GB831304A - Improvements in or relating to refining processes for semiconductor and other materials - Google Patents
Improvements in or relating to refining processes for semiconductor and other materialsInfo
- Publication number
- GB831304A GB831304A GB3142656A GB3142656A GB831304A GB 831304 A GB831304 A GB 831304A GB 3142656 A GB3142656 A GB 3142656A GB 3142656 A GB3142656 A GB 3142656A GB 831304 A GB831304 A GB 831304A
- Authority
- GB
- United Kingdom
- Prior art keywords
- rod
- melting
- coil
- pict
- arranging
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 title abstract 3
- 238000000034 method Methods 0.000 title 1
- 238000007670 refining Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- 238000002844 melting Methods 0.000 abstract 4
- 230000008018 melting Effects 0.000 abstract 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 2
- 239000010703 silicon Substances 0.000 abstract 2
- 229910052710 silicon Inorganic materials 0.000 abstract 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract 1
- 229910052786 argon Inorganic materials 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 230000006698 induction Effects 0.000 abstract 1
- 239000011261 inert gas Substances 0.000 abstract 1
- 238000010309 melting process Methods 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 230000004048 modification Effects 0.000 abstract 1
- 238000012986 modification Methods 0.000 abstract 1
- 239000010453 quartz Substances 0.000 abstract 1
- 229910000077 silane Inorganic materials 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
- 239000007787 solid Substances 0.000 abstract 1
- 239000011343 solid material Substances 0.000 abstract 1
- 238000005979 thermal decomposition reaction Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3063—Electrolytic etching
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/06—Single-crystal growth by zone-melting; Refining by zone-melting the molten zone not extending over the whole cross-section
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Silicon Compounds (AREA)
- Glass Melting And Manufacturing (AREA)
- Weting (AREA)
Abstract
<PICT:0831304/III/1> <PICT:0831304/III/2> Impure solid materials are zone-refined by arranging a rod of the solid vertically, melting an annular zone surrounding an inner unmelted portion and moving the molten zone along the rod so that it is all subjected to melting except an inner core, parallel to the axis of the rod. As shown, a rod 8 of impure material, silicon for example, is carried by shaft 6 which passes through a bush 5 in base plate 2 of the glass or quartz envelope 1 provided with an inlet 3 and outlet 4 for an inert gas such as argon. An induction coil 9, in the form of a metal plate slotted at 11, surrounds the envelope, the coil being placed eccentrically with respect to the axis of the rod 8 so that the crosssection of the left-hand side 16 of the melted annular portion is larger than the right-hand side 17. The shaft 6 is moved vertically without rotation and all the material of the rod is melted except a central core. The rod is then rotated through 180 degrees and the melting process repeated, whereby all portions of the rod are eventually subjected to melting. In a modification, the surface of silicon ingots, produced by the thermal decomposition of silane, is smoothed by arranging the coil 9 coaxially with respect to the rod 8 and performing the melting as described. Reference has been directed by the Comptroller to Specification 769,673.
Priority Applications (13)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
BE552391D BE552391A (en) | 1952-08-01 | ||
NLAANVRAGE7313750,A NL180311B (en) | 1952-08-01 | PROCESS FOR PREPARING N-HALOGENACYLANILINOALKAN CARBON ACID ESTERS AND PROCESS FOR PREPARATION OF MICROBICIDE PREPARATIONS FOR CONTROL OF PHYTOPATHOGEN FUNGI AND BACTERIA BASED ON SUCH ESTERS. | |
BE521845D BE521845A (en) | 1952-08-01 | ||
BE561652D BE561652A (en) | 1952-08-01 | ||
NL96829D NL96829C (en) | 1952-08-01 | ||
GB19225/53A GB721026A (en) | 1952-08-01 | 1953-07-10 | Process for external profiling of semiconductor devices |
CH320916D CH320916A (en) | 1952-08-01 | 1953-07-27 | Process for changing the external shape of semiconductor bodies |
FR1081736D FR1081736A (en) | 1952-08-01 | 1953-07-30 | Semiconductor device manufacturing |
GB31896/55A GB831303A (en) | 1952-08-01 | 1955-11-08 | Improvements in or relating to refining processes for semi-conductor and other materials |
CH360207D CH360207A (en) | 1952-08-01 | 1956-10-27 | Method for zonal melting of a rod |
FR71626D FR71626E (en) | 1952-08-01 | 1956-11-07 | Semiconductor device manufacturing |
US688610A US2914397A (en) | 1952-08-01 | 1957-10-07 | Refining processes for semiconductor materials |
FR72391D FR72391E (en) | 1952-08-01 | 1957-10-15 | Semiconductor device manufacturing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DES29621A DE1031893B (en) | 1952-08-01 | 1952-08-01 | Process for the outer shaping of semiconductor arrangements, in particular for rectifier and amplifier purposes with semiconductors made of germanium or silicon |
Publications (1)
Publication Number | Publication Date |
---|---|
GB831304A true GB831304A (en) | 1960-03-30 |
Family
ID=7479853
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB3142656A Expired GB831304A (en) | 1952-08-01 | 1956-10-16 | Improvements in or relating to refining processes for semiconductor and other materials |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE1031893B (en) |
GB (1) | GB831304A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1195420B (en) * | 1963-01-08 | 1965-06-24 | Dow Corning | Process for alluvial zone treatment of a rod made of crystalline semiconductor material |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL134389C (en) * | 1958-07-02 | |||
DE1105069B (en) * | 1959-04-25 | 1961-04-20 | Siemens Ag | Etching process for a pn junction in the manufacture of a semiconductor device |
NL280871A (en) * | 1961-08-19 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE467885A (en) * | 1943-08-11 | |||
US2600500A (en) * | 1948-09-24 | 1952-06-17 | Bell Telephone Labor Inc | Semiconductor signal translating device with controlled carrier transit times |
BE490958A (en) * | 1948-09-24 | |||
US2560594A (en) * | 1948-09-24 | 1951-07-17 | Bell Telephone Labor Inc | Semiconductor translator and method of making it |
DE823763C (en) * | 1949-09-15 | 1951-12-06 | Siemens Ag | Process for electrolytic polishing of the surface of semiconductor crystals |
-
1952
- 1952-08-01 DE DES29621A patent/DE1031893B/en active Pending
-
1956
- 1956-10-16 GB GB3142656A patent/GB831304A/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1195420B (en) * | 1963-01-08 | 1965-06-24 | Dow Corning | Process for alluvial zone treatment of a rod made of crystalline semiconductor material |
Also Published As
Publication number | Publication date |
---|---|
DE1031893B (en) | 1958-06-12 |
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