NL7012671A - - Google Patents

Info

Publication number
NL7012671A
NL7012671A NL7012671A NL7012671A NL7012671A NL 7012671 A NL7012671 A NL 7012671A NL 7012671 A NL7012671 A NL 7012671A NL 7012671 A NL7012671 A NL 7012671A NL 7012671 A NL7012671 A NL 7012671A
Authority
NL
Netherlands
Application number
NL7012671A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to NL7012671A priority Critical patent/NL7012671A/xx
Priority to DE19712138766 priority patent/DE2138766A1/de
Priority to GB3962671A priority patent/GB1367940A/en
Priority to CA121,181A priority patent/CA946985A/en
Priority to US00174887A priority patent/US3777211A/en
Priority to FR7130831A priority patent/FR2106022A5/fr
Publication of NL7012671A publication Critical patent/NL7012671A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
NL7012671A 1970-08-27 1970-08-27 NL7012671A (enrdf_load_stackoverflow)

Priority Applications (6)

Application Number Priority Date Filing Date Title
NL7012671A NL7012671A (enrdf_load_stackoverflow) 1970-08-27 1970-08-27
DE19712138766 DE2138766A1 (de) 1970-08-27 1971-08-03 Einstellanordnung fur einen Teilchen strahl
GB3962671A GB1367940A (en) 1970-08-27 1971-08-24 Beam alignment device for a particle beam
CA121,181A CA946985A (en) 1970-08-27 1971-08-24 Adjusting device for a particle beam
US00174887A US3777211A (en) 1970-08-27 1971-08-25 Adjusting device for a particle beam
FR7130831A FR2106022A5 (enrdf_load_stackoverflow) 1970-08-27 1971-08-25

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7012671A NL7012671A (enrdf_load_stackoverflow) 1970-08-27 1970-08-27

Publications (1)

Publication Number Publication Date
NL7012671A true NL7012671A (enrdf_load_stackoverflow) 1972-02-29

Family

ID=19810865

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7012671A NL7012671A (enrdf_load_stackoverflow) 1970-08-27 1970-08-27

Country Status (6)

Country Link
US (1) US3777211A (enrdf_load_stackoverflow)
CA (1) CA946985A (enrdf_load_stackoverflow)
DE (1) DE2138766A1 (enrdf_load_stackoverflow)
FR (1) FR2106022A5 (enrdf_load_stackoverflow)
GB (1) GB1367940A (enrdf_load_stackoverflow)
NL (1) NL7012671A (enrdf_load_stackoverflow)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4376249A (en) * 1980-11-06 1983-03-08 International Business Machines Corporation Variable axis electron beam projection system
DE3138896A1 (de) * 1981-09-30 1983-04-14 Siemens AG, 1000 Berlin und 8000 München Elektronenoptisches system mit vario-formstrahl zur erzeugung und messung von mikrostrukturen
US5949076A (en) * 1996-02-26 1999-09-07 Kabushiki Kaisha Toshiba Charged beam applying apparatus
WO2002103337A2 (en) * 2001-06-15 2002-12-27 Ebara Corporation Electron beam apparatus and method for using said apparatus
DE60204690T2 (de) * 2002-09-18 2006-05-18 Staib Instrumente Gmbh Elektronenbeugungsvorrichtung zur Anwendung in einer Produktionsumgebung und für Hochdruck-Abscheidungsverfahren
US9159527B2 (en) 2003-10-16 2015-10-13 Carl Zeiss Microscopy, Llc Systems and methods for a gas field ionization source
US8110814B2 (en) 2003-10-16 2012-02-07 Alis Corporation Ion sources, systems and methods
US7786451B2 (en) 2003-10-16 2010-08-31 Alis Corporation Ion sources, systems and methods
US7786452B2 (en) 2003-10-16 2010-08-31 Alis Corporation Ion sources, systems and methods
US7804068B2 (en) 2006-11-15 2010-09-28 Alis Corporation Determining dopant information
WO2010039339A2 (en) * 2008-09-30 2010-04-08 Carl Zeiss Smt Inc. Aligning charged particle beams
WO2011058833A1 (ja) * 2009-11-10 2011-05-19 三菱電機株式会社 粒子線照射システムおよび粒子線照射方法
JP5364112B2 (ja) 2011-01-25 2013-12-11 株式会社日立ハイテクノロジーズ 荷電粒子線装置
FR3123597B1 (fr) 2021-06-08 2023-04-21 Psa Automobiles Sa Sous-ensemble compact pour groupe electromoteur de vehicules automobiles

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2418349A (en) * 1945-12-13 1947-04-01 Rca Corp Method of and means for correcting for distortion in electron lens systems
GB687207A (en) * 1950-02-23 1953-02-11 Vickers Electrical Co Ltd Improvements relating to electron microscopes
US3371206A (en) * 1964-02-04 1968-02-27 Jeol Ltd Electron beam apparatus having compensating means for triangular beam distortion
DE1299088C2 (de) * 1966-06-10 1974-10-17 Siemens AG, Berlin und München, 8000 München Ablenkeinrichtung fuer den korpuskularstrahl in einem korpuskularstrahlgeraet, insbesondere elektronenmikroskop
US3588586A (en) * 1968-04-26 1971-06-28 Jeol Ltd Apparatus for correcting electron beam deflection

Also Published As

Publication number Publication date
FR2106022A5 (enrdf_load_stackoverflow) 1972-04-28
GB1367940A (en) 1974-09-25
DE2138766A1 (de) 1972-03-02
CA946985A (en) 1974-05-07
US3777211A (en) 1973-12-04

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