GB2074788B - Semiconductor integrated circuit - Google Patents
Semiconductor integrated circuitInfo
- Publication number
- GB2074788B GB2074788B GB8110512A GB8110512A GB2074788B GB 2074788 B GB2074788 B GB 2074788B GB 8110512 A GB8110512 A GB 8110512A GB 8110512 A GB8110512 A GB 8110512A GB 2074788 B GB2074788 B GB 2074788B
- Authority
- GB
- United Kingdom
- Prior art keywords
- integrated circuit
- semiconductor integrated
- semiconductor
- circuit
- integrated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/103—Integrated devices the at least one element covered by H10F30/00 having potential barriers, e.g. integrated devices comprising photodiodes or phototransistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/30—Coatings
- H10F77/306—Coatings for devices having potential barriers
- H10F77/331—Coatings for devices having potential barriers for filtering or shielding light, e.g. multicolour filters for photodetectors
- H10F77/334—Coatings for devices having potential barriers for filtering or shielding light, e.g. multicolour filters for photodetectors for shielding light, e.g. light blocking layers or cold shields for infrared detectors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H29/00—Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
- H10H29/10—Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5455580A JPS56150871A (en) | 1980-04-24 | 1980-04-24 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
GB2074788A GB2074788A (en) | 1981-11-04 |
GB2074788B true GB2074788B (en) | 1985-02-27 |
Family
ID=12973924
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB8110512A Expired GB2074788B (en) | 1980-04-24 | 1981-04-03 | Semiconductor integrated circuit |
Country Status (4)
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5921064A (ja) * | 1982-04-30 | 1984-02-02 | Seiko Epson Corp | 液晶表示装置 |
US5650637A (en) | 1982-04-30 | 1997-07-22 | Seiko Epson Corporation | Active matrix assembly |
JPS5980964A (ja) * | 1982-11-01 | 1984-05-10 | Toshiba Corp | 光電変換素子 |
JPS59103382A (ja) * | 1982-12-03 | 1984-06-14 | Sanyo Electric Co Ltd | フロ−テイングゲ−ト型不揮発性メモリ素子 |
JPH054280Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1986-04-17 | 1993-02-02 | ||
US4758869A (en) * | 1986-08-29 | 1988-07-19 | Waferscale Integration, Inc. | Nonvolatile floating gate transistor structure |
US5034786A (en) * | 1986-08-29 | 1991-07-23 | Waferscale Integration, Inc. | Opaque cover for preventing erasure of an EPROM |
FR2619959B1 (fr) * | 1987-08-31 | 1991-06-14 | Thomson Semiconducteurs | Circuit de detection de lumiere |
JPH0799298A (ja) * | 1993-09-28 | 1995-04-11 | Sony Corp | 固体撮像素子及びその製造方法 |
JP3697769B2 (ja) * | 1995-02-24 | 2005-09-21 | 株式会社ニコン | 光電変換素子及び光電変換装置 |
GB2319602B (en) * | 1996-11-21 | 2000-10-04 | Motorola Ltd | Light detection device |
US5917645A (en) * | 1997-03-28 | 1999-06-29 | Daewoo Electronics Co., Ltd. | Thin film actuated mirror array in an optical projection system and method for manufacturing the same |
JP4259979B2 (ja) | 2003-10-22 | 2009-04-30 | 新光電気工業株式会社 | 光透過性カバー及びこれを備えたデバイス並びにそれらの製造方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1614865A1 (de) * | 1967-09-27 | 1970-12-23 | Telefunken Patent | Optoelektronische Halbleiteranordnung |
DE2211384A1 (de) * | 1971-03-20 | 1972-11-30 | Philips Nv | Schaltungsanordnung mit mindestens einem strahlungsgespeisten Schaltungselement und Halbleiteranordnung zur Anwendung in einer derartigen Schaltungsanordnung |
GB1392599A (en) * | 1971-07-28 | 1975-04-30 | Mullard Ltd | Semiconductor memory elements |
JPS5036087A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1973-07-13 | 1975-04-04 | ||
US3969751A (en) * | 1974-12-18 | 1976-07-13 | Rca Corporation | Light shield for a semiconductor device comprising blackened photoresist |
JPS51120685A (en) * | 1975-04-16 | 1976-10-22 | Nippon Denso Co Ltd | Semtconductor element |
JPS5289480A (en) * | 1976-01-21 | 1977-07-27 | Hitachi Ltd | Semiconductive nonvoltile memory device |
JPS52151576A (en) * | 1976-06-11 | 1977-12-16 | Matsushita Electric Ind Co Ltd | Semiconductor device |
US4326214A (en) * | 1976-11-01 | 1982-04-20 | National Semiconductor Corporation | Thermal shock resistant package having an ultraviolet light transmitting window for a semiconductor chip |
GB1595253A (en) * | 1977-01-24 | 1981-08-12 | Hitachi Ltd | Solid-state imaging devices |
US4096512A (en) * | 1977-03-09 | 1978-06-20 | Rca Corp. | Monolithic light detector |
JPS543480A (en) * | 1977-06-09 | 1979-01-11 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS582439B2 (ja) * | 1978-11-27 | 1983-01-17 | 富士通株式会社 | ブ−トストラツプ回路 |
US4536941A (en) * | 1980-03-21 | 1985-08-27 | Kuo Chang Kiang | Method of making high density dynamic memory cell |
-
1980
- 1980-04-24 JP JP5455580A patent/JPS56150871A/ja active Pending
-
1981
- 1981-04-03 GB GB8110512A patent/GB2074788B/en not_active Expired
- 1981-04-18 DE DE19813115695 patent/DE3115695A1/de active Granted
-
1986
- 1986-01-15 US US06/818,908 patent/US4949152A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US4949152A (en) | 1990-08-14 |
DE3115695A1 (de) | 1982-02-04 |
JPS56150871A (en) | 1981-11-21 |
GB2074788A (en) | 1981-11-04 |
DE3115695C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1989-06-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19980403 |