GB1305792A - - Google Patents

Info

Publication number
GB1305792A
GB1305792A GB957070A GB957070A GB1305792A GB 1305792 A GB1305792 A GB 1305792A GB 957070 A GB957070 A GB 957070A GB 957070 A GB957070 A GB 957070A GB 1305792 A GB1305792 A GB 1305792A
Authority
GB
United Kingdom
Prior art keywords
wafer
mask
optical system
exposure
feb
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB957070A
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP44099699A external-priority patent/JPS5023276B1/ja
Priority claimed from JP45015124A external-priority patent/JPS5147026B1/ja
Application filed filed Critical
Publication of GB1305792A publication Critical patent/GB1305792A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
GB957070A 1969-02-27 1970-02-27 Expired GB1305792A (es)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP1748069 1969-02-27
JP1748169 1969-02-27
JP44099699A JPS5023276B1 (es) 1969-12-11 1969-12-11
JP1220270 1970-02-12
JP45015124A JPS5147026B1 (es) 1970-02-20 1970-02-20

Publications (1)

Publication Number Publication Date
GB1305792A true GB1305792A (es) 1973-02-07

Family

ID=27519374

Family Applications (1)

Application Number Title Priority Date Filing Date
GB957070A Expired GB1305792A (es) 1969-02-27 1970-02-27

Country Status (3)

Country Link
DE (1) DE2009284C3 (es)
GB (1) GB1305792A (es)
NL (1) NL7002828A (es)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3853398A (en) * 1972-07-05 1974-12-10 Canon Kk Mask pattern printing device
US4473293A (en) * 1979-04-03 1984-09-25 Optimetrix Corporation Step-and-repeat projection alignment and exposure system
US4573791A (en) * 1979-04-03 1986-03-04 Optimetrix Corporation Step-and-repeat projection alignment and exposure system
DE3173163D1 (en) * 1980-02-29 1986-01-23 Eaton Optimetrix Inc Alignment apparatus
US4452526A (en) * 1980-02-29 1984-06-05 Optimetrix Corporation Step-and-repeat projection alignment and exposure system with auxiliary optical unit
US4597664A (en) * 1980-02-29 1986-07-01 Optimetrix Corporation Step-and-repeat projection alignment and exposure system with auxiliary optical unit
DD158824A1 (de) * 1980-11-03 1983-02-02 Adelbrecht Schorcht Anordnung zur automatischen justierung mindestens eines gegenstandes
US4577958A (en) * 1982-06-18 1986-03-25 Eaton Optimetrix, Inc. Bore-sighted step-and-repeat projection alignment and exposure system
JPS5928337A (ja) * 1982-08-09 1984-02-15 Hitachi Ltd プロジエクシヨンアライナ
US4577957A (en) * 1983-01-07 1986-03-25 Eaton-Optimetrix, Inc. Bore-sighted step-and-repeat projection alignment and exposure system
CN112083578B (zh) * 2020-08-26 2021-06-22 中国科学院西安光学精密机械研究所 用于光电设备像面对接的目标模拟器、调试系统及方法

Also Published As

Publication number Publication date
DE2009284B2 (de) 1974-01-03
DE2009284A1 (de) 1970-09-10
DE2009284C3 (de) 1974-08-22
NL7002828A (es) 1970-08-31

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Legal Events

Date Code Title Description
PS Patent sealed
PE20 Patent expired after termination of 20 years