GB1474817A - Method of forming a patterned high energy beam resist and a resist so formed - Google Patents

Method of forming a patterned high energy beam resist and a resist so formed

Info

Publication number
GB1474817A
GB1474817A GB4765174A GB4765174A GB1474817A GB 1474817 A GB1474817 A GB 1474817A GB 4765174 A GB4765174 A GB 4765174A GB 4765174 A GB4765174 A GB 4765174A GB 1474817 A GB1474817 A GB 1474817A
Authority
GB
United Kingdom
Prior art keywords
resist
resists
forming
electron
nov
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4765174A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Texas Instruments Inc
Original Assignee
Texas Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Texas Instruments Inc filed Critical Texas Instruments Inc
Publication of GB1474817A publication Critical patent/GB1474817A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
    • H10W74/47—Encapsulations, e.g. protective coatings characterised by their materials comprising organic materials, e.g. plastics or resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Electron Beam Exposure (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
GB4765174A 1973-11-05 1974-11-04 Method of forming a patterned high energy beam resist and a resist so formed Expired GB1474817A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US41293473A 1973-11-05 1973-11-05

Publications (1)

Publication Number Publication Date
GB1474817A true GB1474817A (en) 1977-05-25

Family

ID=23635067

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4765174A Expired GB1474817A (en) 1973-11-05 1974-11-04 Method of forming a patterned high energy beam resist and a resist so formed

Country Status (5)

Country Link
US (1) US4133907A (https=)
JP (1) JPS576578B2 (https=)
DE (1) DE2452326C2 (https=)
FR (1) FR2250200B1 (https=)
GB (1) GB1474817A (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1983002339A1 (fr) * 1981-12-21 1983-07-07 Molodnyakov, Sergey, Petrovich Vernis photosensible et sensible aux electrons

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4225664A (en) * 1979-02-22 1980-09-30 Bell Telephone Laboratories, Incorporated X-ray resist containing poly(2,3-dichloro-1-propyl acrylate) and poly(glycidyl methacrylate-co-ethyl acrylate)
DE3069341D1 (en) * 1979-05-31 1984-11-08 Western Electric Co Accelerated particle lithographic processing
US4383026A (en) * 1979-05-31 1983-05-10 Bell Telephone Laboratories, Incorporated Accelerated particle lithographic processing and articles so produced
US4289842A (en) * 1980-06-27 1981-09-15 Eastman Kodak Company Negative-working polymers useful as electron beam resists
JPS57157523A (en) * 1981-03-25 1982-09-29 Hitachi Ltd Forming method for pattern
JP4524744B2 (ja) * 2004-04-14 2010-08-18 日本電気株式会社 有機マスクの形成方法及び該有機マスクを利用したパターン形成方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL135068C (https=) * 1960-06-20 1900-01-01
US3535137A (en) * 1967-01-13 1970-10-20 Ibm Method of fabricating etch resistant masks
US3627659A (en) * 1967-07-11 1971-12-14 Basf Ag Radiation treatment of halogen containing olefinically unsaturated esters
US3544790A (en) * 1968-03-01 1970-12-01 Western Electric Co An electron beam masking arrangement
US3661582A (en) * 1970-03-23 1972-05-09 Western Electric Co Additives to positive photoresists which increase the sensitivity thereof
US3703402A (en) * 1970-11-23 1972-11-21 Gen Electric Electron sensitive compositions

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1983002339A1 (fr) * 1981-12-21 1983-07-07 Molodnyakov, Sergey, Petrovich Vernis photosensible et sensible aux electrons

Also Published As

Publication number Publication date
FR2250200A1 (https=) 1975-05-30
FR2250200B1 (https=) 1978-09-15
JPS576578B2 (https=) 1982-02-05
US4133907A (en) 1979-01-09
DE2452326A1 (de) 1975-05-07
DE2452326C2 (de) 1985-08-22
JPS5073707A (https=) 1975-06-18

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PE20 Patent expired after termination of 20 years

Effective date: 19941103