GB1554389A - Curable compositions and method for curing same - Google Patents

Curable compositions and method for curing same

Info

Publication number
GB1554389A
GB1554389A GB22440/77A GB2244077A GB1554389A GB 1554389 A GB1554389 A GB 1554389A GB 22440/77 A GB22440/77 A GB 22440/77A GB 2244077 A GB2244077 A GB 2244077A GB 1554389 A GB1554389 A GB 1554389A
Authority
GB
United Kingdom
Prior art keywords
curable compositions
curing same
curing
same
curable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB22440/77A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of GB1554389A publication Critical patent/GB1554389A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L29/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical; Compositions of hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Compositions of derivatives of such polymers
    • C08L29/14—Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
GB22440/77A 1976-07-09 1977-05-27 Curable compositions and method for curing same Expired GB1554389A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US70386076A 1976-07-09 1976-07-09
US73242176A 1976-10-14 1976-10-14

Publications (1)

Publication Number Publication Date
GB1554389A true GB1554389A (en) 1979-10-17

Family

ID=27107218

Family Applications (1)

Application Number Title Priority Date Filing Date
GB22440/77A Expired GB1554389A (en) 1976-07-09 1977-05-27 Curable compositions and method for curing same

Country Status (8)

Country Link
JP (1) JPS6035930B2 (enrdf_load_stackoverflow)
AU (1) AU517415B2 (enrdf_load_stackoverflow)
BR (1) BR7704527A (enrdf_load_stackoverflow)
DE (1) DE2730725A1 (enrdf_load_stackoverflow)
FR (1) FR2357931A1 (enrdf_load_stackoverflow)
GB (1) GB1554389A (enrdf_load_stackoverflow)
MX (2) MX159499A (enrdf_load_stackoverflow)
NL (1) NL183948C (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4299938A (en) 1979-06-19 1981-11-10 Ciba-Geigy Corporation Photopolymerizable and thermally polymerizable compositions
GB2139369A (en) * 1983-05-06 1984-11-07 Sericol Group Ltd Photosensitive systems showing visible indication of exposure

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6076735A (ja) * 1983-10-04 1985-05-01 Agency Of Ind Science & Technol 光硬化樹脂組成物
JPS6078442A (ja) * 1983-10-04 1985-05-04 Agency Of Ind Science & Technol 光硬化性樹脂組成物
JPS6078443A (ja) * 1983-10-05 1985-05-04 Agency Of Ind Science & Technol 光不溶性樹脂組成物
DE3565013D1 (en) * 1984-02-10 1988-10-20 Ciba Geigy Ag Process for the preparation of a protection layer or a relief pattern
ES2396118T3 (es) * 2002-02-01 2013-02-19 Saint-Gobain Glass France S.A. Capa barrera hecha de una resina curable que contiene un poliol polimérico
KR20150055105A (ko) 2009-10-01 2015-05-20 히타치가세이가부시끼가이샤 유기 일렉트로닉스용 재료, 유기 일렉트로닉스 소자, 유기 일렉트로 루미네센스 소자, 및 그것을 사용한 표시 소자, 조명 장치, 표시 장치
EP2562839A4 (en) 2010-04-22 2015-07-22 Hitachi Chemical Co Ltd ORGANIC ELECTRONIC MATERIAL, POLYMERIZATION INITIATOR AND THERMAL POLYMERIZATION INITIATOR, INK COMPOSITION, ORGANIC THIN FILM AND METHOD FOR PRODUCING THE SAME, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, ILLUMINATION DEVICE, DISPLAY ELEMENT, AND DISPLAY DEVICE
CN110003447A (zh) 2013-03-08 2019-07-12 日立化成株式会社 处理液、有机电子元件、发光元件、显示元件、照明装置、显示装置和有机光电转换元件

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1077246A (fr) * 1952-04-14 1954-11-05 Bataafsche Petroleum Composition contenant du glycidyléther et une résine de polyvinyl acétal
NL83160C (enrdf_load_stackoverflow) * 1952-08-19
US3552963A (en) * 1964-10-13 1971-01-05 Kalvar Corp Photographic vesicular materials and imaging process therefor
FR1456922A (fr) * 1965-09-17 1966-07-08 Porte de foyer à réchauffage d'air
AU497960B2 (en) * 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
GB1516511A (en) * 1974-05-02 1978-07-05 Gen Electric Curable epoxide compositions
GB1516352A (en) * 1974-05-02 1978-07-05 Gen Electric Halonium salts
GB1512982A (en) * 1974-05-02 1978-06-01 Gen Electric Salts
DE2551347A1 (de) * 1975-08-14 1977-02-24 Alusuisse Verfahren zur herstellung einer negativ arbeitenden, lichtempfindlichen masse

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4299938A (en) 1979-06-19 1981-11-10 Ciba-Geigy Corporation Photopolymerizable and thermally polymerizable compositions
GB2139369A (en) * 1983-05-06 1984-11-07 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
US4659649A (en) * 1983-05-06 1987-04-21 Sericol Group Limited Photosensitive systems showing visible indication of exposure

Also Published As

Publication number Publication date
DE2730725C2 (enrdf_load_stackoverflow) 1990-08-16
FR2357931B1 (enrdf_load_stackoverflow) 1983-11-25
AU517415B2 (en) 1981-07-30
AU2553177A (en) 1978-11-30
JPS6035930B2 (ja) 1985-08-17
NL183948C (nl) 1989-03-01
MX159499A (es) 1989-06-20
NL7707609A (nl) 1978-01-11
BR7704527A (pt) 1978-04-25
FR2357931A1 (fr) 1978-02-03
JPS5322597A (en) 1978-03-02
NL183948B (nl) 1988-10-03
DE2730725A1 (de) 1978-01-12
MX145409A (es) 1982-02-04

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
746 Register noted 'licences of right' (sect. 46/1977)
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19940527