GB1605161A - Annular field optical system - Google Patents

Annular field optical system Download PDF

Info

Publication number
GB1605161A
GB1605161A GB23809/80A GB2380980A GB1605161A GB 1605161 A GB1605161 A GB 1605161A GB 23809/80 A GB23809/80 A GB 23809/80A GB 2380980 A GB2380980 A GB 2380980A GB 1605161 A GB1605161 A GB 1605161A
Authority
GB
United Kingdom
Prior art keywords
optical
optical system
meniscus
axis
projection system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB23809/80A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Biosystems Inc
Original Assignee
Perkin Elmer Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Perkin Elmer Corp filed Critical Perkin Elmer Corp
Publication of GB1605161A publication Critical patent/GB1605161A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08Catadioptric systems
    • G02B17/0836Catadioptric systems using more than three curved mirrors
    • G02B17/0844Catadioptric systems using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/008Systems specially adapted to form image relays or chained systems
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08Catadioptric systems
    • G02B17/0804Catadioptric systems using two curved mirrors
    • G02B17/0812Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70225Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70275Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Stereoscopic And Panoramic Photography (AREA)
GB23809/80A 1977-02-11 1978-02-13 Annular field optical system Expired GB1605161A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US76790677A 1977-02-11 1977-02-11

Publications (1)

Publication Number Publication Date
GB1605161A true GB1605161A (en) 1982-08-11

Family

ID=25080934

Family Applications (2)

Application Number Title Priority Date Filing Date
GB23809/80A Expired GB1605161A (en) 1977-02-11 1978-02-13 Annular field optical system
GB5682/78A Expired GB1605160A (en) 1977-02-11 1978-02-13 Annular field optical system

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB5682/78A Expired GB1605160A (en) 1977-02-11 1978-02-13 Annular field optical system

Country Status (7)

Country Link
JP (1) JPS53100230A (enrdf_load_stackoverflow)
CA (1) CA1103498A (enrdf_load_stackoverflow)
CH (1) CH625055A5 (enrdf_load_stackoverflow)
DE (1) DE2801882A1 (enrdf_load_stackoverflow)
FR (1) FR2380563A1 (enrdf_load_stackoverflow)
GB (2) GB1605161A (enrdf_load_stackoverflow)
IT (1) IT1101789B (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2150314A (en) * 1983-10-27 1985-06-26 Canon Kk Annular field reflecting optical system
RU2192028C1 (ru) * 2001-04-04 2002-10-27 Общество С Ограниченной Ответственностью "Инсмат Технология" Катадиоптрическая система
CN102981255A (zh) * 2011-09-07 2013-03-20 上海微电子装备有限公司 一种大视场投影物镜

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4331390A (en) * 1979-10-09 1982-05-25 The Perkin-Elmer Corporation Monocentric optical systems
JPS5890610A (ja) * 1981-11-24 1983-05-30 Matsushita Electric Ind Co Ltd カタデイオプトリツク光学系
US4469414A (en) * 1982-06-01 1984-09-04 The Perkin-Elmer Corporation Restrictive off-axis field optical system
JPS59144127A (ja) * 1983-02-07 1984-08-18 Canon Inc 像調整された光学装置
JPS6147916A (ja) * 1984-08-14 1986-03-08 Canon Inc 反射光学系
US4747678A (en) * 1986-12-17 1988-05-31 The Perkin-Elmer Corporation Optical relay system with magnification
JP2565149B2 (ja) * 1995-04-05 1996-12-18 キヤノン株式会社 回路の製造方法及び露光装置
JP5196869B2 (ja) * 2007-05-15 2013-05-15 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
JP2020052342A (ja) * 2018-09-28 2020-04-02 キヤノン株式会社 光学機器

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2344756A (en) * 1941-01-06 1944-03-21 Taylor Taylor & Hobson Ltd Optical objective
US2682197A (en) * 1951-08-13 1954-06-29 American Optical Corp Folded reflecting optical system of the schmidt type
SU126911A1 (ru) * 1959-03-30 1959-11-30 Н.Н. Петрушов Зеркально-линзовый объектив
US3821763A (en) * 1971-06-21 1974-06-28 Perkin Elmer Corp Annular field optical imaging system
US3748015A (en) * 1971-06-21 1973-07-24 Perkin Elmer Corp Unit power imaging catoptric anastigmat
US3951546A (en) * 1974-09-26 1976-04-20 The Perkin-Elmer Corporation Three-fold mirror assembly for a scanning projection system

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2150314A (en) * 1983-10-27 1985-06-26 Canon Kk Annular field reflecting optical system
RU2192028C1 (ru) * 2001-04-04 2002-10-27 Общество С Ограниченной Ответственностью "Инсмат Технология" Катадиоптрическая система
CN102981255A (zh) * 2011-09-07 2013-03-20 上海微电子装备有限公司 一种大视场投影物镜
CN102981255B (zh) * 2011-09-07 2016-04-20 上海微电子装备有限公司 一种大视场投影物镜

Also Published As

Publication number Publication date
IT7848011A0 (it) 1978-02-10
JPS53100230A (en) 1978-09-01
CA1103498A (en) 1981-06-23
FR2380563B1 (enrdf_load_stackoverflow) 1984-01-20
FR2380563A1 (fr) 1978-09-08
DE2801882C2 (enrdf_load_stackoverflow) 1988-02-04
CH625055A5 (en) 1981-08-31
IT1101789B (it) 1985-10-07
DE2801882A1 (de) 1978-08-17
GB1605160A (en) 1982-08-11
JPH0130125B2 (enrdf_load_stackoverflow) 1989-06-16

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19930213