GB2494168B - Improved deposition technique for micro electro-mechanical structures (MEMS) - Google Patents

Improved deposition technique for micro electro-mechanical structures (MEMS)

Info

Publication number
GB2494168B
GB2494168B GB1115105.7A GB201115105A GB2494168B GB 2494168 B GB2494168 B GB 2494168B GB 201115105 A GB201115105 A GB 201115105A GB 2494168 B GB2494168 B GB 2494168B
Authority
GB
United Kingdom
Prior art keywords
mems
deposition technique
micro electro
mechanical structures
improved deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
GB1115105.7A
Other languages
English (en)
Other versions
GB2494168A (en
GB201115105D0 (en
Inventor
Anthony O'hara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Memsstar Ltd
Original Assignee
Memsstar Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Memsstar Ltd filed Critical Memsstar Ltd
Priority to GB1115105.7A priority Critical patent/GB2494168B/en
Publication of GB201115105D0 publication Critical patent/GB201115105D0/en
Priority to US14/241,643 priority patent/US20140308822A1/en
Priority to KR1020147003385A priority patent/KR20140068014A/ko
Priority to PCT/GB2012/052127 priority patent/WO2013030576A1/en
Priority to CN201280037081.1A priority patent/CN103717783B/zh
Priority to JP2014527736A priority patent/JP6265496B2/ja
Priority to EP12770186.0A priority patent/EP2751301A1/en
Publication of GB2494168A publication Critical patent/GB2494168A/en
Application granted granted Critical
Publication of GB2494168B publication Critical patent/GB2494168B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0002—Arrangements for avoiding sticking of the flexible or moving parts
    • B81B3/0005—Anti-stiction coatings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00912—Treatments or methods for avoiding stiction of flexible or moving parts of MEMS
    • B81C1/0092—For avoiding stiction during the manufacturing process of the device, e.g. during wet etching
    • B81C1/00952—Treatments or methods for avoiding stiction during the manufacturing process not provided for in groups B81C1/00928 - B81C1/00944
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00206—Processes for functionalising a surface, e.g. provide the surface with specific mechanical, chemical or biological properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00349—Creating layers of material on a substrate
    • B81C1/0038—Processes for creating layers of materials not provided for in groups B81C1/00357 - B81C1/00373
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45502—Flow conditions in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45557—Pulsed pressure or control pressure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/11—Treatments for avoiding stiction of elastic or moving parts of MEMS
    • B81C2201/112—Depositing an anti-stiction or passivation coating, e.g. on the elastic or moving parts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Computer Hardware Design (AREA)
  • Chemical Vapour Deposition (AREA)
  • Micromachines (AREA)
  • Formation Of Insulating Films (AREA)
GB1115105.7A 2011-09-01 2011-09-01 Improved deposition technique for micro electro-mechanical structures (MEMS) Active GB2494168B (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
GB1115105.7A GB2494168B (en) 2011-09-01 2011-09-01 Improved deposition technique for micro electro-mechanical structures (MEMS)
US14/241,643 US20140308822A1 (en) 2011-09-01 2012-08-31 Deposition technique for depositing a coating on a device
KR1020147003385A KR20140068014A (ko) 2011-09-01 2012-08-31 장치 상에 코팅을 증착하기 위한 개선된 증착 기술
PCT/GB2012/052127 WO2013030576A1 (en) 2011-09-01 2012-08-31 Improved deposition technique for depositing a coating on a device
CN201280037081.1A CN103717783B (zh) 2011-09-01 2012-08-31 用于使涂层沉积在装置上的改进的沉积技术
JP2014527736A JP6265496B2 (ja) 2011-09-01 2012-08-31 デバイス上にコーティングを堆積させる改善された堆積法
EP12770186.0A EP2751301A1 (en) 2011-09-01 2012-08-31 Improved deposition technique for depositing a coating on a device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1115105.7A GB2494168B (en) 2011-09-01 2011-09-01 Improved deposition technique for micro electro-mechanical structures (MEMS)

Publications (3)

Publication Number Publication Date
GB201115105D0 GB201115105D0 (en) 2011-10-19
GB2494168A GB2494168A (en) 2013-03-06
GB2494168B true GB2494168B (en) 2014-04-09

Family

ID=44882056

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1115105.7A Active GB2494168B (en) 2011-09-01 2011-09-01 Improved deposition technique for micro electro-mechanical structures (MEMS)

Country Status (7)

Country Link
US (1) US20140308822A1 (enExample)
EP (1) EP2751301A1 (enExample)
JP (1) JP6265496B2 (enExample)
KR (1) KR20140068014A (enExample)
CN (1) CN103717783B (enExample)
GB (1) GB2494168B (enExample)
WO (1) WO2013030576A1 (enExample)

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JP3208344U (ja) * 2015-11-16 2017-01-05 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 低蒸気圧のエアゾールに支援されるｃｖｄ
US10273577B2 (en) * 2015-11-16 2019-04-30 Applied Materials, Inc. Low vapor pressure aerosol-assisted CVD
EP3449500A4 (en) * 2016-04-25 2020-04-22 Applied Materials, Inc. CHEMICAL DISTRIBUTION CHAMBER FOR SINGLE-ASSEMBLED SINGLE-LAYER TREATMENTS
US10358715B2 (en) * 2016-06-03 2019-07-23 Applied Materials, Inc. Integrated cluster tool for selective area deposition
US10504715B2 (en) 2016-07-21 2019-12-10 Tokyo Electron Limited Back-side friction reduction of a substrate
US10784100B2 (en) 2016-07-21 2020-09-22 Tokyo Electron Limited Back-side friction reduction of a substrate
US10833076B2 (en) 2016-09-30 2020-11-10 Intel Corporation Integrated circuit devices with non-collapsed fins and methods of treating the fins to prevent fin collapse
US10727044B2 (en) 2017-09-21 2020-07-28 Honeywell International Inc. Fill material to mitigate pattern collapse
US10748757B2 (en) 2017-09-21 2020-08-18 Honeywell International, Inc. Thermally removable fill materials for anti-stiction applications
CN111433886B (zh) * 2017-11-29 2024-07-30 东京毅力科创株式会社 衬底的背侧摩擦减小
JP7022589B2 (ja) * 2018-01-05 2022-02-18 東京エレクトロン株式会社 基板処理装置、基板処理方法及びコンピュータ記憶媒体
KR102184006B1 (ko) * 2019-04-09 2020-11-30 한국과학기술연구원 의료 기기용 렌즈 및 이의 제조방법
CN110395689B (zh) * 2019-06-24 2024-03-22 金华职业技术学院 一种微颗粒的组装方法
CN110241403B (zh) * 2019-07-23 2024-09-06 芜湖通潮精密机械股份有限公司 一种减小温差的加热器及其制作方法和应用
JP2022151518A (ja) * 2021-03-23 2022-10-07 株式会社魁半導体 積層体製造装置及び自己組織化単分子膜の形成方法
US20250011933A1 (en) * 2021-03-23 2025-01-09 Toray Engineering Co., Ltd. Laminate manufacturing apparatus and self-assembled monolayer formation method
US20230212747A1 (en) * 2021-12-31 2023-07-06 Applied Materials, Inc. Apparatus and Methods for Self-Assembled Monolayer (SAM) Deposition in Semiconductor Equipment

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US20040261703A1 (en) * 2003-06-27 2004-12-30 Jeffrey D. Chinn Apparatus and method for controlled application of reactive vapors to produce thin films and coatings
US20060113618A1 (en) * 2004-11-26 2006-06-01 Reboa Paul F Microelectronic device with anti-stiction coating

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US20040261703A1 (en) * 2003-06-27 2004-12-30 Jeffrey D. Chinn Apparatus and method for controlled application of reactive vapors to produce thin films and coatings
US20060113618A1 (en) * 2004-11-26 2006-06-01 Reboa Paul F Microelectronic device with anti-stiction coating

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Also Published As

Publication number Publication date
KR20140068014A (ko) 2014-06-05
GB2494168A (en) 2013-03-06
GB201115105D0 (en) 2011-10-19
JP6265496B2 (ja) 2018-01-24
JP2014531508A (ja) 2014-11-27
US20140308822A1 (en) 2014-10-16
CN103717783B (zh) 2016-11-16
EP2751301A1 (en) 2014-07-09
CN103717783A (zh) 2014-04-09
WO2013030576A1 (en) 2013-03-07

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