GB1368515A - Semiconductor detecotrs - Google Patents
Semiconductor detecotrsInfo
- Publication number
- GB1368515A GB1368515A GB1129572A GB1129572A GB1368515A GB 1368515 A GB1368515 A GB 1368515A GB 1129572 A GB1129572 A GB 1129572A GB 1129572 A GB1129572 A GB 1129572A GB 1368515 A GB1368515 A GB 1368515A
- Authority
- GB
- United Kingdom
- Prior art keywords
- mask
- gold
- vacuum
- central electrode
- disc
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 title 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract 4
- 239000010931 gold Substances 0.000 abstract 4
- 229910052737 gold Inorganic materials 0.000 abstract 4
- 229910000831 Steel Inorganic materials 0.000 abstract 3
- 239000010959 steel Substances 0.000 abstract 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 2
- 230000015572 biosynthetic process Effects 0.000 abstract 2
- 230000007423 decrease Effects 0.000 abstract 2
- 229910002804 graphite Inorganic materials 0.000 abstract 2
- 239000010439 graphite Substances 0.000 abstract 2
- 229910052710 silicon Inorganic materials 0.000 abstract 2
- 239000010703 silicon Substances 0.000 abstract 2
- 238000001771 vacuum deposition Methods 0.000 abstract 2
- 229910015365 Au—Si Inorganic materials 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 230000005496 eutectics Effects 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 230000000873 masking effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/482—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body
- H01L23/485—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body consisting of layered constructions comprising conductive layers and insulating layers, e.g. planar contacts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Electromagnetism (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Light Receiving Elements (AREA)
Abstract
1368515 Vacuum-coating with gold COMMISSARIAT A L'ENERGIE ATOMIQUE 10 March 1972 [15 March 1971] 11295/72 Heading C7F [Also in Division H1] A silicon wafer 1 mounted in a graphite casing 15 within a steel tube 16 is provided with concentric disc and annular gold electrodes (not shown) by vacuum deposition. The apparatus shown is being used for the formation of the annular electrode subsequent to the deposition of the central electrode which is here masked by a steel disc 22 spaced from the wafer by a glass ring 23 but held in place by the action of a magnet 24. The masks 21, 25 are of gold-coated silicon. The upper mask acts to define the source of gold (from evaporated filament 18) and the tapered edge (ca 45 degrees) of the lower mask 25 ensures that the thickness of the deposited annular electrode decreases towards its outer and inner peripheries. The initial formation of the central electrode occurs in the absence of the steel masking disc 22 and with a mask 19 Fig. 2 (not shown) instead of mask 25, mask 19 being similar to mask 25 but having a smaller aperture. The bevel of mask 19 ensures that the thickness of the central electrode also decreases towards its edge. The initial vacuum is 5.10<SP>-5</SP> torr and the graphite block is held at 350‹ C, below the Au-Si eutectic temperature.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7108894A FR2129814B1 (en) | 1971-03-15 | 1971-03-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1368515A true GB1368515A (en) | 1974-09-25 |
Family
ID=9073515
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1129572A Expired GB1368515A (en) | 1971-03-15 | 1972-03-10 | Semiconductor detecotrs |
Country Status (5)
Country | Link |
---|---|
BE (1) | BE780596A (en) |
DE (1) | DE2212267A1 (en) |
FR (1) | FR2129814B1 (en) |
GB (1) | GB1368515A (en) |
IT (1) | IT952974B (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102253402A (en) * | 2011-05-26 | 2011-11-23 | 张阳 | Special charge sensitive amplifying circuit for gold silicon surface barrier semiconductor detector |
CN113921646A (en) * | 2021-09-30 | 2022-01-11 | 厦门市三安集成电路有限公司 | Single-photon detector, manufacturing method thereof and single-photon detector array |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB916379A (en) * | 1960-05-23 | 1963-01-23 | Ass Elect Ind | Improvements in and relating to semiconductor junction units |
-
1971
- 1971-03-15 FR FR7108894A patent/FR2129814B1/fr not_active Expired
-
1972
- 1972-03-10 GB GB1129572A patent/GB1368515A/en not_active Expired
- 1972-03-13 BE BE780596A patent/BE780596A/en unknown
- 1972-03-14 IT IT6780272A patent/IT952974B/en active
- 1972-03-14 DE DE19722212267 patent/DE2212267A1/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102253402A (en) * | 2011-05-26 | 2011-11-23 | 张阳 | Special charge sensitive amplifying circuit for gold silicon surface barrier semiconductor detector |
CN113921646A (en) * | 2021-09-30 | 2022-01-11 | 厦门市三安集成电路有限公司 | Single-photon detector, manufacturing method thereof and single-photon detector array |
Also Published As
Publication number | Publication date |
---|---|
BE780596A (en) | 1972-07-03 |
FR2129814B1 (en) | 1976-04-16 |
DE2212267A1 (en) | 1972-09-28 |
FR2129814A1 (en) | 1972-11-03 |
IT952974B (en) | 1973-07-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PLNP | Patent lapsed through nonpayment of renewal fees |