GB1350339A - Photosensitive compositions for relief structures - Google Patents

Photosensitive compositions for relief structures

Info

Publication number
GB1350339A
GB1350339A GB741672A GB741672A GB1350339A GB 1350339 A GB1350339 A GB 1350339A GB 741672 A GB741672 A GB 741672A GB 741672 A GB741672 A GB 741672A GB 1350339 A GB1350339 A GB 1350339A
Authority
GB
United Kingdom
Prior art keywords
weight
parts
methacrylate
glycol
hydrogen atom
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB741672A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Asahi Kasei Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd, Asahi Kasei Kogyo KK filed Critical Asahi Chemical Industry Co Ltd
Publication of GB1350339A publication Critical patent/GB1350339A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/01Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to unsaturated polyesters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
GB741672A 1971-03-11 1972-02-17 Photosensitive compositions for relief structures Expired GB1350339A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP46013009A JPS5033767B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1971-03-11 1971-03-11

Publications (1)

Publication Number Publication Date
GB1350339A true GB1350339A (en) 1974-04-18

Family

ID=11821156

Family Applications (1)

Application Number Title Priority Date Filing Date
GB741672A Expired GB1350339A (en) 1971-03-11 1972-02-17 Photosensitive compositions for relief structures

Country Status (7)

Country Link
US (1) US3794494A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS5033767B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CA (1) CA956166A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE2207209C3 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR2129360A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB1350339A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
IT (1) IT944098B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

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US3900325A (en) * 1972-06-12 1975-08-19 Shipley Co Light sensitive quinone diazide composition with n-3-oxohydrocarbon substituted acrylamide
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US4518677A (en) * 1978-01-04 1985-05-21 Hercules Incorporated Process for making printing plates
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CA1123649A (en) * 1978-06-22 1982-05-18 Norman E. Hughes Printing plates produced using a base layer with polymerization rate greater than that of the printing layer
US4198238A (en) * 1978-06-22 1980-04-15 Hercules Incorporated Photopolymerizable composition
DE2846647A1 (de) * 1978-10-26 1980-05-08 Basf Ag Photopolymerisierbare mischung fuer die herstellung von druck- und reliefformen
DE2933871A1 (de) * 1979-08-21 1981-03-12 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung hochwaermebestaendiger reliefstrukturen und deren verwendung.
DE2933805A1 (de) * 1979-08-21 1981-03-12 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung hochwaermebestaendiger reliefstrukturen und deren verwendung
US4332873A (en) * 1979-08-22 1982-06-01 Hercules Incorporated Multilayer printing plates and process for making same
EP0030213A1 (de) * 1979-11-29 1981-06-10 Ciba-Geigy Ag Durch Licht vernetzbare Schicht auf Druckformen und Verfahren zur Herstellung von Offset-Druckplatten
US4416974A (en) * 1979-12-05 1983-11-22 Hercules Incorporated Radiation curable ceramic pigment composition
US4306012A (en) * 1979-12-05 1981-12-15 Hercules Incorporated Process of radiation and heat treatment of printing medium
US4403566A (en) * 1980-06-23 1983-09-13 Hercules Incorporated Apparatus for producing a printing plate
US4475810A (en) * 1980-10-06 1984-10-09 Hercules Incorporated Docking sensor system
US4450226A (en) * 1981-10-26 1984-05-22 Hercules Incorporated Method and apparatus for producing a printing plate
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DE3536262A1 (de) * 1985-10-11 1987-04-16 Basf Ag Lagerstabile, in organischem loesemittel geloeste oder dispergierte vernetzbare zusammensetzungen, ihre herstellung und verwendung
DE3807929A1 (de) * 1988-03-10 1989-09-28 Basf Ag Verfahren zur herstellung von reliefformen
DE3908764C2 (de) * 1989-03-17 1994-08-11 Basf Ag Entwickler für die Herstellung photopolymerisierter flexographischer Reliefdruckformen
US5798019A (en) 1995-09-29 1998-08-25 E. I. Du Pont De Nemours And Company Methods and apparatus for forming cylindrical photosensitive elements
US5753414A (en) * 1995-10-02 1998-05-19 Macdermid Imaging Technology, Inc. Photopolymer plate having a peelable substrate
US6425327B1 (en) 1999-08-12 2002-07-30 E. I. Du Pont De Nemours And Company Method for forming a cylindrical photosensitive element
US6713646B2 (en) 2002-04-12 2004-03-30 Biosphere Medical Degradable crosslinkers, and degradable crosslinked hydrogels comprising them
US7838699B2 (en) * 2002-05-08 2010-11-23 Biosphere Medical Embolization using degradable crosslinked hydrogels
US6884905B2 (en) * 2002-07-23 2005-04-26 Biosphere Medical Degradable carbamate-containing bis(acryloyl) crosslinkers, and degradable crosslinked hydrogels comprising them
US8435603B2 (en) 2003-12-05 2013-05-07 Conductive Inkjet Technology Limited Formation of solid layers on substrates
WO2005084959A1 (en) 2004-03-03 2005-09-15 Kodak Il Ltd. Novel material for infrared laser ablated engraved flexographic printing plates
US8142987B2 (en) 2004-04-10 2012-03-27 Eastman Kodak Company Method of producing a relief image for printing
JP4342373B2 (ja) * 2004-04-30 2009-10-14 東京応化工業株式会社 凸版印刷用感光性印刷原版、凸版印刷版の製造方法、および該製造方法用遮光インク
JP2006003570A (ja) * 2004-06-16 2006-01-05 Tokyo Ohka Kogyo Co Ltd 印刷版製造用感光性組成物、並びに、これを用いた感光性印刷原版積層体および印刷版
JP2007015147A (ja) * 2005-07-05 2007-01-25 Tokyo Ohka Kogyo Co Ltd 凸版印刷用感光性積層印刷原版の製造方法、凸版印刷用感光性積層印刷原版、および凸版印刷版の製造方法
JP2007224093A (ja) * 2006-02-21 2007-09-06 Tokyo Ohka Kogyo Co Ltd 接着層形成用組成物、及びこれを用いた凸版印刷版、並びに凸版印刷版の製造方法
JP2011503336A (ja) 2007-11-19 2011-01-27 ビーエーエスエフ ソシエタス・ヨーロピア 凍結/融解安定性が向上したポリマー分散液を製造するための高分岐ポリマーの使用
NO2225337T3 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 2007-11-19 2018-01-20
CN102037034B (zh) 2008-03-20 2013-06-19 巴斯夫欧洲公司 包含含磷聚合物和乳化剂的聚合物分散体
DE102009026820A1 (de) * 2008-09-08 2010-03-11 Evonik Röhm Gmbh Funktionalisiertes (Meth)acrylatmonomer, Polymer, Beschichtungsmittel und Verfahren zur Herstellung und Vernetzung
PT2370516E (pt) 2008-12-01 2015-09-09 Basf Se Composição aquosa ligante contendo oligómeros
CN102471632B (zh) 2009-07-22 2014-12-03 巴斯夫欧洲公司 用作具有改善的火行为的灰泥和涂料的粘合剂的水性聚合物分散体
CN102612317B (zh) 2009-09-15 2015-07-01 巴斯夫欧洲公司 包含存在于混合网络中的抗微生物剂的水性分散体
EP2513154B1 (de) 2009-12-16 2015-02-25 Basf Se Verfahren zur herstellung wässriger hybridbindemittel mit niedrigem restmonomerengehalt sowie deren verwendung für hochglanzfarben
US8785557B2 (en) 2009-12-16 2014-07-22 Basf Se Use of aqueous hybrid binders for gloss paints
AU2011217272B2 (en) 2010-02-18 2015-07-02 Basf Se Polymer dispersion comprising a highly branched polycarbonate with unsaturated fatty acid groups
US8476000B2 (en) 2010-06-04 2013-07-02 Ryan Vest Method of producing a relief image from a liquid photopolymer resin
CN103270061B (zh) 2010-12-21 2016-04-06 巴斯夫欧洲公司 多段聚合物分散体及其制造方法和用途
US8754151B2 (en) 2010-12-21 2014-06-17 Basf Se Multistage polymer dispersions, processes for preparing them, and use thereof
EP2636714A1 (de) 2012-03-09 2013-09-11 Basf Se Mehrstufige herstellung wässriger haftklebstoffdispersionen für die herstellung von selbstkle-benden artikeln
US9096090B2 (en) 2012-05-09 2015-08-04 Ryan W. Vest Liquid platemaking with laser engraving
US8735049B2 (en) 2012-05-22 2014-05-27 Ryan W. Vest Liquid platemaking process
JP6238972B2 (ja) 2012-06-05 2017-11-29 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se 金属薄板のコーティングのための多段ポリマー分散液の使用
US9567484B2 (en) 2012-07-06 2017-02-14 Basf Se Use of aqueous hybrid binders and alkyd systems for coating agents
US9703201B2 (en) 2015-04-22 2017-07-11 Macdermid Printing Solutions, Llc Method of making relief image printing plates
JP2018538384A (ja) 2015-10-20 2018-12-27 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se 繊維セメント板を被覆するためのコーティング組成物
US9740103B2 (en) 2015-11-09 2017-08-22 Macdermid Printing Solutions, Llc Method and apparatus for producing liquid flexographic printing plates
WO2017125277A1 (de) 2016-01-18 2017-07-27 Basf Se Verwendung eines einkomponentigen laminierklebstoffs zur verbundfolienkaschierung
EP3202795B1 (de) 2016-02-08 2018-08-08 Basf Se Verwendung einer klebstoffdispersion für die glanzfolienkaschierung
CA3017548A1 (en) 2016-03-18 2017-09-21 Basf Se Finely divided aqueous multistage polymer dispersion, method for the production thereof, and use thereof as a binder
US10625334B2 (en) 2017-04-11 2020-04-21 Macdermid Graphics Solutions, Llc Method of producing a relief image from a liquid photopolymer resin
WO2019201696A1 (de) 2018-04-20 2019-10-24 Basf Se Haftklebstoffzusammensetzung mit auf vernetzung über keto- oder aldehydgruppen beruhendem gelgehalt
EP3924185B1 (de) 2019-02-15 2023-01-25 Covestro Intellectual Property GmbH & Co. KG Neue systeme für die grundierung und das kleben von bodenbelägen

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US3677920A (en) * 1968-07-06 1972-07-18 Asahi Chemical Ind Photopolymerizable diisocyanate modified unsaturated polyester containing acrylic monomers
DE2008334A1 (de) * 1969-02-24 1970-12-23 The Lubrizol Corp., Cleveland, Ohio (V.St.A.) Härtbare Formmassen auf der Basis von Polyestern
US3725231A (en) * 1971-08-20 1973-04-03 Lubrizol Corp Photosensitive diacetone acrylamide resins

Also Published As

Publication number Publication date
JPS5033767B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1975-11-04
DE2207209A1 (de) 1972-10-19
IT944098B (it) 1973-04-20
US3794494A (en) 1974-02-26
FR2129360A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1972-10-27
CA956166A (en) 1974-10-15
DE2207209C3 (de) 1974-05-22
DE2207209B2 (de) 1973-10-25
AU3638971A (en) 1973-05-24

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PE20 Patent expired after termination of 20 years