GB1370387A - Electrochemical solutions and process - Google Patents
Electrochemical solutions and processInfo
- Publication number
- GB1370387A GB1370387A GB5243972A GB5243972A GB1370387A GB 1370387 A GB1370387 A GB 1370387A GB 5243972 A GB5243972 A GB 5243972A GB 5243972 A GB5243972 A GB 5243972A GB 1370387 A GB1370387 A GB 1370387A
- Authority
- GB
- United Kingdom
- Prior art keywords
- ligand
- phosphonate
- metal ion
- metal
- nov
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Chemically Coating (AREA)
Abstract
1370387 Plating bath MONSANTO CO 14 Nov 1972 [15 Nov 1971(2)] 52439/72 Heading C7B A plating bath comprises an aqueous solution of an ethylenediamine tetra (methylene=phosphonate) ligand and a complex of a metal ion and a 1-hydroxy ethylidene-1, 1-diphosphonate ligand. It may also comprise a complex of a metal ion and an amino tri (methylene=phosphonate) ligand. O II The phosphonate group may be -P(OM) 2 where M=hydrogen, alkali metal, ammonium or alkyl ammonium. The metal ion may be Ag, Au, Cu, Sn, Fe, Ni, Zn, Co or Cd. The metal may comprise 0À1-5À0 wt per cent of the solution. Both additions may be buffers, levelling agents and brighteners such as selenites, arsenites, aldehydes and ketones. The pH may be 6-13 Cu/ Ni or Cu/Zn may be co-deposited. The substrate may be Zn, Fe, brass, steel or Al.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US19902871A | 1971-11-15 | 1971-11-15 | |
US19903671A | 1971-11-15 | 1971-11-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1370387A true GB1370387A (en) | 1974-10-16 |
Family
ID=26894390
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB5243972A Expired GB1370387A (en) | 1971-11-15 | 1972-11-14 | Electrochemical solutions and process |
Country Status (7)
Country | Link |
---|---|
US (2) | US3706635A (en) |
JP (1) | JPS568113B2 (en) |
BE (1) | BE791401A (en) |
CA (1) | CA1009177A (en) |
DE (1) | DE2255728C2 (en) |
FR (1) | FR2160458B1 (en) |
GB (1) | GB1370387A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2133040A (en) * | 1983-01-03 | 1984-07-18 | Omi Int Corp | Copper plating bath process and anode therefore |
USH325H (en) | 1980-07-30 | 1987-09-01 | Richardson Chemical Company | Electroless deposition of transition metals |
Families Citing this family (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3914162A (en) * | 1973-06-25 | 1975-10-21 | Monsanto Co | Compositions and process for the electrodeposition of metals |
DE2333127C2 (en) * | 1973-06-29 | 1982-04-15 | Wabco Fahrzeugbremsen Gmbh, 3000 Hannover | Anti-lock control system for pressure medium-actuated vehicle brakes |
FR2244708B1 (en) * | 1973-09-25 | 1977-08-12 | Ugine Kuhlmann | |
USRE31511E (en) | 1978-08-07 | 1984-01-31 | The Robbins Company | Rotary cutterhead for an earth boring machine |
US4193637A (en) * | 1978-08-07 | 1980-03-18 | The Robbins Company | Rotary cutterhead for an earth boring machine |
US4197172A (en) * | 1979-04-05 | 1980-04-08 | American Chemical & Refining Company Incorporated | Gold plating composition and method |
US4265715A (en) * | 1979-07-13 | 1981-05-05 | Oxy Metal Industries Corporation | Silver electrodeposition process |
US4253920A (en) * | 1980-03-20 | 1981-03-03 | American Chemical & Refining Company, Incorporated | Composition and method for gold plating |
US4396471A (en) * | 1981-12-14 | 1983-08-02 | American Chemical & Refining Company, Inc. | Gold plating bath and method using maleic anhydride polymer chelate |
US4469569A (en) * | 1983-01-03 | 1984-09-04 | Omi International Corporation | Cyanide-free copper plating process |
US4935065A (en) * | 1986-08-22 | 1990-06-19 | Ecolab Inc. | Phosphate-free alkaline detergent for cleaning-in-place of food processing equipment |
US4904354A (en) * | 1987-04-08 | 1990-02-27 | Learonal Inc. | Akaline cyanide-free Cu-Zu strike baths and electrodepositing processes for the use thereof |
US4933051A (en) * | 1989-07-24 | 1990-06-12 | Omi International Corporation | Cyanide-free copper plating process |
US5559035A (en) * | 1992-08-24 | 1996-09-24 | Umpqua Research Company | Solid phase calibration standards |
US5266212A (en) * | 1992-10-13 | 1993-11-30 | Enthone-Omi, Inc. | Purification of cyanide-free copper plating baths |
US5607570A (en) * | 1994-10-31 | 1997-03-04 | Rohbani; Elias | Electroplating solution |
US5736256A (en) * | 1995-05-31 | 1998-04-07 | Howard A. Fromson | Lithographic printing plate treated with organo-phosphonic acid chelating compounds and processes relating thereto |
US5683568A (en) * | 1996-03-29 | 1997-11-04 | University Of Tulsa | Electroplating bath for nickel-iron alloys and method |
JP2943691B2 (en) * | 1996-04-25 | 1999-08-30 | 日本電気株式会社 | Plasma processing equipment |
US6921467B2 (en) | 1996-07-15 | 2005-07-26 | Semitool, Inc. | Processing tools, components of processing tools, and method of making and using same for electrochemical processing of microelectronic workpieces |
US7244677B2 (en) | 1998-02-04 | 2007-07-17 | Semitool. Inc. | Method for filling recessed micro-structures with metallization in the production of a microelectronic device |
US6565729B2 (en) | 1998-03-20 | 2003-05-20 | Semitool, Inc. | Method for electrochemically depositing metal on a semiconductor workpiece |
TWI223678B (en) * | 1998-03-20 | 2004-11-11 | Semitool Inc | Process for applying a metal structure to a workpiece, the treated workpiece and a solution for electroplating copper |
US6497801B1 (en) * | 1998-07-10 | 2002-12-24 | Semitool Inc | Electroplating apparatus with segmented anode array |
US7438788B2 (en) | 1999-04-13 | 2008-10-21 | Semitool, Inc. | Apparatus and methods for electrochemical processing of microelectronic workpieces |
US7351314B2 (en) | 2003-12-05 | 2008-04-01 | Semitool, Inc. | Chambers, systems, and methods for electrochemically processing microfeature workpieces |
US7585398B2 (en) | 1999-04-13 | 2009-09-08 | Semitool, Inc. | Chambers, systems, and methods for electrochemically processing microfeature workpieces |
JP4288010B2 (en) | 1999-04-13 | 2009-07-01 | セミトゥール・インコーポレイテッド | Workpiece processing apparatus having a processing chamber for improving the flow of processing fluid |
US7264698B2 (en) | 1999-04-13 | 2007-09-04 | Semitool, Inc. | Apparatus and methods for electrochemical processing of microelectronic workpieces |
US6916412B2 (en) * | 1999-04-13 | 2005-07-12 | Semitool, Inc. | Adaptable electrochemical processing chamber |
US7020537B2 (en) | 1999-04-13 | 2006-03-28 | Semitool, Inc. | Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece |
US7351315B2 (en) | 2003-12-05 | 2008-04-01 | Semitool, Inc. | Chambers, systems, and methods for electrochemically processing microfeature workpieces |
US7189318B2 (en) | 1999-04-13 | 2007-03-13 | Semitool, Inc. | Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece |
US7160421B2 (en) * | 1999-04-13 | 2007-01-09 | Semitool, Inc. | Turning electrodes used in a reactor for electrochemically processing a microelectronic workpiece |
AU2001282879A1 (en) | 2000-07-08 | 2002-01-21 | Semitool, Inc. | Methods and apparatus for processing microelectronic workpieces using metrology |
WO2003018874A2 (en) | 2001-08-31 | 2003-03-06 | Semitool, Inc. | Apparatus and methods for electrochemical processing of microelectronic workpieces |
US6974767B1 (en) * | 2002-02-21 | 2005-12-13 | Advanced Micro Devices, Inc. | Chemical solution for electroplating a copper-zinc alloy thin film |
US6893505B2 (en) * | 2002-05-08 | 2005-05-17 | Semitool, Inc. | Apparatus and method for regulating fluid flows, such as flows of electrochemical processing fluids |
US20060076036A1 (en) * | 2004-10-12 | 2006-04-13 | Whitefield Bruce J | Metal removal from solvent |
DE502007002479D1 (en) * | 2007-02-14 | 2010-02-11 | Umicore Galvanotechnik Gmbh | Copper-tin electrolyte and process for the deposition of bronze layers |
JP5554121B2 (en) * | 2010-03-31 | 2014-07-23 | 富士フイルム株式会社 | Polishing liquid and polishing method |
DE102013021502A1 (en) * | 2013-12-19 | 2015-06-25 | Schlenk Metallfolien Gmbh & Co. Kg | Electrically conductive fluids based on metal diphosphonate complexes |
US20160145756A1 (en) * | 2014-11-21 | 2016-05-26 | Rohm And Haas Electronic Materials Llc | Environmentally friendly gold electroplating compositions and methods |
US11618951B2 (en) | 2020-05-27 | 2023-04-04 | Global Circuit Innovations Incorporated | Chemical evaporation control system |
RU2762733C1 (en) * | 2021-02-18 | 2021-12-22 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Российский химико-технологический университет имени Д.И. Менделеева" (РХТУ им. Д.И. Менделеева) | Solution for chemical nickeling of metal products |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1458492A (en) * | 1964-09-22 | 1966-03-04 | Monsanto Co | Compositions and process for electrochemical reactions, in particular electroplating, as well as articles conforming to those obtained |
DE1496916B1 (en) * | 1964-09-22 | 1969-10-23 | Monsanto Co | Cyanide-free, galvanic bath and process for the deposition of galvanic coatings |
FR1539226A (en) * | 1966-09-16 | 1968-09-13 | Process for producing deposits of gold or a gold-based alloy | |
FR96342E (en) * | 1967-12-09 | 1972-06-16 | ||
DE1909144B2 (en) * | 1969-02-20 | 1977-09-08 | Schering Ag, 1000 Berlin Und 4619 Bergkamen | BATH FOR GALVANIC DEPOSITION OF GLAZING GOLD ALLOY DEPOSIT |
CA965729A (en) * | 1969-05-15 | 1975-04-08 | Fred I. Nobel | Cyanide free electroplating solutions |
-
0
- BE BE791401D patent/BE791401A/en not_active IP Right Cessation
-
1971
- 1971-11-15 US US199036A patent/US3706635A/en not_active Expired - Lifetime
- 1971-11-15 US US199028A patent/US3706634A/en not_active Expired - Lifetime
-
1972
- 1972-11-14 DE DE2255728A patent/DE2255728C2/en not_active Expired
- 1972-11-14 GB GB5243972A patent/GB1370387A/en not_active Expired
- 1972-11-14 FR FR7240384A patent/FR2160458B1/fr not_active Expired
- 1972-11-14 JP JP11420272A patent/JPS568113B2/ja not_active Expired
- 1972-11-14 CA CA156,727A patent/CA1009177A/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USH325H (en) | 1980-07-30 | 1987-09-01 | Richardson Chemical Company | Electroless deposition of transition metals |
GB2133040A (en) * | 1983-01-03 | 1984-07-18 | Omi Int Corp | Copper plating bath process and anode therefore |
Also Published As
Publication number | Publication date |
---|---|
FR2160458B1 (en) | 1975-01-03 |
JPS4861337A (en) | 1973-08-28 |
US3706634A (en) | 1972-12-19 |
BE791401A (en) | 1973-05-14 |
DE2255728C2 (en) | 1982-07-01 |
JPS568113B2 (en) | 1981-02-21 |
DE2255728A1 (en) | 1973-05-24 |
CA1009177A (en) | 1977-04-26 |
US3706635A (en) | 1972-12-19 |
FR2160458A1 (en) | 1973-06-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PCNP | Patent ceased through non-payment of renewal fee |