GB818911A - Improvements in or relating to diazotype materials - Google Patents

Improvements in or relating to diazotype materials

Info

Publication number
GB818911A
GB818911A GB2678454A GB2678454A GB818911A GB 818911 A GB818911 A GB 818911A GB 2678454 A GB2678454 A GB 2678454A GB 2678454 A GB2678454 A GB 2678454A GB 818911 A GB818911 A GB 818911A
Authority
GB
United Kingdom
Prior art keywords
resin
unifunctional
sept
groups capable
synthetic resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2678454A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ozalid Co Ltd
Original Assignee
Ozalid Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ozalid Co Ltd filed Critical Ozalid Co Ltd
Priority to GB2678454A priority Critical patent/GB818911A/en
Priority to DEO4462A priority patent/DE1079454B/en
Publication of GB818911A publication Critical patent/GB818911A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/52Compositions containing diazo compounds as photosensitive substances
    • G03C1/60Compositions containing diazo compounds as photosensitive substances with macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Printing Plates And Materials Therefor (AREA)

Abstract

818,911. Diazotype materials. OZALID CO. Ltd., MURRAY, H. D., TANENBAUM, A., and ROYER, R. P. Sept. 14, 1955 [Sept. 15, 1954], No. 26784/54. Class 98(2) A light-sensitive diazotype material comprises a support coated with a mixture of a diazonium compound and a finely divided water-insoluble synthetic resin having groups capable of cation exchange. The synthetic resin may be a sulphonated phenotic resin, a polycarboxylic resin, a unifunctional cross-linked polymethacrylic resin containing only carboxyl groups capable of exchange, or a unifunctional crosslinked sulphonated polystyrene. Resins specified are Amberlite and Zeo-Karb (Registered Trade Mark). The material may be a one or two-component material, and the sensitizing solution may contain a thickener or binder, such as dextrin, and the usual inhibitors. Specification 817,001 [Group IV(b)] is referred to.
GB2678454A 1954-09-15 1954-09-15 Improvements in or relating to diazotype materials Expired GB818911A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB2678454A GB818911A (en) 1954-09-15 1954-09-15 Improvements in or relating to diazotype materials
DEO4462A DE1079454B (en) 1954-09-15 1955-09-14 Diazotype copying material and process for making the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB2678454A GB818911A (en) 1954-09-15 1954-09-15 Improvements in or relating to diazotype materials

Publications (1)

Publication Number Publication Date
GB818911A true GB818911A (en) 1959-08-26

Family

ID=10249137

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2678454A Expired GB818911A (en) 1954-09-15 1954-09-15 Improvements in or relating to diazotype materials

Country Status (2)

Country Link
DE (1) DE1079454B (en)
GB (1) GB818911A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0249941A2 (en) * 1986-06-20 1987-12-23 Tosoh Corporation Method for producing fine patterns
EP0260899A2 (en) * 1986-09-12 1988-03-23 Matsushita Electric Industrial Co., Ltd. Photosensitive resin composition and method for producing fine patterns using the photosensitive resin
EP0318324A2 (en) * 1987-11-27 1989-05-31 Tosoh Corporation Photosensitive resin composition and method for forming patterns using the same
US5223376A (en) * 1986-06-20 1993-06-29 Toyo Soda Manufacturing Co., Ltd. Method for producing fine patterns utilizing specific polymeric diazonium salt, or diazonium salt/sulfone group containing polymer, as photobleachable agent

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL24741C (en) * 1928-09-04
NL56197C (en) * 1939-04-11
US2606117A (en) * 1947-06-05 1952-08-05 Gen Aniline & Film Corp Diazotype photoprinting materials
NL142417B (en) * 1947-10-30 Sumitomo Chemical Co METHOD OF STABILIZING CYCLIC PHOSPHORESTERS OF SALICYL ALCOHOL.
BE508635A (en) * 1951-11-07

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0249941A2 (en) * 1986-06-20 1987-12-23 Tosoh Corporation Method for producing fine patterns
EP0249941A3 (en) * 1986-06-20 1988-05-04 Toyo Soda Manufacturing Co., Ltd. Method for producing fine patterns
US5223376A (en) * 1986-06-20 1993-06-29 Toyo Soda Manufacturing Co., Ltd. Method for producing fine patterns utilizing specific polymeric diazonium salt, or diazonium salt/sulfone group containing polymer, as photobleachable agent
EP0260899A2 (en) * 1986-09-12 1988-03-23 Matsushita Electric Industrial Co., Ltd. Photosensitive resin composition and method for producing fine patterns using the photosensitive resin
EP0260899A3 (en) * 1986-09-12 1989-09-13 Toyo Soda Manufacturing Co., Ltd. Photosensitive resin composition and method for producing fine patterns using the photosensitive resin
EP0318324A2 (en) * 1987-11-27 1989-05-31 Tosoh Corporation Photosensitive resin composition and method for forming patterns using the same
EP0318324A3 (en) * 1987-11-27 1990-05-23 Tosoh Corporation Photosensitive resin composition and method for forming patterns using the same

Also Published As

Publication number Publication date
DE1079454B (en) 1960-04-07

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