CA1103498A - Wide annulus unit power optical system - Google Patents
Wide annulus unit power optical systemInfo
- Publication number
- CA1103498A CA1103498A CA294,050A CA294050A CA1103498A CA 1103498 A CA1103498 A CA 1103498A CA 294050 A CA294050 A CA 294050A CA 1103498 A CA1103498 A CA 1103498A
- Authority
- CA
- Canada
- Prior art keywords
- optical system
- annular field
- convex
- mirrors
- concave
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 177
- 230000004075 alteration Effects 0.000 claims abstract description 26
- 230000000694 effects Effects 0.000 claims abstract description 15
- 230000003595 spectral effect Effects 0.000 claims abstract description 14
- 230000006872 improvement Effects 0.000 claims abstract description 4
- 230000005499 meniscus Effects 0.000 claims description 73
- 238000010276 construction Methods 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 5
- 230000009467 reduction Effects 0.000 claims description 2
- 238000009966 trimming Methods 0.000 claims 26
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 12
- 239000005350 fused silica glass Substances 0.000 description 10
- 201000009310 astigmatism Diseases 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- SYOKIDBDQMKNDQ-XWTIBIIYSA-N vildagliptin Chemical compound C1C(O)(C2)CC(C3)CC1CC32NCC(=O)N1CCC[C@H]1C#N SYOKIDBDQMKNDQ-XWTIBIIYSA-N 0.000 description 2
- 238000007792 addition Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920000136 polysorbate Polymers 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0836—Catadioptric systems using more than three curved mirrors
- G02B17/0844—Catadioptric systems using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/008—Systems specially adapted to form image relays or chained systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0804—Catadioptric systems using two curved mirrors
- G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Stereoscopic And Panoramic Photography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US76790677A | 1977-02-11 | 1977-02-11 | |
| US767,906 | 1977-02-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1103498A true CA1103498A (en) | 1981-06-23 |
Family
ID=25080934
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA294,050A Expired CA1103498A (en) | 1977-02-11 | 1977-12-29 | Wide annulus unit power optical system |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS53100230A (enrdf_load_stackoverflow) |
| CA (1) | CA1103498A (enrdf_load_stackoverflow) |
| CH (1) | CH625055A5 (enrdf_load_stackoverflow) |
| DE (1) | DE2801882A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2380563A1 (enrdf_load_stackoverflow) |
| GB (2) | GB1605161A (enrdf_load_stackoverflow) |
| IT (1) | IT1101789B (enrdf_load_stackoverflow) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4331390A (en) * | 1979-10-09 | 1982-05-25 | The Perkin-Elmer Corporation | Monocentric optical systems |
| JPS5890610A (ja) * | 1981-11-24 | 1983-05-30 | Matsushita Electric Ind Co Ltd | カタデイオプトリツク光学系 |
| US4469414A (en) * | 1982-06-01 | 1984-09-04 | The Perkin-Elmer Corporation | Restrictive off-axis field optical system |
| JPS59144127A (ja) * | 1983-02-07 | 1984-08-18 | Canon Inc | 像調整された光学装置 |
| JPS6093410A (ja) * | 1983-10-27 | 1985-05-25 | Canon Inc | 反射光学系 |
| JPS6147916A (ja) * | 1984-08-14 | 1986-03-08 | Canon Inc | 反射光学系 |
| US4747678A (en) * | 1986-12-17 | 1988-05-31 | The Perkin-Elmer Corporation | Optical relay system with magnification |
| JP2565149B2 (ja) * | 1995-04-05 | 1996-12-18 | キヤノン株式会社 | 回路の製造方法及び露光装置 |
| RU2192028C1 (ru) * | 2001-04-04 | 2002-10-27 | Общество С Ограниченной Ответственностью "Инсмат Технология" | Катадиоптрическая система |
| JP5196869B2 (ja) * | 2007-05-15 | 2013-05-15 | キヤノン株式会社 | 投影光学系、露光装置及びデバイス製造方法 |
| CN102981255B (zh) * | 2011-09-07 | 2016-04-20 | 上海微电子装备有限公司 | 一种大视场投影物镜 |
| JP2020052342A (ja) * | 2018-09-28 | 2020-04-02 | キヤノン株式会社 | 光学機器 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2344756A (en) * | 1941-01-06 | 1944-03-21 | Taylor Taylor & Hobson Ltd | Optical objective |
| US2682197A (en) * | 1951-08-13 | 1954-06-29 | American Optical Corp | Folded reflecting optical system of the schmidt type |
| SU126911A1 (ru) * | 1959-03-30 | 1959-11-30 | Н.Н. Петрушов | Зеркально-линзовый объектив |
| US3821763A (en) * | 1971-06-21 | 1974-06-28 | Perkin Elmer Corp | Annular field optical imaging system |
| US3748015A (en) * | 1971-06-21 | 1973-07-24 | Perkin Elmer Corp | Unit power imaging catoptric anastigmat |
| US3951546A (en) * | 1974-09-26 | 1976-04-20 | The Perkin-Elmer Corporation | Three-fold mirror assembly for a scanning projection system |
-
1977
- 1977-12-29 CA CA294,050A patent/CA1103498A/en not_active Expired
-
1978
- 1978-01-17 DE DE19782801882 patent/DE2801882A1/de active Granted
- 1978-01-23 FR FR7801763A patent/FR2380563A1/fr active Granted
- 1978-02-10 CH CH148678A patent/CH625055A5/fr not_active IP Right Cessation
- 1978-02-10 IT IT48011/78A patent/IT1101789B/it active
- 1978-02-10 JP JP1485178A patent/JPS53100230A/ja active Granted
- 1978-02-13 GB GB23809/80A patent/GB1605161A/en not_active Expired
- 1978-02-13 GB GB5682/78A patent/GB1605160A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| IT7848011A0 (it) | 1978-02-10 |
| GB1605160A (en) | 1982-08-11 |
| JPS53100230A (en) | 1978-09-01 |
| FR2380563A1 (fr) | 1978-09-08 |
| DE2801882C2 (enrdf_load_stackoverflow) | 1988-02-04 |
| CH625055A5 (en) | 1981-08-31 |
| FR2380563B1 (enrdf_load_stackoverflow) | 1984-01-20 |
| IT1101789B (it) | 1985-10-07 |
| JPH0130125B2 (enrdf_load_stackoverflow) | 1989-06-16 |
| GB1605161A (en) | 1982-08-11 |
| DE2801882A1 (de) | 1978-08-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKEX | Expiry | ||
| MKEX | Expiry |
Effective date: 19980623 |