GB1418216A - Photosensitive polymers and photosensitive compositions and plates comprising such polymers - Google Patents

Photosensitive polymers and photosensitive compositions and plates comprising such polymers

Info

Publication number
GB1418216A
GB1418216A GB4771973A GB4771973A GB1418216A GB 1418216 A GB1418216 A GB 1418216A GB 4771973 A GB4771973 A GB 4771973A GB 4771973 A GB4771973 A GB 4771973A GB 1418216 A GB1418216 A GB 1418216A
Authority
GB
United Kingdom
Prior art keywords
polymers
photosensitive
hydroxy
methacryl
reacting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4771973A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Publication of GB1418216A publication Critical patent/GB1418216A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
GB4771973A 1972-10-17 1973-10-12 Photosensitive polymers and photosensitive compositions and plates comprising such polymers Expired GB1418216A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47103216A JPS5024641B2 (US06653308-20031125-C00199.png) 1972-10-17 1972-10-17

Publications (1)

Publication Number Publication Date
GB1418216A true GB1418216A (en) 1975-12-17

Family

ID=14348293

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4771973A Expired GB1418216A (en) 1972-10-17 1973-10-12 Photosensitive polymers and photosensitive compositions and plates comprising such polymers

Country Status (4)

Country Link
US (1) US3902906A (US06653308-20031125-C00199.png)
JP (1) JPS5024641B2 (US06653308-20031125-C00199.png)
DE (1) DE2352139C2 (US06653308-20031125-C00199.png)
GB (1) GB1418216A (US06653308-20031125-C00199.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7795363B2 (en) 2004-05-12 2010-09-14 Canon Kabushiki Kaisha Polymer having a sulfonic group or a sulfonate group and an amide group and method of producing same

Families Citing this family (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4139384A (en) * 1974-02-21 1979-02-13 Fuji Photo Film Co., Ltd. Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate
JPS538128A (en) * 1976-07-09 1978-01-25 Fuji Photo Film Co Ltd Photosolubilizable composition
US4359520A (en) * 1977-11-23 1982-11-16 International Business Machines Corporation Enhancement of resist development
JPS5488403A (en) * 1977-12-21 1979-07-13 Okamoto Kagaku Kogyo Kk Block sensitive layer for printing
US4229514A (en) * 1978-12-29 1980-10-21 Konishiroku Photo Industry Co., Ltd. Photosensitive composition
JPS55179186U (US06653308-20031125-C00199.png) * 1979-06-11 1980-12-23
JPS569740A (en) * 1979-07-05 1981-01-31 Fuji Photo Film Co Ltd Image forming method
JPS56122031A (en) * 1980-03-01 1981-09-25 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
JPS57210342A (en) * 1981-06-19 1982-12-23 Toppan Printing Co Ltd Manufacture of gravure plate
JPS58205147A (ja) * 1982-05-25 1983-11-30 Sumitomo Chem Co Ltd ポジ型フオトレジスト組成物
JPS59182444A (ja) * 1983-04-01 1984-10-17 Sumitomo Chem Co Ltd ポジ型フオトレジストの改良現像液
GB8430377D0 (en) * 1984-12-01 1985-01-09 Ciba Geigy Ag Modified phenolic resins
JPS6217587U (US06653308-20031125-C00199.png) * 1985-07-12 1987-02-02
US4732836A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
US5162510A (en) * 1986-05-02 1992-11-10 Hoechst Celanese Corporation Process for the preparation of photosensitive compositions containing a mixed ester o-quinone photosensitizer
US4902785A (en) * 1986-05-02 1990-02-20 Hoechst Celanese Corporation Phenolic photosensitizers containing quinone diazide and acidic halide substituents
US5035976A (en) * 1986-05-02 1991-07-30 Hoechst Celanese Corporation Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents
US4732837A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
JPS63198046A (ja) * 1987-02-13 1988-08-16 Konica Corp 耐処理薬品性及びインキ着肉性に優れた感光性組成物
EP0287212B1 (en) * 1987-03-12 1994-12-28 Mitsubishi Chemical Corporation Positive photosensitive planographic printing plate
JPH07119374B2 (ja) * 1987-11-06 1995-12-20 関西ペイント株式会社 ポジ型感光性カチオン電着塗料組成物
DE3820699A1 (de) * 1988-06-18 1989-12-21 Hoechst Ag Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
JP2865147B2 (ja) * 1990-06-20 1999-03-08 関西ペイント株式会社 ポジ型感光性電着塗料組成物
DE4106357A1 (de) * 1991-02-28 1992-09-03 Hoechst Ag Strahlungsempfindliche polymere mit 2-diazo-1,3-dicarbonyl-gruppen, verfahren zu deren herstellung und verwendung in einem positiv arbeitenden aufzeichnungsmaterial
DE4106356A1 (de) * 1991-02-28 1992-09-03 Hoechst Ag Strahlungsempfindliche polymere mit naphthochinon-2-diazid-4-sulfonyl-gruppen und deren verwendung in einem positiv arbeitenden aufzeichnungsmaterial
JP3064595B2 (ja) * 1991-04-26 2000-07-12 住友化学工業株式会社 ポジ型レジスト組成物
US5223373A (en) * 1991-04-29 1993-06-29 Industrial Technology Research Institute Positive working photosensitive composition and photosensitive electrodeposition composition prepared therefrom
US5229245A (en) * 1991-07-26 1993-07-20 Industrial Technology Research Institute Positively working photosensitive composition
US5445919A (en) * 1993-06-14 1995-08-29 Fuji Photo Film Co., Ltd. Photopolymerizable composition
JP3503839B2 (ja) * 1994-05-25 2004-03-08 富士写真フイルム株式会社 ポジ型感光性組成物
EP0825927B1 (en) 1996-04-23 1999-08-11 Kodak Polychrome Graphics Company Ltd. Lithographic printing form precursor and its use by heat imaging
US5858626A (en) * 1996-09-30 1999-01-12 Kodak Polychrome Graphics Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
US5705322A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Method of providing an image using a negative-working infrared photosensitive element
US5705308A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Infrared-sensitive, negative-working diazonaphthoquinone imaging composition and element
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
ATE204388T1 (de) 1997-07-05 2001-09-15 Kodak Polychrome Graphics Llc Bilderzeugungsverfahren
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
DE69941227D1 (de) 1998-04-06 2009-09-17 Fujifilm Corp Photoempfindliche Harzzusammensetzung
JP4996060B2 (ja) * 2004-05-12 2012-08-08 キヤノン株式会社 スルホン酸エステル基と、アミド基を有するポリマーを含む荷電制御剤、それを用いた静電荷像現像用トナー、画像形成方法および画像形成装置
JP4500160B2 (ja) * 2004-12-24 2010-07-14 大阪有機化学工業株式会社 アミドフェノールの製造法
JP5300271B2 (ja) * 2008-01-21 2013-09-25 キヤノン株式会社 スルホン酸エステル基とアミド基を有する重合体の製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE500222A (US06653308-20031125-C00199.png) * 1949-07-23
DE938233C (de) * 1953-03-11 1956-01-26 Kalle & Co Ag Lichtempfindliches Material fuer die photomechanische Herstellung von Druckformen
NL255517A (US06653308-20031125-C00199.png) * 1959-09-04
DE1447592A1 (de) * 1964-12-24 1969-02-13 Agfa Gevaert Ag Lichtvernetzbare Schichten
GB1136544A (en) * 1966-02-28 1968-12-11 Agfa Gevaert Nv Photochemical cross-linking of polymers
US3579343A (en) * 1967-04-25 1971-05-18 Konishiroku Photo Ind Photoresist-forming compositions
US3647443A (en) * 1969-09-12 1972-03-07 Eastman Kodak Co Light-sensitive quinone diazide polymers and polymer compositions
US3687663A (en) * 1970-05-19 1972-08-29 Ind Dyestuff Co Diazo-oxides of sulfonic acid amides and/or esters and photographic element and use thereof
US3644118A (en) * 1970-08-31 1972-02-22 Ibm Polydiacrylyl photosensitive compositions
US3759711A (en) * 1970-09-16 1973-09-18 Eastman Kodak Co Er compositions and elements nitrogen linked apperding quinone diazide light sensitive vinyl polym

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7795363B2 (en) 2004-05-12 2010-09-14 Canon Kabushiki Kaisha Polymer having a sulfonic group or a sulfonate group and an amide group and method of producing same
US8178271B2 (en) 2004-05-12 2012-05-15 Canon Kabushiki Kaisha Polymer having a sulfonic group or a sulfonate group and an amide group and method of producing same

Also Published As

Publication number Publication date
JPS5024641B2 (US06653308-20031125-C00199.png) 1975-08-18
DE2352139A1 (de) 1974-04-25
JPS4962203A (US06653308-20031125-C00199.png) 1974-06-17
US3902906A (en) 1975-09-02
DE2352139C2 (de) 1983-01-20

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee