GB1463648A - Film growth process - Google Patents
Film growth processInfo
- Publication number
- GB1463648A GB1463648A GB2286875A GB2286875A GB1463648A GB 1463648 A GB1463648 A GB 1463648A GB 2286875 A GB2286875 A GB 2286875A GB 2286875 A GB2286875 A GB 2286875A GB 1463648 A GB1463648 A GB 1463648A
- Authority
- GB
- United Kingdom
- Prior art keywords
- growth
- melt
- garnet
- furnace
- orthoferrite
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B19/00—Liquid-phase epitaxial-layer growth
- C30B19/06—Reaction chambers; Boats for supporting the melt; Substrate holders
- C30B19/061—Tipping system, e.g. by rotation
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B19/00—Liquid-phase epitaxial-layer growth
- C30B19/02—Liquid-phase epitaxial-layer growth using molten solvents, e.g. flux
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/16—Oxides
- C30B29/22—Complex oxides
- C30B29/28—Complex oxides with formula A3Me5O12 wherein A is a rare earth metal and Me is Fe, Ga, Sc, Cr, Co or Al, e.g. garnets
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Thin Magnetic Films (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Abstract
1463648 Garnet films INTERNATIONAL BUSINESS MACHINES CORP 23 May 1975 [29 Oct 1974] 22868/75 Heading C1J [Also in Division B1] Garnet films, suitable for bubble domain devices, are grown by isothermal epitaxial growth on a substrate from a fluxed melt containing orthoferrite crystals but which are prevented from reaching the substrate during the growth, the melt being saturated with respect to orthoferrite and supersaturated with respect to garnets, and the melt being replenished with garnet constituents by reheating after each film growth. Suitable apparatus, as shown in Fig. 5a, comprises a resistance furnace 20, a platinum boat 30 in which the flux growth occurs, a platinum mesh screen 34 to separate the boat into a nutrient region 36 and a growth region 38 and a substrate holder 40 for substrates 42. In operation garnet constituents are placed in the nutrient region 36 of the boat and the solvent ingredients added, the furnace tipped so that the substrate is free from solvent and the temperature of the furnace raised to dissolve the garnet constituents at about 300‹ C. above the growth temperature. The melt is then cooled slowly to the growth temperature whereupon orthoferrite crystallises out of the melt. The furnace is then tipped to flow the melt solution 46 over the substrates and as the melt is supersaturated with respect to garnet epitaxial growth occurs, the orthoferrites crystals being prevented from reaching the growth region 38 by the screen 34. After completion of growth the furnace is tilted back and the melt reheated to dissolve the orthoferrite crystals, thus replenishing the garnet nutrient ready for further growth on new substrates. The growth of the Eu Y iron garnets is referred to in examples.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US51883174A | 1974-10-29 | 1974-10-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1463648A true GB1463648A (en) | 1977-02-02 |
Family
ID=24065695
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB2286875A Expired GB1463648A (en) | 1974-10-29 | 1975-05-23 | Film growth process |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPS546033B2 (en) |
CA (1) | CA1055818A (en) |
DE (1) | DE2541140A1 (en) |
FR (1) | FR2289235A1 (en) |
GB (1) | GB1463648A (en) |
IT (1) | IT1042727B (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58154262U (en) * | 1982-04-12 | 1983-10-15 | 株式会社日立製作所 | elevator control panel |
JPS60124724A (en) * | 1983-12-12 | 1985-07-03 | Hitachi Ltd | Touch panel input device |
JPS60167024A (en) * | 1984-02-08 | 1985-08-30 | Omron Tateisi Electronics Co | Key input device equipped with touch panel |
DE3731010A1 (en) * | 1987-09-16 | 1989-03-30 | Telefunken Electronic Gmbh | Process for liquid-phase epitaxy |
JPH01320520A (en) * | 1988-06-23 | 1989-12-26 | Toshiba Corp | Method for controlling input of touch screen device |
JPH07168669A (en) * | 1994-12-02 | 1995-07-04 | Hitachi Ltd | Touch panel input device |
DE10241703A1 (en) * | 2002-09-09 | 2004-03-18 | Vishay Semiconductor Gmbh | Reactor for carrying liquid phase epitaxial growth on semiconductor substrates comprises a growing chamber having an intermediate storage region for temporarily storing melts and a growing region for holding a substrate |
-
1975
- 1975-05-23 GB GB2286875A patent/GB1463648A/en not_active Expired
- 1975-07-03 FR FR7521482A patent/FR2289235A1/en active Granted
- 1975-09-16 DE DE19752541140 patent/DE2541140A1/en not_active Withdrawn
- 1975-09-18 CA CA236,448A patent/CA1055818A/en not_active Expired
- 1975-09-23 IT IT27532/75A patent/IT1042727B/en active
- 1975-10-15 JP JP12333975A patent/JPS546033B2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
FR2289235B1 (en) | 1977-07-22 |
JPS546033B2 (en) | 1979-03-23 |
JPS5165085A (en) | 1976-06-05 |
DE2541140A1 (en) | 1976-05-13 |
CA1055818A (en) | 1979-06-05 |
IT1042727B (en) | 1980-01-30 |
FR2289235A1 (en) | 1976-05-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |