GB909228A - Etching of semiconductive elements - Google Patents
Etching of semiconductive elementsInfo
- Publication number
- GB909228A GB909228A GB1251361A GB1251361A GB909228A GB 909228 A GB909228 A GB 909228A GB 1251361 A GB1251361 A GB 1251361A GB 1251361 A GB1251361 A GB 1251361A GB 909228 A GB909228 A GB 909228A
- Authority
- GB
- United Kingdom
- Prior art keywords
- etching
- active portion
- elements
- acetic acid
- passive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005530 etching Methods 0.000 title abstract 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 abstract 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 abstract 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 abstract 2
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 abstract 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 abstract 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 abstract 1
- 229910019142 PO4 Inorganic materials 0.000 abstract 1
- 229910052732 germanium Inorganic materials 0.000 abstract 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 229910017604 nitric acid Inorganic materials 0.000 abstract 1
- 239000007800 oxidant agent Substances 0.000 abstract 1
- 230000001590 oxidative effect Effects 0.000 abstract 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 abstract 1
- 239000010452 phosphate Substances 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/32—Alkaline compositions
- C23F1/40—Alkaline compositions for etching other metallic material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Weting (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US4104260A | 1960-07-06 | 1960-07-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB909228A true GB909228A (en) | 1962-10-31 |
Family
ID=21914413
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1251361A Expired GB909228A (en) | 1960-07-06 | 1961-04-07 | Etching of semiconductive elements |
Country Status (5)
| Country | Link |
|---|---|
| BE (1) | BE605794A (enrdf_load_html_response) |
| CH (1) | CH429364A (enrdf_load_html_response) |
| DE (1) | DE1214511B (enrdf_load_html_response) |
| GB (1) | GB909228A (enrdf_load_html_response) |
| NL (2) | NL132314C (enrdf_load_html_response) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3356500A (en) * | 1964-09-28 | 1967-12-05 | Santa Barbara Res Ct | Production of infrared detector patterns |
| US3480474A (en) * | 1966-03-04 | 1969-11-25 | Siemens Ag | Method for preparing semiconductor crystals |
| CN114316990A (zh) * | 2021-12-09 | 2022-04-12 | 湖北兴福电子材料有限公司 | 一种高蚀刻锥角的锗蚀刻液 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL192840A (enrdf_load_html_response) * | 1954-12-01 | |||
| DE1058333B (de) * | 1954-12-01 | 1959-05-27 | Philips Nv | Verfahren zum Abaetzen der Oberflaeche eines halbleitenden Koerpers aus einem Tellurid eines zweiwertigen Metalls |
-
0
- NL NL266770D patent/NL266770A/xx unknown
- NL NL132314D patent/NL132314C/xx active
-
1961
- 1961-04-07 GB GB1251361A patent/GB909228A/en not_active Expired
- 1961-06-30 CH CH772761A patent/CH429364A/de unknown
- 1961-07-01 DE DEW30274A patent/DE1214511B/de active Pending
- 1961-07-05 BE BE605794A patent/BE605794A/fr unknown
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3356500A (en) * | 1964-09-28 | 1967-12-05 | Santa Barbara Res Ct | Production of infrared detector patterns |
| US3480474A (en) * | 1966-03-04 | 1969-11-25 | Siemens Ag | Method for preparing semiconductor crystals |
| CN114316990A (zh) * | 2021-12-09 | 2022-04-12 | 湖北兴福电子材料有限公司 | 一种高蚀刻锥角的锗蚀刻液 |
Also Published As
| Publication number | Publication date |
|---|---|
| NL132314C (enrdf_load_html_response) | |
| CH429364A (de) | 1967-01-31 |
| BE605794A (fr) | 1961-11-03 |
| DE1214511B (de) | 1966-04-14 |
| NL266770A (enrdf_load_html_response) |
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