei Plastics Ind Co | 複合加工機 |
JPH03287373A (ja) * | 1990-04-04 | 1991-12-18 | Hitachi Ltd | ダイアモンド砥石の成形方法 |
DE69306049T2 (de) * | 1992-06-19 | 1997-03-13 | Rikagaku Kenkyusho | Vorrichtung zum Schleifen von Spiegeloberfläche |
JPH0760642A (ja) * | 1993-08-30 | 1995-03-07 | Rikagaku Kenkyusho | 電解ドレッシング研削方法及び装置 |
JPH08276363A (ja) * | 1995-04-10 | 1996-10-22 | Olympus Optical Co Ltd | 研削加工方法および装置 |
JPH10249689A (ja) * | 1997-03-10 | 1998-09-22 | Tokyo Seimitsu Co Ltd | ウェーハ面取方法及び装置 |
-
1999
- 1999-04-14 JP JP11106920A patent/JP2000296413A/ja active Pending
-
2000
- 2000-04-11 KR KR1020000019016A patent/KR100561291B1/ko not_active IP Right Cessation
- 2000-04-13 EP EP00108185A patent/EP1044767B1/en not_active Expired - Lifetime
- 2000-04-13 CA CA002305832A patent/CA2305832A1/en not_active Abandoned
- 2000-04-13 DE DE60036506T patent/DE60036506T2/de not_active Expired - Lifetime
- 2000-04-14 SG SG200002146A patent/SG109419A1/en unknown
- 2000-12-19 HK HK00108189A patent/HK1028750A1/xx not_active IP Right Cessation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112894585A (zh) * | 2021-01-31 | 2021-06-04 | 重庆电子工程职业学院 | 一种集成电路板用覆铜板氧化膜处理装置 |
CN112894585B (zh) * | 2021-01-31 | 2022-02-08 | 重庆电子工程职业学院 | 一种集成电路板用覆铜板氧化膜处理装置 |
Also Published As
Publication number | Publication date |
---|---|
KR20010020726A (ko) | 2001-03-15 |
CA2305832A1 (en) | 2000-10-14 |
DE60036506T2 (de) | 2008-01-31 |
EP1044767A2 (en) | 2000-10-18 |
JP2000296413A (ja) | 2000-10-24 |
DE60036506D1 (de) | 2007-11-08 |
KR100561291B1 (ko) | 2006-03-15 |
SG109419A1 (en) | 2005-03-30 |
EP1044767A3 (en) | 2003-05-14 |
EP1044767B1 (en) | 2007-09-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20110413 |