GB749293A - Method and apparatus for deposition of materials by thermal decomposition - Google Patents

Method and apparatus for deposition of materials by thermal decomposition

Info

Publication number
GB749293A
GB749293A GB781254A GB781254A GB749293A GB 749293 A GB749293 A GB 749293A GB 781254 A GB781254 A GB 781254A GB 781254 A GB781254 A GB 781254A GB 749293 A GB749293 A GB 749293A
Authority
GB
United Kingdom
Prior art keywords
chamber
carbonyl
workpiece
anode
outlet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB781254A
Inventor
Herman Nack
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commonwealth Engineering Company of Ohio
Original Assignee
Commonwealth Engineering Company of Ohio
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commonwealth Engineering Company of Ohio filed Critical Commonwealth Engineering Company of Ohio
Priority to GB781254A priority Critical patent/GB749293A/en
Publication of GB749293A publication Critical patent/GB749293A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/452Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation

Abstract

749,293. Coating metals. COMMONWEALTH ENGINEERING CO. OF OHIO. March 17, 1954, No. 7812/54. Class 82(2). Workpieces are coated with metals by subjecting them in a chamber to the action of a gaseous metal carbonyl in a high voltage unidirectional electric field, the work piece forming the cathode. The outlet of the chamber may constitute the anode. A hollow member containing radium or uranium may be inserted into the gas stream to ionise the gas before entry into the chamber. The workpiece may be heated to the decomposition temperature of the carbonyl. Coating metals include Cr, Fe W, Co, Mo, Re, Ni, and may be deposited on e.g. the following bases : steel, Cu or brass, cast iron, Al, Mg. The carbonyl is admitted to the chamber 1 through a pipe 2. The workpiece 6 is supported on an electric heater 4 by electrically insulating members 15 and is connected at 7 to the negative pole of a D.C. supply. The outlet 3 of the chamber forms the anode.
GB781254A 1954-03-17 1954-03-17 Method and apparatus for deposition of materials by thermal decomposition Expired GB749293A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB781254A GB749293A (en) 1954-03-17 1954-03-17 Method and apparatus for deposition of materials by thermal decomposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB781254A GB749293A (en) 1954-03-17 1954-03-17 Method and apparatus for deposition of materials by thermal decomposition

Publications (1)

Publication Number Publication Date
GB749293A true GB749293A (en) 1956-05-23

Family

ID=9840218

Family Applications (1)

Application Number Title Priority Date Filing Date
GB781254A Expired GB749293A (en) 1954-03-17 1954-03-17 Method and apparatus for deposition of materials by thermal decomposition

Country Status (1)

Country Link
GB (1) GB749293A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3293074A (en) * 1963-11-05 1966-12-20 Siemens Ag Method and apparatus for growing monocrystalline layers on monocrystalline substrates of semiconductor material
WO1981003669A1 (en) * 1980-06-13 1981-12-24 Science & Techn Ets Method for manufacturing a thin layer with orientated structure,device for implementing such method and products obtained thereby

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3293074A (en) * 1963-11-05 1966-12-20 Siemens Ag Method and apparatus for growing monocrystalline layers on monocrystalline substrates of semiconductor material
WO1981003669A1 (en) * 1980-06-13 1981-12-24 Science & Techn Ets Method for manufacturing a thin layer with orientated structure,device for implementing such method and products obtained thereby

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