GB1367940A - Beam alignment device for a particle beam - Google Patents

Beam alignment device for a particle beam

Info

Publication number
GB1367940A
GB1367940A GB3962671A GB3962671A GB1367940A GB 1367940 A GB1367940 A GB 1367940A GB 3962671 A GB3962671 A GB 3962671A GB 3962671 A GB3962671 A GB 3962671A GB 1367940 A GB1367940 A GB 1367940A
Authority
GB
United Kingdom
Prior art keywords
deflection
alignment
coils
planes
axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3962671A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philips Electronics UK Ltd
Original Assignee
Philips Electronic and Associated Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Electronic and Associated Industries Ltd filed Critical Philips Electronic and Associated Industries Ltd
Publication of GB1367940A publication Critical patent/GB1367940A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
GB3962671A 1970-08-27 1971-08-24 Beam alignment device for a particle beam Expired GB1367940A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7012671A NL7012671A (enrdf_load_stackoverflow) 1970-08-27 1970-08-27

Publications (1)

Publication Number Publication Date
GB1367940A true GB1367940A (en) 1974-09-25

Family

ID=19810865

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3962671A Expired GB1367940A (en) 1970-08-27 1971-08-24 Beam alignment device for a particle beam

Country Status (6)

Country Link
US (1) US3777211A (enrdf_load_stackoverflow)
CA (1) CA946985A (enrdf_load_stackoverflow)
DE (1) DE2138766A1 (enrdf_load_stackoverflow)
FR (1) FR2106022A5 (enrdf_load_stackoverflow)
GB (1) GB1367940A (enrdf_load_stackoverflow)
NL (1) NL7012671A (enrdf_load_stackoverflow)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4376249A (en) * 1980-11-06 1983-03-08 International Business Machines Corporation Variable axis electron beam projection system
DE3138896A1 (de) * 1981-09-30 1983-04-14 Siemens AG, 1000 Berlin und 8000 München Elektronenoptisches system mit vario-formstrahl zur erzeugung und messung von mikrostrukturen
US5949076A (en) * 1996-02-26 1999-09-07 Kabushiki Kaisha Toshiba Charged beam applying apparatus
WO2002103337A2 (en) * 2001-06-15 2002-12-27 Ebara Corporation Electron beam apparatus and method for using said apparatus
DE60204690T2 (de) * 2002-09-18 2006-05-18 Staib Instrumente Gmbh Elektronenbeugungsvorrichtung zur Anwendung in einer Produktionsumgebung und für Hochdruck-Abscheidungsverfahren
US9159527B2 (en) 2003-10-16 2015-10-13 Carl Zeiss Microscopy, Llc Systems and methods for a gas field ionization source
US8110814B2 (en) 2003-10-16 2012-02-07 Alis Corporation Ion sources, systems and methods
US7786451B2 (en) 2003-10-16 2010-08-31 Alis Corporation Ion sources, systems and methods
US7786452B2 (en) 2003-10-16 2010-08-31 Alis Corporation Ion sources, systems and methods
US7804068B2 (en) 2006-11-15 2010-09-28 Alis Corporation Determining dopant information
WO2010039339A2 (en) * 2008-09-30 2010-04-08 Carl Zeiss Smt Inc. Aligning charged particle beams
WO2011058833A1 (ja) * 2009-11-10 2011-05-19 三菱電機株式会社 粒子線照射システムおよび粒子線照射方法
JP5364112B2 (ja) 2011-01-25 2013-12-11 株式会社日立ハイテクノロジーズ 荷電粒子線装置
FR3123597B1 (fr) 2021-06-08 2023-04-21 Psa Automobiles Sa Sous-ensemble compact pour groupe electromoteur de vehicules automobiles

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2418349A (en) * 1945-12-13 1947-04-01 Rca Corp Method of and means for correcting for distortion in electron lens systems
GB687207A (en) * 1950-02-23 1953-02-11 Vickers Electrical Co Ltd Improvements relating to electron microscopes
US3371206A (en) * 1964-02-04 1968-02-27 Jeol Ltd Electron beam apparatus having compensating means for triangular beam distortion
DE1299088C2 (de) * 1966-06-10 1974-10-17 Siemens AG, Berlin und München, 8000 München Ablenkeinrichtung fuer den korpuskularstrahl in einem korpuskularstrahlgeraet, insbesondere elektronenmikroskop
US3588586A (en) * 1968-04-26 1971-06-28 Jeol Ltd Apparatus for correcting electron beam deflection

Also Published As

Publication number Publication date
NL7012671A (enrdf_load_stackoverflow) 1972-02-29
FR2106022A5 (enrdf_load_stackoverflow) 1972-04-28
DE2138766A1 (de) 1972-03-02
CA946985A (en) 1974-05-07
US3777211A (en) 1973-12-04

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee