HK1003847A1 - Photoinitiator compositions photohardenable compositions and photosensitive microcapsules - Google Patents

Photoinitiator compositions photohardenable compositions and photosensitive microcapsules

Info

Publication number
HK1003847A1
HK1003847A1 HK98102909A HK98102909A HK1003847A1 HK 1003847 A1 HK1003847 A1 HK 1003847A1 HK 98102909 A HK98102909 A HK 98102909A HK 98102909 A HK98102909 A HK 98102909A HK 1003847 A1 HK1003847 A1 HK 1003847A1
Authority
HK
Hong Kong
Prior art keywords
compositions
photoinitiator
photosensitive microcapsules
photohardenable
compound
Prior art date
Application number
HK98102909A
Other languages
English (en)
Inventor
Paul Davis
Jacqueline Gale Truini
Original Assignee
Cycolor Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cycolor Inc filed Critical Cycolor Inc
Publication of HK1003847A1 publication Critical patent/HK1003847A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
HK98102909A 1989-03-09 1998-04-07 Photoinitiator compositions photohardenable compositions and photosensitive microcapsules HK1003847A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US32125789A 1989-03-09 1989-03-09

Publications (1)

Publication Number Publication Date
HK1003847A1 true HK1003847A1 (en) 1998-11-06

Family

ID=23249854

Family Applications (1)

Application Number Title Priority Date Filing Date
HK98102909A HK1003847A1 (en) 1989-03-09 1998-04-07 Photoinitiator compositions photohardenable compositions and photosensitive microcapsules

Country Status (7)

Country Link
EP (1) EP0387087B1 (de)
JP (1) JP2853883B2 (de)
KR (1) KR900014932A (de)
AT (1) ATE159104T1 (de)
CA (1) CA2009652A1 (de)
DE (1) DE69031545T2 (de)
HK (1) HK1003847A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5100755A (en) * 1989-12-27 1992-03-31 The Mead Corporation Dye-benzyltriaryl borate photoinitiators and photohardenable composition containing these photoinitiators
US5996793A (en) * 1997-04-15 1999-12-07 Cycolor Systems Co., Ltd. Method of storing and kit containing dry image-forming material
US6398981B1 (en) 1998-09-18 2002-06-04 Universite Laval Photopolymerizable composition sensitive to light in a green to infrared region of the optical spectrum
WO2007052470A1 (ja) 2005-11-01 2007-05-10 Konica Minolta Medical & Graphic, Inc. 平版印刷版材料、平版印刷版、平版印刷版の作製方法及び平版印刷版の印刷方法
JP5174331B2 (ja) * 2006-07-06 2013-04-03 昭和電工株式会社 電子線硬化性組成物、電子線硬化樹脂およびその用途
JP5489616B2 (ja) 2009-09-28 2014-05-14 富士フイルム株式会社 インク組成物及び印刷物成型体の製造方法
JP5591745B2 (ja) 2010-03-31 2014-09-17 富士フイルム株式会社 活性放射線硬化性インク組成物、インクジェット記録用インク組成物、並びに印刷物、および印刷物成形体の製造方法
WO2020109148A1 (en) * 2018-11-26 2020-06-04 Agfa-Gevaert Nv Novel photoinitiators

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3674486A (en) 1970-02-02 1972-07-04 Little Inc A Photoresist material and method of forming printing plates and resulting product
DE2944866A1 (de) * 1979-11-07 1981-05-21 Hoechst Ag, 6000 Frankfurt Photopolymerisierbares gemisch und damit hergestelltes photopolymerisierbares kopiermaterial
EP0223587B1 (de) * 1985-11-20 1991-02-13 The Mead Corporation Ionische Farbstoffe als Initiatoren enthaltende fotosensitive Materialien

Also Published As

Publication number Publication date
EP0387087A2 (de) 1990-09-12
ATE159104T1 (de) 1997-10-15
EP0387087A3 (de) 1991-11-06
KR900014932A (ko) 1990-10-25
JP2853883B2 (ja) 1999-02-03
EP0387087B1 (de) 1997-10-08
JPH02291561A (ja) 1990-12-03
CA2009652A1 (en) 1990-09-09
DE69031545D1 (de) 1997-11-13
DE69031545T2 (de) 1998-04-02

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Legal Events

Date Code Title Description
PF Patent in force
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20060309