GB1569651A - Deposition of polycrystallne silicon - Google Patents
Deposition of polycrystallne silicon Download PDFInfo
- Publication number
- GB1569651A GB1569651A GB1708777A GB1708777A GB1569651A GB 1569651 A GB1569651 A GB 1569651A GB 1708777 A GB1708777 A GB 1708777A GB 1708777 A GB1708777 A GB 1708777A GB 1569651 A GB1569651 A GB 1569651A
- Authority
- GB
- United Kingdom
- Prior art keywords
- silicon
- deposition
- substrate
- tube
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052710 silicon Inorganic materials 0.000 title claims description 132
- 239000010703 silicon Substances 0.000 title claims description 132
- 230000008021 deposition Effects 0.000 title claims description 100
- 239000000758 substrate Substances 0.000 claims description 145
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 131
- 238000000151 deposition Methods 0.000 claims description 114
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 86
- 238000000034 method Methods 0.000 claims description 71
- 239000007789 gas Substances 0.000 claims description 63
- 229910052799 carbon Inorganic materials 0.000 claims description 44
- 229910002804 graphite Inorganic materials 0.000 claims description 40
- 239000010439 graphite Substances 0.000 claims description 40
- 238000006243 chemical reaction Methods 0.000 claims description 39
- 239000011888 foil Substances 0.000 claims description 29
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 24
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 16
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 15
- 150000003377 silicon compounds Chemical class 0.000 claims description 14
- 238000010438 heat treatment Methods 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 239000010453 quartz Substances 0.000 claims description 11
- 239000000853 adhesive Substances 0.000 claims description 10
- 230000001070 adhesive effect Effects 0.000 claims description 10
- 239000007787 solid Substances 0.000 claims description 10
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 8
- 229910052786 argon Inorganic materials 0.000 claims description 8
- 239000001257 hydrogen Substances 0.000 claims description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims description 8
- 238000007689 inspection Methods 0.000 claims description 8
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims description 8
- 239000005052 trichlorosilane Substances 0.000 claims description 8
- 238000005488 sandblasting Methods 0.000 claims description 7
- 238000004804 winding Methods 0.000 claims description 7
- 238000001816 cooling Methods 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 238000004026 adhesive bonding Methods 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- 230000006698 induction Effects 0.000 claims description 4
- 239000012159 carrier gas Substances 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 12
- 239000004020 conductor Substances 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 239000011521 glass Substances 0.000 description 6
- 239000011261 inert gas Substances 0.000 description 6
- 238000002844 melting Methods 0.000 description 6
- 230000008018 melting Effects 0.000 description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 5
- 239000007792 gaseous phase Substances 0.000 description 5
- 229910052709 silver Inorganic materials 0.000 description 5
- 239000004332 silver Substances 0.000 description 5
- 229910000831 Steel Inorganic materials 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- 230000003247 decreasing effect Effects 0.000 description 3
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 3
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 210000001503 joint Anatomy 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000011491 glass wool Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
- 238000004857 zone melting Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Silicon Compounds (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19762618273 DE2618273C3 (de) | 1976-04-27 | 1976-04-27 | Verfahren zur Abscheidung von polykristallinem Silicium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1569651A true GB1569651A (en) | 1980-06-18 |
Family
ID=5976298
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1708777A Expired GB1569651A (en) | 1976-04-27 | 1977-04-25 | Deposition of polycrystallne silicon |
Country Status (9)
| Country | Link |
|---|---|
| JP (1) | JPS52155142A (enrdf_load_stackoverflow) |
| BE (1) | BE853997A (enrdf_load_stackoverflow) |
| CA (1) | CA1092905A (enrdf_load_stackoverflow) |
| DE (1) | DE2618273C3 (enrdf_load_stackoverflow) |
| FR (1) | FR2361304A1 (enrdf_load_stackoverflow) |
| GB (1) | GB1569651A (enrdf_load_stackoverflow) |
| IT (1) | IT1086646B (enrdf_load_stackoverflow) |
| NL (1) | NL7702613A (enrdf_load_stackoverflow) |
| SE (1) | SE7704805L (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5354580A (en) * | 1993-06-08 | 1994-10-11 | Cvd Incorporated | Triangular deposition chamber for a vapor deposition system |
| KR20080005953A (ko) * | 2005-04-10 | 2008-01-15 | 알이씨 실리콘 인코포레이티드 | 다결정 실리콘의 제조 방법 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1391792A (fr) * | 1962-12-19 | 1965-03-12 | Thomson Houston Comp Francaise | Perfectionnements aux procédés de formation d'un matériau en feuilles, notamment pour feuilles de graphite pyrolytique |
| DE1272801B (de) * | 1965-07-14 | 1968-07-11 | Hitco Cardena | Verfahren zur Verkohlung von faserigem Zellulosematerial |
| DE2022025C3 (de) * | 1970-05-05 | 1980-03-20 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Vorrichtung zum Herstellen eines Hohlkörpers aus Halbleitermaterial |
| GB1292534A (en) * | 1970-06-04 | 1972-10-11 | Pfizer | Method for making a continuous film of pyrolytic graphite having bi-directional reinforcing properties |
| DE2229229A1 (de) * | 1972-06-15 | 1974-01-10 | Siemens Ag | Verfahren zum herstellen von aus silizium oder siliziumcarbid bestehenden formkoerpern |
-
1976
- 1976-04-27 DE DE19762618273 patent/DE2618273C3/de not_active Expired
-
1977
- 1977-03-08 CA CA273,378A patent/CA1092905A/en not_active Expired
- 1977-03-10 NL NL7702613A patent/NL7702613A/xx not_active Application Discontinuation
- 1977-04-22 IT IT4907877A patent/IT1086646B/it active
- 1977-04-25 GB GB1708777A patent/GB1569651A/en not_active Expired
- 1977-04-26 SE SE7704805A patent/SE7704805L/ not_active Application Discontinuation
- 1977-04-27 BE BE177052A patent/BE853997A/xx not_active IP Right Cessation
- 1977-04-27 FR FR7712732A patent/FR2361304A1/fr active Granted
- 1977-04-27 JP JP4899777A patent/JPS52155142A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| FR2361304A1 (fr) | 1978-03-10 |
| NL7702613A (nl) | 1977-10-31 |
| FR2361304B1 (enrdf_load_stackoverflow) | 1981-01-09 |
| CA1092905A (en) | 1981-01-06 |
| SE7704805L (sv) | 1977-10-28 |
| DE2618273B2 (de) | 1978-11-09 |
| BE853997A (fr) | 1977-10-27 |
| JPS52155142A (en) | 1977-12-23 |
| JPS5635604B2 (enrdf_load_stackoverflow) | 1981-08-18 |
| IT1086646B (it) | 1985-05-28 |
| DE2618273A1 (de) | 1977-11-03 |
| DE2618273C3 (de) | 1984-04-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |