GB1475431A - Exposure apparatus for printing - Google Patents

Exposure apparatus for printing

Info

Publication number
GB1475431A
GB1475431A GB106075A GB106075A GB1475431A GB 1475431 A GB1475431 A GB 1475431A GB 106075 A GB106075 A GB 106075A GB 106075 A GB106075 A GB 106075A GB 1475431 A GB1475431 A GB 1475431A
Authority
GB
United Kingdom
Prior art keywords
lens
assembly
photo
resist layer
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB106075A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP49006908A external-priority patent/JPS50103976A/ja
Priority claimed from JP49036141A external-priority patent/JPS50129045A/ja
Application filed by Canon Inc filed Critical Canon Inc
Publication of GB1475431A publication Critical patent/GB1475431A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
GB106075A 1974-01-12 1975-01-10 Exposure apparatus for printing Expired GB1475431A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP49006908A JPS50103976A (enExample) 1974-01-12 1974-01-12
JP49036141A JPS50129045A (enExample) 1974-03-29 1974-03-29

Publications (1)

Publication Number Publication Date
GB1475431A true GB1475431A (en) 1977-06-01

Family

ID=26341129

Family Applications (1)

Application Number Title Priority Date Filing Date
GB106075A Expired GB1475431A (en) 1974-01-12 1975-01-10 Exposure apparatus for printing

Country Status (3)

Country Link
US (1) US3988066A (enExample)
FR (1) FR2257925B1 (enExample)
GB (1) GB1475431A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2307303A (en) * 1995-11-14 1997-05-21 Samsung Electronics Co Ltd Apparatus and method for projection exposure
EP0961153A4 (en) * 1997-11-18 2004-12-22 Seiko Epson Corp OPTICAL LIGHTING SYSTEM AND PROJECTION-LIKE DISPLAY.

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4023904A (en) * 1974-07-01 1977-05-17 Tamarack Scientific Co. Inc. Optical microcircuit printing process
FR2406236A1 (fr) * 1976-12-10 1979-05-11 Thomson Csf Dispositif optique a source coherente pour le transfert rapide de motifs sur substrats, applique a la realisation de composants et circuits a microstructures
US4474463A (en) * 1982-08-30 1984-10-02 Tre Semiconductor Equipment Corporation Mixer coupling lens subassembly for photolithographic system
JPS59160134A (ja) * 1983-03-04 1984-09-10 Canon Inc 照明光学系
JPS60218635A (ja) * 1984-04-13 1985-11-01 Canon Inc 照明装置
US4652134A (en) * 1984-08-28 1987-03-24 Lsi Logic Corporation Mask alignment system
US4947030A (en) * 1985-05-22 1990-08-07 Canon Kabushiki Kaisha Illuminating optical device
US4867514A (en) * 1985-11-12 1989-09-19 Hydro Fuels, Inc. Systems for deviating and (optionally) converging radiation
US4841341A (en) * 1986-06-13 1989-06-20 Matsushita Electric Industrial Co., Ltd. Integrator for an exposure apparatus or the like
EP0250975B1 (en) * 1986-06-13 1991-08-28 Dainippon Screen Mfg. Co., Ltd. Illumination system
US4939630A (en) * 1986-09-09 1990-07-03 Nikon Corporation Illumination optical apparatus
IL105925A (en) * 1992-06-22 1997-01-10 Martin Marietta Corp Ablative process for printed circuit board technology
US5757544A (en) * 1993-03-09 1998-05-26 Olympus Optical Co., Ltd. Image display apparatus
JP2002049073A (ja) * 2000-08-07 2002-02-15 Asahi Precision Co Ltd Ｃｃｔｖカメラ用レンズの絞り装置
ATE502323T1 (de) * 2003-07-30 2011-04-15 Zeiss Carl Smt Gmbh Beleuchtungssystem für die mikrolithographie
US7206132B2 (en) 2004-08-06 2007-04-17 Visx, Incorporated Lenslet array for beam homogenization
GB2423589A (en) * 2005-02-23 2006-08-30 Univ Warwick Wireless communication receiver with optical diverging element and filter
JP4541394B2 (ja) * 2007-10-31 2010-09-08 パナソニック株式会社 金属ローラの製造方法
JP2013072845A (ja) * 2011-09-29 2013-04-22 Nuflare Technology Inc パターン検査装置及びパターン検査方法
JP5905305B2 (ja) * 2012-03-14 2016-04-20 山下電装株式会社 照射光量制御装置及びソーラシミュレータ
TWI460526B (zh) * 2012-07-31 2014-11-11 Sintai Optical Shenzhen Co Ltd 投影機

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3532038A (en) * 1967-06-05 1970-10-06 Ibm Multi-lens devices for the fabrication of semiconductor devices
US3584948A (en) * 1968-06-24 1971-06-15 Bell Telephone Labor Inc Apparatus and method for producing multiple images
US3594081A (en) * 1968-11-04 1971-07-20 Werner Tschink Adjustable illuminating device
US3941475A (en) * 1974-07-01 1976-03-02 Tamarack Scientific Co., Inc. Optical microcircuit printing system

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2307303A (en) * 1995-11-14 1997-05-21 Samsung Electronics Co Ltd Apparatus and method for projection exposure
EP0961153A4 (en) * 1997-11-18 2004-12-22 Seiko Epson Corp OPTICAL LIGHTING SYSTEM AND PROJECTION-LIKE DISPLAY.
EP1772766A1 (en) * 1997-11-18 2007-04-11 Seiko Epson Corporation Illumination system and projection display apparatus
CN1243577B (zh) * 1997-11-18 2012-02-22 精工爱普生株式会社 照明光学系统和投影型显示装置

Also Published As

Publication number Publication date
FR2257925B1 (enExample) 1977-11-18
DE2500746A1 (de) 1975-07-17
US3988066A (en) 1976-10-26
FR2257925A1 (enExample) 1975-08-08
DE2500746B2 (de) 1976-08-12

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PE20 Patent expired after termination of 20 years

Effective date: 19950109