GB1524870A - Provision of conductor layer patterns - Google Patents

Provision of conductor layer patterns

Info

Publication number
GB1524870A
GB1524870A GB43342/75A GB4334275A GB1524870A GB 1524870 A GB1524870 A GB 1524870A GB 43342/75 A GB43342/75 A GB 43342/75A GB 4334275 A GB4334275 A GB 4334275A GB 1524870 A GB1524870 A GB 1524870A
Authority
GB
United Kingdom
Prior art keywords
conductor
substrate
layer
mask
deposited
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB43342/75A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philips Electronics UK Ltd
Original Assignee
Philips Electronic and Associated Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Electronic and Associated Industries Ltd filed Critical Philips Electronic and Associated Industries Ltd
Publication of GB1524870A publication Critical patent/GB1524870A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D44/00—Charge transfer devices
    • H10D44/40—Charge-coupled devices [CCD]
    • H10D44/45—Charge-coupled devices [CCD] having field effect produced by insulated gate electrodes 
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/02—Contacts, special
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/106—Masks, special
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/143—Shadow masking
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking
    • Y10S438/944—Shadow

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Drying Of Semiconductors (AREA)
GB43342/75A 1974-10-25 1975-10-22 Provision of conductor layer patterns Expired GB1524870A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7413977A NL7413977A (nl) 1974-10-25 1974-10-25 Aanbrengen van een geleiderlaagpatroon met op een geringe onderlinge afstand gelegen delen, in het bijzonder bij de vervaardiging van half- geleiderinrichtingen.

Publications (1)

Publication Number Publication Date
GB1524870A true GB1524870A (en) 1978-09-13

Family

ID=19822335

Family Applications (1)

Application Number Title Priority Date Filing Date
GB43342/75A Expired GB1524870A (en) 1974-10-25 1975-10-22 Provision of conductor layer patterns

Country Status (12)

Country Link
US (1) US4301191A (cg-RX-API-DMAC7.html)
JP (1) JPS5165876A (cg-RX-API-DMAC7.html)
AU (1) AU503144B2 (cg-RX-API-DMAC7.html)
CA (1) CA1043471A (cg-RX-API-DMAC7.html)
CH (1) CH595699A5 (cg-RX-API-DMAC7.html)
DE (1) DE2547447A1 (cg-RX-API-DMAC7.html)
ES (1) ES442026A1 (cg-RX-API-DMAC7.html)
FR (1) FR2290032A1 (cg-RX-API-DMAC7.html)
GB (1) GB1524870A (cg-RX-API-DMAC7.html)
IT (1) IT1043587B (cg-RX-API-DMAC7.html)
NL (1) NL7413977A (cg-RX-API-DMAC7.html)
SE (1) SE7511837L (cg-RX-API-DMAC7.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2131624A (en) * 1982-12-09 1984-06-20 Standard Telephones Cables Ltd Thick film circuits

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD136670A1 (de) * 1976-02-04 1979-07-18 Rudolf Sacher Verfahren und vorrichtung zur herstellung von halbleiterstrukturen
US4469719A (en) * 1981-12-21 1984-09-04 Applied Magnetics-Magnetic Head Divison Corporation Method for controlling the edge gradient of a layer of deposition material
US4691434A (en) * 1982-02-19 1987-09-08 Lasarray Holding Ag Method of making electrically conductive regions in monolithic semiconductor devices as applied to a semiconductor device
PH23907A (en) * 1983-09-28 1989-12-18 Rohm & Haas Catalytic process and systems
US6667215B2 (en) * 2002-05-02 2003-12-23 3M Innovative Properties Method of making transistors
KR100950133B1 (ko) * 2002-12-27 2010-03-30 엘지디스플레이 주식회사 인쇄방식에 의한 패턴형성방법

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL294779A (cg-RX-API-DMAC7.html) * 1962-07-20
US3700510A (en) * 1970-03-09 1972-10-24 Hughes Aircraft Co Masking techniques for use in fabricating microelectronic components
GB1447866A (en) * 1972-11-10 1976-09-02 Nat Res Dev Charge coupled devices and methods of fabricating them

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2131624A (en) * 1982-12-09 1984-06-20 Standard Telephones Cables Ltd Thick film circuits

Also Published As

Publication number Publication date
DE2547447A1 (de) 1976-04-29
CA1043471A (en) 1978-11-28
JPS5165876A (cg-RX-API-DMAC7.html) 1976-06-07
AU8594575A (en) 1977-04-28
FR2290032B1 (cg-RX-API-DMAC7.html) 1980-12-12
SE7511837L (sv) 1976-04-26
CH595699A5 (cg-RX-API-DMAC7.html) 1978-02-28
IT1043587B (it) 1980-02-29
AU503144B2 (en) 1979-08-23
FR2290032A1 (fr) 1976-05-28
US4301191A (en) 1981-11-17
NL7413977A (nl) 1976-04-27
ES442026A1 (es) 1977-06-16

Similar Documents

Publication Publication Date Title
GB1439209A (en) Integrated circuit devices
GB1037519A (en) Electrical circuits
GB1157989A (en) Improvements in and relating to Cleaning Selected Surface Areas of Substrates
JPS55163860A (en) Manufacture of semiconductor device
GB1506066A (en) Manufacture of semiconductor devices
GB1317014A (en) Contact system for semiconductor devices
GB1193868A (en) Ohmic Contacts for Semiconductor Devices
GB1514370A (en) Semiconductor integrated circuit devices and method of preparing the same
GB1358438A (en) Process for the manufacture of a semiconductor component or an integrated semiconductor circuit
US4495026A (en) Method for manufacturing metallized semiconductor components
GB1244618A (en) A method of forming a metal contact on an element and a vacuum deposition system that may be used in performing this method
GB1165016A (en) Processing Semiconductor Bodies to Form Surface Protuberances Thereon.
GB1348731A (en) Interconnection of electrical devices
US3526555A (en) Method of masking a semiconductor with a liftable metallic layer
GB1179983A (en) Method of Fabricating Semiconductor Devices.
GB1088679A (en) Improvements in or relating to electrical circuits
GB1269130A (en) Improvements relating to ohmic contacts for semiconductor devices
GB1389326A (en) Method for producing thin film circuits
GB1447866A (en) Charge coupled devices and methods of fabricating them
GB1232126A (cg-RX-API-DMAC7.html)
US3825453A (en) Method of preventing a chemical reaction between aluminum and silicon dioxide in a semiconductor device
SE340659B (cg-RX-API-DMAC7.html)
JPS56148845A (en) Manufacture of semiconductor device
GB1490715A (en) Methods of forming a conductive pattern on a supporting body
GB1495377A (en) Method of manufacturing a charge transfer device

Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee