GB1315411A - Semiconductor devices - Google Patents

Semiconductor devices

Info

Publication number
GB1315411A
GB1315411A GB2667770A GB2667770A GB1315411A GB 1315411 A GB1315411 A GB 1315411A GB 2667770 A GB2667770 A GB 2667770A GB 2667770 A GB2667770 A GB 2667770A GB 1315411 A GB1315411 A GB 1315411A
Authority
GB
United Kingdom
Prior art keywords
regions
doped
region
junction
june
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2667770A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Publication of GB1315411A publication Critical patent/GB1315411A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/083Anode or cathode regions of thyristors or gated bipolar-mode devices
    • H01L29/0839Cathode regions of thyristors

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Thyristors (AREA)

Abstract

1315411 Semi-conductor devices MITSUBISHI DENKI KK 2 June 1970 [2 June 1969] 26677/70 Heading H1K Parts 32 of one of the regions defining the cathode emitter junction 24 of a thyristor 10 are heavily doped so as to provide tunnel junctions 34 which effectively shunt portions of the junction 24. In a bidirectional device such a structure is provided at both ends thereof. In the Si device described P-type regions 14, 16 are formed by gaseous diffusion of Ga into an N-type body 12, and highly B-doped P + type regions 32 are diffused into the region 16. A uniformly P-doped epitaxial layer 18 is then deposited over the regions 32 and a central portion thereof is removed to expose the region 16 and to permit the application of a control electrode 30 thereto. Alternatively the layer 18 may be formed so as to have a dopant concentration decreasing from the surface towards the junction 24, the region 16 emerging centrally flush with the surface as shown. In a modification the junctions 34 are not tunnel junctions but both sides thereof are doped to a sufficient level (at least 5 Î 10<SP>8</SP> atoms/cm.<SP>3</SP>) to produce recombination centres in the depletion regions associated therewith so that at leakage current levels recombination current is significant while at higher current levels diffusion current predominates.
GB2667770A 1969-06-02 1970-06-02 Semiconductor devices Expired GB1315411A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4306669A JPS4921988B1 (en) 1969-06-02 1969-06-02

Publications (1)

Publication Number Publication Date
GB1315411A true GB1315411A (en) 1973-05-02

Family

ID=12653465

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2667770A Expired GB1315411A (en) 1969-06-02 1970-06-02 Semiconductor devices

Country Status (4)

Country Link
JP (1) JPS4921988B1 (en)
DE (1) DE2027002A1 (en)
FR (1) FR2045797B1 (en)
GB (1) GB1315411A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3225990C2 (en) * 1982-07-12 1985-09-19 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Thyristor

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1324170A (en) * 1961-06-05 1963-04-12 Gen Electric Improvements in semiconductor devices and their fabrication
FR1324783A (en) * 1961-06-05 1963-04-19 Gen Electric Improvements to semiconductor devices and their manufacturing processes

Also Published As

Publication number Publication date
DE2027002A1 (en) 1970-12-23
JPS4921988B1 (en) 1974-06-05
FR2045797B1 (en) 1973-08-10
FR2045797A1 (en) 1971-03-05

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Legal Events

Date Code Title Description
PS Patent sealed
PE20 Patent expired after termination of 20 years