GB1474073A - Photosensitive compositions and presensitized lithographic plates prepared therewith - Google Patents
Photosensitive compositions and presensitized lithographic plates prepared therewithInfo
- Publication number
- GB1474073A GB1474073A GB2727474A GB2727474A GB1474073A GB 1474073 A GB1474073 A GB 1474073A GB 2727474 A GB2727474 A GB 2727474A GB 2727474 A GB2727474 A GB 2727474A GB 1474073 A GB1474073 A GB 1474073A
- Authority
- GB
- United Kingdom
- Prior art keywords
- resin
- specified
- resins
- phenolic
- june
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000203 mixture Substances 0.000 title abstract 5
- 229920001568 phenolic resin Polymers 0.000 abstract 4
- 239000005011 phenolic resin Substances 0.000 abstract 4
- 229920005989 resin Polymers 0.000 abstract 4
- 239000011347 resin Substances 0.000 abstract 4
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 abstract 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 abstract 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 abstract 3
- 229920001228 polyisocyanate Polymers 0.000 abstract 3
- 239000005056 polyisocyanate Substances 0.000 abstract 3
- 239000004925 Acrylic resin Substances 0.000 abstract 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 abstract 2
- 125000001931 aliphatic group Chemical group 0.000 abstract 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 abstract 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract 1
- ZAWQXWZJKKICSZ-UHFFFAOYSA-N 3,3-dimethyl-2-methylidenebutanamide Chemical compound CC(C)(C)C(=C)C(N)=O ZAWQXWZJKKICSZ-UHFFFAOYSA-N 0.000 abstract 1
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 abstract 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 abstract 1
- 229920000178 Acrylic resin Polymers 0.000 abstract 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 abstract 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 abstract 1
- 206010034972 Photosensitivity reaction Diseases 0.000 abstract 1
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 abstract 1
- 125000005250 alkyl acrylate group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 239000003054 catalyst Substances 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- 238000004132 cross linking Methods 0.000 abstract 1
- 239000003431 cross linking reagent Substances 0.000 abstract 1
- 125000006159 dianhydride group Chemical group 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 1
- 239000012948 isocyanate Substances 0.000 abstract 1
- 238000005065 mining Methods 0.000 abstract 1
- 229920003986 novolac Polymers 0.000 abstract 1
- 150000002989 phenols Chemical class 0.000 abstract 1
- 239000003504 photosensitizing agent Substances 0.000 abstract 1
- 229920003987 resole Polymers 0.000 abstract 1
- DBGVGMSCBYYSLD-UHFFFAOYSA-N tributylstannane Chemical compound CCCC[SnH](CCCC)CCCC DBGVGMSCBYYSLD-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polyurethanes Or Polyureas (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US37157873A | 1973-06-20 | 1973-06-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1474073A true GB1474073A (en) | 1977-05-18 |
Family
ID=23464533
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB2727474A Expired GB1474073A (en) | 1973-06-20 | 1974-06-19 | Photosensitive compositions and presensitized lithographic plates prepared therewith |
Country Status (12)
| Country | Link |
|---|---|
| JP (1) | JPS5036210A (enExample) |
| AR (1) | AR205345A1 (enExample) |
| AU (1) | AU470155B2 (enExample) |
| BR (1) | BR7405009D0 (enExample) |
| CA (1) | CA1024803A (enExample) |
| CH (1) | CH607095A5 (enExample) |
| DE (1) | DE2429251A1 (enExample) |
| FR (1) | FR2234583A1 (enExample) |
| GB (1) | GB1474073A (enExample) |
| IT (1) | IT1015190B (enExample) |
| SE (1) | SE7407618L (enExample) |
| ZA (1) | ZA743952B (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0070201A1 (en) * | 1981-07-15 | 1983-01-19 | Konica Corporation | A photosensitive composite |
| US5045429A (en) * | 1985-08-07 | 1991-09-03 | Hoechst Aktiengesellschaft | Light-sensitive photopolymerizable and diazonium resin containing composition and recording material including reaction product of anhydride with carboxylic acid and vinyl alcohol |
| US5187040A (en) * | 1989-06-21 | 1993-02-16 | Hoechst Aktiengesellschaft | Photocurable mixture and material containing diazonium salt polycondensation product or organic azido compound photosensitizer and polyurethane binder grafted with vinyl alcohol and vinyl acetal units |
| EP2233288A1 (en) * | 2009-03-23 | 2010-09-29 | Founder Fine Chemical Industry Co., Ltd. | Radiation sensitive composition and method for preparing radiation sensitive composition |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4189320A (en) * | 1975-04-29 | 1980-02-19 | American Hoechst Corporation | Light-sensitive o-quinone diazide compositions and photographic reproduction processes and structures |
| DE2617088A1 (de) * | 1975-04-29 | 1976-11-11 | Hoechst Co American | Lichtempfindliche kopiermasse |
| CA1119447A (en) * | 1978-09-06 | 1982-03-09 | John P. Vikesland | Positive-acting photoresist composition containing a crosslinked urethane resin, a cured epoxy resin and a photosensitizer |
| JPS601931B2 (ja) * | 1980-11-08 | 1985-01-18 | 住友金属工業株式会社 | 高張力線の製造方法 |
| JPS6043892B2 (ja) * | 1980-11-08 | 1985-10-01 | 住友金属工業株式会社 | 高張力線の製造方法 |
| DE3404366A1 (de) * | 1984-02-08 | 1985-08-14 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial |
| CA1308595C (en) * | 1985-11-22 | 1992-10-13 | Toshiaki Aoai | Photosensitive composition |
| DE3617499A1 (de) * | 1986-05-24 | 1987-11-26 | Hoechst Ag | Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial |
| DE3644163A1 (de) * | 1986-12-23 | 1988-07-07 | Hoechst Ag | Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial |
| DE3644161A1 (de) * | 1986-12-23 | 1988-07-07 | Hoechst Ag | Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial |
| DE3811242A1 (de) * | 1988-04-02 | 1989-10-19 | Hoechst Ag | Im waessrigem alkali loesliche, silanylgruppen in der seitenkette enthaltende bindemittel, verfahren zu deren herstellung sowie lichtempfindliches gemisch, enthaltend diese verbindungen |
| EP0413087A1 (en) * | 1989-07-20 | 1991-02-20 | International Business Machines Corporation | Photosensitive composition and use thereof |
-
1974
- 1974-01-01 AR AR254272A patent/AR205345A1/es active
- 1974-03-27 CA CA196,099A patent/CA1024803A/en not_active Expired
- 1974-06-10 SE SE7407618A patent/SE7407618L/xx unknown
- 1974-06-19 DE DE2429251A patent/DE2429251A1/de active Pending
- 1974-06-19 IT IT24154/74A patent/IT1015190B/it active
- 1974-06-19 GB GB2727474A patent/GB1474073A/en not_active Expired
- 1974-06-19 BR BR5009/74A patent/BR7405009D0/pt unknown
- 1974-06-19 AU AU70239/74A patent/AU470155B2/en not_active Expired
- 1974-06-19 FR FR7421220A patent/FR2234583A1/fr not_active Withdrawn
- 1974-06-19 ZA ZA00743952A patent/ZA743952B/xx unknown
- 1974-06-19 CH CH840174A patent/CH607095A5/xx not_active IP Right Cessation
- 1974-06-19 JP JP49070085A patent/JPS5036210A/ja active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0070201A1 (en) * | 1981-07-15 | 1983-01-19 | Konica Corporation | A photosensitive composite |
| US5045429A (en) * | 1985-08-07 | 1991-09-03 | Hoechst Aktiengesellschaft | Light-sensitive photopolymerizable and diazonium resin containing composition and recording material including reaction product of anhydride with carboxylic acid and vinyl alcohol |
| US5187040A (en) * | 1989-06-21 | 1993-02-16 | Hoechst Aktiengesellschaft | Photocurable mixture and material containing diazonium salt polycondensation product or organic azido compound photosensitizer and polyurethane binder grafted with vinyl alcohol and vinyl acetal units |
| EP2233288A1 (en) * | 2009-03-23 | 2010-09-29 | Founder Fine Chemical Industry Co., Ltd. | Radiation sensitive composition and method for preparing radiation sensitive composition |
Also Published As
| Publication number | Publication date |
|---|---|
| AR205345A1 (es) | 1976-04-30 |
| DE2429251A1 (de) | 1975-01-02 |
| SE7407618L (enExample) | 1974-12-23 |
| AU470155B2 (en) | 1976-03-04 |
| ZA743952B (en) | 1975-06-25 |
| JPS5036210A (enExample) | 1975-04-05 |
| AU7023974A (en) | 1976-01-08 |
| CA1024803A (en) | 1978-01-24 |
| IT1015190B (it) | 1977-05-10 |
| BR7405009D0 (pt) | 1975-09-30 |
| CH607095A5 (enExample) | 1978-11-30 |
| FR2234583A1 (enExample) | 1975-01-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| GB1474073A (en) | Photosensitive compositions and presensitized lithographic plates prepared therewith | |
| JPS56141321A (en) | Photosetting resin composition | |
| JPS5610529A (en) | Curable resin composition | |
| GB1451251A (en) | Production of relief printing plates for flexographic printing and presensitized plates for the manufacture of such plates | |
| KR860001143A (ko) | 광경화 수지조성물 | |
| HK8787A (en) | Positive-type photoresist compositions | |
| JPS5756259A (en) | Manufacture of gravure plate | |
| JPS57105418A (en) | Aqueous dispersion composition | |
| PT77266B (en) | Process for preparing photosensitive elastomeric polymer compo-sition for flexographic printing plates | |
| JPS54107994A (en) | Preparation of styrene resin | |
| JPS5498614A (en) | Photosensitive composition | |
| JPS6448059A (en) | Photoresist composition | |
| JPS5714613A (en) | Photosetting composition | |
| JPS55153936A (en) | Storage-stabilized photosensitive resin composition for flexographic plate | |
| JPS5765714A (en) | Photocurable resin composition | |
| JPS5579438A (en) | Photosensitive polyamide resin composition | |
| JPS55127553A (en) | Photosensitive composition | |
| JPS5571771A (en) | Adhesive composition | |
| JPS56122028A (en) | Alkali-soluble photosensitive resin composition | |
| JPS5375291A (en) | Casting composition | |
| JPS64113A (en) | Melamine ring-containing curable resin composition | |
| JPS5686903A (en) | Photosetting liquid rubber composition | |
| JPS5399292A (en) | Heat decomposable photosensitive resin composition | |
| JPS56818A (en) | Asphalt pitch-urethane composition | |
| JPS5728129A (en) | Curing agent for epoxy resin |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |