GB1323647A - Photographic mask - Google Patents

Photographic mask

Info

Publication number
GB1323647A
GB1323647A GB2176071A GB2176071A GB1323647A GB 1323647 A GB1323647 A GB 1323647A GB 2176071 A GB2176071 A GB 2176071A GB 2176071 A GB2176071 A GB 2176071A GB 1323647 A GB1323647 A GB 1323647A
Authority
GB
United Kingdom
Prior art keywords
mask
photo
borosilicate glass
contact print
photographic mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2176071A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1323647A publication Critical patent/GB1323647A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • H10P95/00—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
GB2176071A 1970-02-17 1971-04-19 Photographic mask Expired GB1323647A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US1215070A 1970-02-17 1970-02-17

Publications (1)

Publication Number Publication Date
GB1323647A true GB1323647A (en) 1973-07-18

Family

ID=21753621

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2176071A Expired GB1323647A (en) 1970-02-17 1971-04-19 Photographic mask

Country Status (6)

Country Link
US (1) US3729316A (enExample)
JP (1) JPS5139510B1 (enExample)
CA (1) CA947563A (enExample)
DE (1) DE2052809C3 (enExample)
FR (1) FR2080457A5 (enExample)
GB (1) GB1323647A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3863331A (en) * 1972-09-11 1975-02-04 Rca Corp Matching of semiconductor device characteristics
US4063812A (en) * 1976-08-12 1977-12-20 International Business Machines Corporation Projection printing system with an improved mask configuration
US4536240A (en) * 1981-12-02 1985-08-20 Advanced Semiconductor Products, Inc. Method of forming thin optical membranes
DE3712071A1 (de) * 1987-04-09 1988-10-20 Basf Ag Vorlagenmaterial fuer die belichtung von lichtempfindlich beschichteten materialien
US5089361A (en) * 1990-08-17 1992-02-18 Industrial Technology Research Institute Mask making process

Also Published As

Publication number Publication date
JPS5139510B1 (enExample) 1976-10-28
DE2052809A1 (de) 1971-08-26
FR2080457A5 (enExample) 1971-11-12
DE2052809C3 (de) 1980-01-31
US3729316A (en) 1973-04-24
DE2052809B2 (de) 1979-05-10
CA947563A (en) 1974-05-21

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee