GB717710A - Improvements in photomechanical resist compositions - Google Patents

Improvements in photomechanical resist compositions

Info

Publication number
GB717710A
GB717710A GB1698/52A GB169852A GB717710A GB 717710 A GB717710 A GB 717710A GB 1698/52 A GB1698/52 A GB 1698/52A GB 169852 A GB169852 A GB 169852A GB 717710 A GB717710 A GB 717710A
Authority
GB
United Kingdom
Prior art keywords
cinnamic
hydrogen atom
solution
photomechanical
resist compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1698/52A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Ltd
Original Assignee
Kodak Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Ltd filed Critical Kodak Ltd
Publication of GB717710A publication Critical patent/GB717710A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

A compound of formula <FORM:0717710/IV (a)/1> where R and R1 each represents an aryl group of the benzene series and either X and Y each represents a hydrogen atom or X represents a hydrogen atom while Y represents a hydroxyl group or X and Y together represent O, NOH, NH or S is added to an organic solvent solution of a cinnamic, o-chloro cinnamic or m-nitro cinnamic acid ester of cellulose or polyvinyl alcohol for the purpose of increasing the light sensitivity of photomechanical layers prepared from the solution. An example describes the addition of 4 : 41-tetra-methyldiaminodiphenyl ketone to a methyl glycol acetate solution of polyvinyl cinnamate. Specifications 695,262, 713,947, 717,708 and 717,709 are referred to.
GB1698/52A 1951-01-20 1952-01-21 Improvements in photomechanical resist compositions Expired GB717710A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US717710XA 1951-01-20 1951-01-20

Publications (1)

Publication Number Publication Date
GB717710A true GB717710A (en) 1954-11-03

Family

ID=22103471

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1698/52A Expired GB717710A (en) 1951-01-20 1952-01-21 Improvements in photomechanical resist compositions

Country Status (2)

Country Link
FR (1) FR1089924A (en)
GB (1) GB717710A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3647470A (en) * 1965-06-09 1972-03-07 Agency Ind Science Techn Photosensitive compositions containing furylacrylyl-containing polymer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3647470A (en) * 1965-06-09 1972-03-07 Agency Ind Science Techn Photosensitive compositions containing furylacrylyl-containing polymer

Also Published As

Publication number Publication date
FR1089924A (en) 1955-03-24

Similar Documents

Publication Publication Date Title
GB717708A (en) Improvements in photomechanical resist compositions
GB713947A (en) Photomechanical resist compositions
GB717711A (en) Improvements in photomechanical resist compositions
ES399057A1 (en) Dereivatives of 17alpha-hydroxyandrost-4-ene-17beta-carboxylic acids
DE2962643D1 (en) 3,5-dihydroxypentanoic ester derivatives having antihyperlipaemic activity, their manufacture and pharmaceutical compositions containing them
ES438946A2 (en) Vincaminic acid esters
GB859510A (en) Stabilized acrylonitrile polymers
GB717712A (en) Improvements in photomechanical resist compositions
GB1204921A (en) Processes for the preparation of 13-alkyl-gonapentaenes
GB717710A (en) Improvements in photomechanical resist compositions
IE35853L (en) Pressure-sensitive recording¹material;indolyl-aminophthalides.
GB977071A (en) Hydroxylamine derivatives and process for making them
FR1175585A (en) Process for manufacturing organic compounds, in particular acetic acid
SE7510787L (en) NEW NITROGENIC, POLYCYCLIC ASSOCIATIONS, SALTS THEREOF AND THEIR OPTICAL ANTIPODS, JUST LIKE THEIR PREPARATION
ES415282A1 (en) A procedure to prepare new aromatic esters. (Machine-translation by Google Translate, not legally binding)
GB864607A (en) 4,5-epoxy-3-ketosteroid compounds and the preparation thereof
GB1217471A (en) A process for preparing organometallic aromatic silicon compounds
ES456543A1 (en) Procedure for the preparation of 4-androsten-3-onas. (Machine-translation by Google Translate, not legally binding)
ES264429A1 (en) A procedure for preparing derivatives of the pregnant bis-hydroxymethylene (Machine-translation by Google Translate, not legally binding)
GB845586A (en) Improvements in or relating to indoline compounds
GB937183A (en) 3,8-diazabicyclo-[3,2,1]-octanes
ES448671A1 (en) A procedure for preparing tiazol derivatives. (Machine-translation by Google Translate, not legally binding)
GB975596A (en) Preparation of steroids and d-homo-steroids related to oestrone
GB718331A (en) Improvements in or relating to the preparation of esters of í¸-ergostapentaene-3-ol
GB747271A (en) Oxytetracycline diacetate