FR1089924A - Advanced photosensitive composition and its applications - Google Patents
Advanced photosensitive composition and its applicationsInfo
- Publication number
- FR1089924A FR1089924A FR1089924DA FR1089924A FR 1089924 A FR1089924 A FR 1089924A FR 1089924D A FR1089924D A FR 1089924DA FR 1089924 A FR1089924 A FR 1089924A
- Authority
- FR
- France
- Prior art keywords
- applications
- photosensitive composition
- advanced
- advanced photosensitive
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US717710XA | 1951-01-20 | 1951-01-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
FR1089924A true FR1089924A (en) | 1955-03-24 |
Family
ID=22103471
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR1089924D Expired FR1089924A (en) | 1951-01-20 | 1952-01-19 | Advanced photosensitive composition and its applications |
Country Status (2)
Country | Link |
---|---|
FR (1) | FR1089924A (en) |
GB (1) | GB717710A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE682303A (en) * | 1965-06-09 | 1966-11-14 |
-
1952
- 1952-01-19 FR FR1089924D patent/FR1089924A/en not_active Expired
- 1952-01-21 GB GB1698/52A patent/GB717710A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
GB717710A (en) | 1954-11-03 |
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